GaN ma Silicon Wafer no RF

ʻO ka wehewehe pōkole:

ʻO ka GaN ma Silicon Wafer no RF, i hāʻawi ʻia e VET Energy, ua hoʻolālā ʻia e kākoʻo i nā noi lekiō kiʻekiʻe (RF). Hoʻohui kēia mau wafers i nā mea maikaʻi o Gallium Nitride (GaN) a me Silicon (Si) e hāʻawi i ka conductivity thermal maikaʻi loa a me ka mana kiʻekiʻe, e hoʻolilo iā lākou i mea kūpono no nā ʻāpana RF i hoʻohana ʻia i ke kelepona, radar, a me nā ʻōnaehana satellite. Mālama ʻo VET Energy i kēlā me kēia wafer i nā kūlana hana kiʻekiʻe e pono ai no ka hana semiconductor holomua.


Huahana Huahana

Huahana Huahana

ʻO VET Energy GaN ma Silicon Wafer kahi hopena semiconductor ʻokiʻoki i hoʻolālā ʻia no nā noi lekiō (RF). Ma ka epitaxially e ulu ana i ka gallium nitride (GaN) kiʻekiʻe ma luna o kahi pani silika, hāʻawi ʻo VET Energy i kahi kahua kumu kūʻai a me ka hana kiʻekiʻe no kahi ākea o nā polokalamu RF.

Ua kūpono kēia GaN ma Silicon wafer me nā mea ʻē aʻe e like me Si Wafer, SiC Substrate, SOI Wafer, a me SiN Substrate, e hoʻonui ana i kona versatility no nā ʻano hana hana. Hoʻohui ʻia, ʻoi aku ka maikaʻi no ka hoʻohana ʻana me Epi Wafer a me nā mea kiʻekiʻe e like me Gallium Oxide Ga2O3 a me AlN Wafer, e hoʻomaikaʻi hou i kāna mau noi i ka uila mana kiʻekiʻe. Hoʻolālā ʻia nā wafers no ka hoʻohui pono ʻana i nā ʻōnaehana hana me ka hoʻohana ʻana i ka Cassette maʻamau no ka maʻalahi o ka hoʻohana ʻana a me ka hoʻonui ʻana i ka pono hana.

Hāʻawi ʻo VET Energy i kahi kōpili piha o nā substrate semiconductor, me Si Wafer, SiC Substrate, SOI Wafer, SiN Substrate, Epi Wafer, Gallium Oxide Ga2O3, a me AlN Wafer. Hāʻawi kā mākou laina huahana like ʻole i nā pono o nā noi uila like ʻole, mai ka uila uila a hiki i ka RF a me ka optoelectronics.

Hāʻawi ʻo GaN ma Silicon Wafer i nā pono no nā noi RF:

       • Ka hana alapine kiʻekiʻe:ʻO ka bandgap ākea a me ka neʻe electron kiʻekiʻe o GaN hiki ke hana i ka hana alapine kiʻekiʻe, i mea kūpono no 5G a me nā ʻōnaehana kamaʻilio kiʻekiʻe.
     • mana kiʻekiʻe:Hiki i nā mea GaN ke hoʻopaʻa i nā mana kiʻekiʻe aʻe i hoʻohālikelike ʻia i nā mea hana silicon-based, e alakaʻi ana i nā ʻōnaehana RF paʻa a maikaʻi.
       • Haʻahaʻa hoʻohana mana:Hōʻike nā hāmeʻa GaN i ka hoʻohana ʻana i ka mana haʻahaʻa, e hopena i ka hoʻomaikaʻi ʻana i ka ikehu a me ka hoʻemi ʻana i ka wela.

Nā noi:

       • 5G kamaʻilio uila:He mea nui ʻo GaN ma nā wafers Silicon no ke kūkulu ʻana i nā kahua kahua 5G kiʻekiʻe a me nā polokalamu kelepona.
     • Pūnaehana Radar:Hoʻohana ʻia nā mea hoʻonui RF e pili ana i ka GaN i nā ʻōnaehana radar no kā lākou hana kiʻekiʻe a me ka bandwidth ākea.
   • Ke kamaʻilio Satellite:Hiki i nā polokalamu GaN ke hoʻohana i nā ʻōnaehana kamaʻilio ukali uila mana kiʻekiʻe a me nā alapine kiʻekiʻe.
     • Mea uila uila:Hoʻohana ʻia nā ʻāpana RF e pili ana i ka GaN i nā noi koa e like me ke kaua uila a me nā ʻōnaehana radar.

Hāʻawi ʻo VET Energy i ka GaN maʻamau i nā wafers Silicon e hoʻokō i kāu mau koi kikoʻī, me nā pae doping like ʻole, nā mānoanoa, a me nā nui wafer. Hāʻawi kā mākou hui loea i ke kākoʻo ʻenehana a me ka lawelawe ma hope o ke kūʻai aku e hōʻoia i kāu kūleʻa.

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第6页-35

OLELO HOOLAHA WAFERING

*n-Pm=n-type Pm-Grade,n-Ps=n-type Ps-Grade,Sl=Semi-lnsulating

'ikamu

8-Inika

6-Iniha

4-Iniha

nP

n-Pm

n-Ps

SI

SI

TTV(GBIR)

≤6um

≤6um

Kakaka (GF3YFCD)-Waiwai Loa

≤15μm

≤15μm

≤25μm

≤15μm

Warp(GF3YFER)

≤25μm

≤25μm

≤40μm

≤25μm

LTV(SBIR)-10mmx10mm

<2μm

Wafer Edge

ʻO ka beveling

ILI HOPE

*n-Pm=n-type Pm-Grade,n-Ps=n-type Ps-Grade,Sl=Semi-lnsulating

'ikamu

8-Inika

6-Iniha

4-Iniha

nP

n-Pm

n-Ps

SI

SI

Hoʻopau ʻili

ʻaoʻao ʻelua Optical Polish, Si- Face CMP

ʻAhaʻulaʻula

(10um x 10um) Si-FaceRa≤0.2nm
C-Face Ra≤ 0.5nm

(5umx5um) Si-Face Ra≤0.2nm
C-Face Ra≤0.5nm

ʻOpeʻa Kiki

ʻAʻohe ʻae ʻia (lōʻihi a laula≥0.5mm)

Indents

ʻAʻole ʻae ʻia

Nā ʻōpala (Si-Face)

Ka nui.≤5, Huihui
Length≤0.5×wafer anawaena

Ka nui.≤5, Huihui
Length≤0.5×wafer anawaena

Ka nui.≤5, Huihui
Length≤0.5×wafer anawaena

māwae

ʻAʻole ʻae ʻia

Hoʻokuʻu Edge

3mm

tech_1_2_size
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