ʻO VET Energy GaN ma Silicon Wafer kahi hopena semiconductor ʻokiʻoki i hoʻolālā ʻia no nā noi lekiō (RF). Ma ka epitaxially e ulu ana i ka gallium nitride (GaN) kiʻekiʻe ma luna o kahi pani silika, hāʻawi ʻo VET Energy i kahi kahua kumu kūʻai a me ka hana kiʻekiʻe no kahi ākea o nā polokalamu RF.
Ua kūpono kēia GaN ma Silicon wafer me nā mea ʻē aʻe e like me Si Wafer, SiC Substrate, SOI Wafer, a me SiN Substrate, e hoʻonui ana i kona versatility no nā ʻano hana hana. Hoʻohui ʻia, ʻoi aku ka maikaʻi no ka hoʻohana ʻana me Epi Wafer a me nā mea kiʻekiʻe e like me Gallium Oxide Ga2O3 a me AlN Wafer, e hoʻomaikaʻi hou i kāna mau noi i ka uila mana kiʻekiʻe. Hoʻolālā ʻia nā wafers no ka hoʻohui pono ʻana i nā ʻōnaehana hana me ka hoʻohana ʻana i ka Cassette maʻamau no ka maʻalahi o ka hoʻohana ʻana a me ka hoʻonui ʻana i ka pono hana.
Hāʻawi ʻo VET Energy i kahi kōpili piha o nā substrate semiconductor, me Si Wafer, SiC Substrate, SOI Wafer, SiN Substrate, Epi Wafer, Gallium Oxide Ga2O3, a me AlN Wafer. Hāʻawi kā mākou laina huahana like ʻole i nā pono o nā noi uila like ʻole, mai ka uila uila a hiki i ka RF a me ka optoelectronics.
Hāʻawi ʻo GaN ma Silicon Wafer i nā pono no nā noi RF:
• Ka hana alapine kiʻekiʻe:ʻO ka bandgap ākea a me ka neʻe electron kiʻekiʻe o GaN hiki ke hana i ka hana alapine kiʻekiʻe, i mea kūpono no 5G a me nā ʻōnaehana kamaʻilio kiʻekiʻe.
• mana kiʻekiʻe:Hiki i nā mea GaN ke hoʻopaʻa i nā mana kiʻekiʻe aʻe i hoʻohālikelike ʻia i nā mea hana silicon-based, e alakaʻi ana i nā ʻōnaehana RF paʻa a maikaʻi.
• Haʻahaʻa hoʻohana mana:Hōʻike nā hāmeʻa GaN i ka hoʻohana ʻana i ka mana haʻahaʻa, e hopena i ka hoʻomaikaʻi ʻana i ka ikehu a me ka hoʻemi ʻana i ka wela.
Nā noi:
• 5G kamaʻilio uila:He mea nui ʻo GaN ma nā wafers Silicon no ke kūkulu ʻana i nā kahua kahua 5G kiʻekiʻe a me nā polokalamu kelepona.
• Pūnaehana Radar:Hoʻohana ʻia nā mea hoʻonui RF e pili ana i ka GaN i nā ʻōnaehana radar no kā lākou hana kiʻekiʻe a me ka bandwidth ākea.
• Ke kamaʻilio Satellite:Hiki i nā polokalamu GaN ke hoʻohana i nā ʻōnaehana kamaʻilio ukali uila mana kiʻekiʻe a me nā alapine kiʻekiʻe.
• Mea uila uila:Hoʻohana ʻia nā ʻāpana RF e pili ana i ka GaN i nā noi koa e like me ke kaua uila a me nā ʻōnaehana radar.
Hāʻawi ʻo VET Energy i ka GaN maʻamau i nā wafers Silicon e hoʻokō i kāu mau koi kikoʻī, me nā pae doping like ʻole, nā mānoanoa, a me nā nui wafer. Hāʻawi kā mākou hui loea i ke kākoʻo ʻenehana a me ka lawelawe ma hope o ke kūʻai aku e hōʻoia i kāu kūleʻa.
OLELO HOOLAHA WAFERING
*n-Pm=n-type Pm-Grade,n-Ps=n-type Ps-Grade,Sl=Semi-lnsulating
'ikamu | 8-Inika | 6-Iniha | 4-Iniha | ||
nP | n-Pm | n-Ps | SI | SI | |
TTV(GBIR) | ≤6um | ≤6um | |||
Kakaka (GF3YFCD)-Waiwai Loa | ≤15μm | ≤15μm | ≤25μm | ≤15μm | |
Warp(GF3YFER) | ≤25μm | ≤25μm | ≤40μm | ≤25μm | |
LTV(SBIR)-10mmx10mm | <2μm | ||||
Wafer Edge | ʻO ka beveling |
ILI HOPE
*n-Pm=n-type Pm-Grade,n-Ps=n-type Ps-Grade,Sl=Semi-lnsulating
'ikamu | 8-Inika | 6-Iniha | 4-Iniha | ||
nP | n-Pm | n-Ps | SI | SI | |
Hoʻopau ʻili | ʻaoʻao ʻelua Optical Polish, Si- Face CMP | ||||
ʻAhaʻulaʻula | (10um x 10um) Si-FaceRa≤0.2nm | (5umx5um) Si-Face Ra≤0.2nm | |||
ʻOpeʻa Kiki | ʻAʻohe ʻae ʻia (lōʻihi a laula≥0.5mm) | ||||
Indents | ʻAʻole ʻae ʻia | ||||
Nā ʻōpala (Si-Face) | Ka nui.≤5, Huihui | Ka nui.≤5, Huihui | Ka nui.≤5, Huihui | ||
māwae | ʻAʻole ʻae ʻia | ||||
Hoʻokuʻu Edge | 3mm |