ʻO ka 8 Inch P Type Silicon Wafer mai VET Energy he wafer silicon hana kiʻekiʻe i hoʻolālā ʻia no kahi ākea o nā noi semiconductor, me nā cell solar, nā mea MEMS, a me nā kaapuni i hoʻohui ʻia. ʻIke ʻia no kāna conductivity uila maikaʻi loa a me ka hana maʻamau, ʻo kēia wafer ka koho i makemake ʻia no nā mea hana e ʻimi nei e hana i nā ʻāpana uila hilinaʻi a maikaʻi. Mālama ʻo VET Energy i nā pae doping pololei a me ka hoʻopau ʻana o ka ʻili kiʻekiʻe no ka hana ʻana i nā hāmeʻa maikaʻi loa.
ʻO kēia mau 8 Inch P Type Silicon Wafers ua kūpono piha me nā mea like ʻole e like me SiC Substrate, SOI Wafer, SiN Substrate, a kūpono no ka ulu ʻana o Epi Wafer, e hōʻoia ana i ka versatility no nā kaʻina hana semiconductor holomua. Hiki ke hoʻohana pū ʻia nā wafers me nā mea ʻenehana kiʻekiʻe ʻē aʻe e like me Gallium Oxide Ga2O3 a me AlN Wafer, e hoʻolilo iā lākou i mea kūpono no nā noi uila o ka hanauna e hiki mai ana. Hoʻopili pū ʻia kā lākou hoʻolālā paʻa i nā ʻōnaehana Cassette-based, e hōʻoiaʻiʻo ana i ka hana ʻana i ka hana kūpono a me ka nui.
Hāʻawi ʻo VET Energy i nā mea kūʻai aku i nā hoʻonā wafer maʻamau. Hiki iā mākou ke hana i nā wafers me nā resistivity like ʻole, ka ʻike oxygen, ka mānoanoa, a me nā mea ʻē aʻe e like me nā pono kikoʻī o nā mea kūʻai aku. Eia kekahi, hāʻawi pū mākou i ke kākoʻo ʻenehana loea a me ka lawelawe ma hope o ke kūʻai aku e kōkua i nā mea kūʻai aku e hoʻoponopono i nā pilikia like ʻole i loaʻa i ka wā o ke kaʻina hana.
OLELO HOOLAHA WAFERING
*n-Pm=n-type Pm-Grade,n-Ps=n-type Ps-Grade,Sl=Semi-lnsulating
'ikamu | 8-Inika | 6-Iniha | 4-Iniha | ||
nP | n-Pm | n-Ps | SI | SI | |
TTV(GBIR) | ≤6um | ≤6um | |||
Kakaka (GF3YFCD)-Waiwai Loa | ≤15μm | ≤15μm | ≤25μm | ≤15μm | |
Warp(GF3YFER) | ≤25μm | ≤25μm | ≤40μm | ≤25μm | |
LTV(SBIR)-10mmx10mm | <2μm | ||||
Wafer Edge | ʻO ka beveling |
ILI HOPE
*n-Pm=n-type Pm-Grade,n-Ps=n-type Ps-Grade,Sl=Semi-lnsulating
'ikamu | 8-Inika | 6-Iniha | 4-Iniha | ||
nP | n-Pm | n-Ps | SI | SI | |
Hoʻopau ʻili | ʻaoʻao ʻelua Optical Polish, Si- Face CMP | ||||
ʻAhaʻulaʻula | (10um x 10um) Si-FaceRa≤0.2nm | (5umx5um) Si-Face Ra≤0.2nm | |||
ʻOpeʻa lihi | ʻAʻohe ʻae ʻia (lōʻihi a laula≥0.5mm) | ||||
Indents | ʻAʻole ʻae ʻia | ||||
Nā ʻōpala (Si-Face) | Ka nui.≤5, Huihui | Ka nui.≤5, Huihui | Ka nui.≤5, Huihui | ||
māwae | ʻAʻole ʻae ʻia | ||||
Hoʻokuʻu Edge | 3mm |