Tau fa'aitiitia GaN-Basedepitaxial i luga ole Sic Substrates 4′′

Fa'amatalaga Puupuu:

E tatau ona tumau le maualuga o le vevela ma le faʻamamaina o vailaʻau faʻamaʻi. CoorsTek Clear Carbon™ susceptors o lo'o fa'ainisinia fa'apitoa mo nei fa'aogaina o masini epitaxy. O latou faufale fa'apipi'i graphite maualuga-mama silicon carbide (SiC) e maua ai le fa'afefeteina maualuga atu o le vevela, e o'o lava i le fa'amama fa'amama mo le mafiafia ma le tete'e o le epi layer, ma le fa'agata fa'ama'i. Fine SiC tioata tioata e maua ai se mea mama, lamolemole, e taua tele mo le taulimaina talu ai ona faʻafesoʻotaʻi e faʻamaʻi mama le susceptor i le tele o itu i lo latou eria atoa.


Fa'amatalaga Oloa

Faailoga o oloa

Ua i ai nei le matou aufaigaluega sili ona lelei e faʻatautaia fesili mai tagata faʻatau. O la matou sini o le "100% faʻatauga faʻatau e ala i a matou oloa poʻo auaunaga sili ona lelei, faʻatau atu tau & a matou auvaa auaunaga" ma maua le fiafia mai le lauiloa tele i tagata faʻatau. Faatasi ai ma le tele o falegaosimea, e mafai ona matou ofoina atu le tele o tau Faʻaitiitia GaN-Basedepitaxial i luga o Sic Substrates 4′′, Matou te faʻafeiloaʻi ma le faʻafeiloaʻi au pisinisi laiti mai soʻo se ituaiga olaga, faʻamoemoe e faʻavae pisinisi faauo ma felagolagomai e faʻafesoʻotaʻi ma oe ma maua. ose faamoemoe manumalo-manumalo.
Ua i ai nei le matou aufaigaluega sili ona lelei e faʻatautaia fesili mai tagata faʻatau. O la matou sini o le "100% faʻatauga faʻatau e ala i a matou oloa poʻo auaunaga sili ona lelei, faʻatau atu tau & a matou auvaa auaunaga" ma maua le fiafia mai le lauiloa tele i tagata faʻatau. Faatasi ai ma le tele o falegaosimea, e mafai ona matou ofoina atu le tele o mea eseeseSaina GaN Substrates ma GaN Film, Matou te tulimatai atu ma le faamaoni e galulue faʻatasi ma tagata faʻatau i le lalolagi atoa. Matou te talitonu e mafai ona matou faʻamalieina oe i a matou oloa maualuga ma auaunaga atoatoa. Matou te faʻafeiloaʻi ma le faʻafeiloaʻi tagata faʻatau e asiasi i la matou kamupani ma faʻatau a matou oloa.

SiC coating graphite MOCVD Wafer carriers

O matou susceptors uma e faia i le maualuga-malosi isostatic graphite. Fa'amanuiaga mai le maualuga o le mama o tatou graphites - fa'atupuina fa'apitoa mo faiga lu'itau e pei o le epitaxy, fa'atupu tioata, fa'apipi'iina o le ion ma le fa'apipi'iina o le plasma, fa'apea fo'i ma le gaosiga o chips LED.

Fa'amatalaga o oloa
SiC coating of Graphite substrate mo Semiconductor talosaga e maua ai se vaega e sili atu le mama ma tetee atu i oxidizing atemosifia.
O le CVD SiC poʻo le CVI SiC o loʻo faʻaogaina i le Graphite o vaega faigofie pe lavelave mamanu. O le ufiufi e mafai ona faʻaoga i le mafiafia eseese ma i vaega tetele.

 

Compon

SiC coating graphite MOCVD Wafer carriers

O faʻamanuiaga faʻapitoa o le matou SiC-coated graphite susceptors e aofia ai le mama maualuga, faʻapipiʻi tutusa ma se olaga sili ona lelei. E iai fo'i le maualuga o le kemikolo ma le mautu o le vevela.

Matou te fa'atumauina le fa'apalepale vavalalata pe a fa'aogaina le SiC coating, fa'aogaina le fa'aogaina o masini maualuga e fa'amautinoa ai se fa'ailoga susceptor toniga. Matou te gaosia fo'i mea e iai mea fa'aeletise lelei mo le fa'aogaina i faiga fa'avevela. O vaega uma ua mae'a o lo'o sau fa'atasi ma se tusi fa'amaonia mama ma fa'atatau.

Talosaga:

2

Vaega:
· Lelei le Tete'e Te'i Te'i
· Sili Fa'aletino Fa'ate'ia Tete'e
· Tete'e Sili Vailaau
· Mamalu Maualuga Maualuga
· Avanoa i Faiga Lavelave
· Faʻaaogaina i lalo ole Oxidizing AtmosphereMeatotino masani o mea fa'avae kalafi:

E aliali mai le To'atele: 1.85 g/cm3
Tete'e eletise: 11 μΩm
Malosi fa'afoliga: 49 MPa (500kgf/cm2)
Maa'a o le matafaga: 58
Lefulefu: <5ppm
Amioga vevela: 116 W/mK (100 kcal/mhr-℃)

Ua i ai nei le matou aufaigaluega sili ona lelei e faʻatautaia fesili mai tagata faʻatau. O la matou sini o le "100% faʻatauga faʻatau e ala i a matou oloa poʻo auaunaga sili ona lelei, faʻatau atu tau & a matou auvaa auaunaga" ma maua le fiafia mai le lauiloa tele i tagata faʻatau. Faatasi ai ma le tele o falegaosimea, e mafai ona matou ofoina atu le tele o tau Faʻaitiitia GaN-Basedepitaxial i luga o Sic Substrates 4′′, Matou te faʻafeiloaʻi ma le faʻafeiloaʻi au pisinisi laiti mai soʻo se ituaiga olaga, faʻamoemoe e faʻavae pisinisi faauo ma felagolagomai e faʻafesoʻotaʻi ma oe ma maua. ose faamoemoe manumalo-manumalo.
Tau fa'aitiitiaSaina GaN Substrates ma GaN Film, Matou te tulimatai atu ma le faamaoni e galulue faʻatasi ma tagata faʻatau i le lalolagi atoa. Matou te talitonu e mafai ona matou faʻamalieina oe i a matou oloa maualuga ma auaunaga atoatoa. Matou te faʻafeiloaʻi ma le faʻafeiloaʻi tagata faʻatau e asiasi i la matou kamupani ma faʻatau a matou oloa.


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