ʻO ka 4 Inch GaAs Wafer mai VET Energy he mea pono ia no nā polokalamu kiʻekiʻe a me ka optoelectronic, me nā mea hoʻonui RF, nā LED, a me nā pūnaewele lā. ʻIke ʻia kēia mau wafers no ko lākou mobility electron kiʻekiʻe a me ka hiki ke hana i nā alapine kiʻekiʻe, e hana ana iā lākou i mea koʻikoʻi i nā noi semiconductor kiʻekiʻe. Mālama ʻo VET Energy i nā wafers GaAs maikaʻi loa me ka mānoanoa like ʻole a me nā hemahema liʻiliʻi, kūpono no nā ʻano hana hana koi.
Hoʻopili kēia mau 4 Inch GaAs Wafers me nā mea semiconductor like ʻole e like me Si Wafer, SiC Substrate, SOI Wafer, a me SiN Substrate, e hoʻolilo iā lākou i mea maʻalahi no ka hoʻohui ʻana i nā ʻano hana like ʻole. Inā hoʻohana ʻia no ka hana ʻana o Epi Wafer a i ʻole nā mea ʻokiʻoki e like me Gallium Oxide Ga2O3 a me AlN Wafer, hāʻawi lākou i kahi kumu hilinaʻi no nā mea uila e hiki mai ana. Eia hou, ua kūpono nā wafers me nā ʻōnaehana hoʻokele Cassette, e hōʻoiaʻiʻo ana i nā hana maʻemaʻe ma ka noiʻi a me nā wahi hana kiʻekiʻe.
Hāʻawi ʻo VET Energy i kahi kōpili piha o nā substrate semiconductor, me Si Wafer, SiC Substrate, SOI Wafer, SiN Substrate, Epi Wafer, Gallium Oxide Ga2O3, a me AlN Wafer. Hāʻawi kā mākou laina huahana like ʻole i nā pono o nā noi uila like ʻole, mai ka uila uila a hiki i ka RF a me ka optoelectronics.
Hāʻawi ʻo VET Energy i nā wafers GaAs maʻamau e hoʻokō i kāu mau koi kikoʻī, me nā pae doping like ʻole, nā kuhikuhi, a me ka hoʻopau ʻana i ka ʻili. Hāʻawi kā mākou hui loea i ke kākoʻo ʻenehana a me ka lawelawe ma hope o ke kūʻai aku e hōʻoia i kāu kūleʻa.
OLELO HOOLAHA WAFERING
*n-Pm=n-type Pm-Grade,n-Ps=n-type Ps-Grade,Sl=Semi-lnsulating
'ikamu | 8-Inika | 6-Iniha | 4-Iniha | ||
nP | n-Pm | n-Ps | SI | SI | |
TTV(GBIR) | ≤6um | ≤6um | |||
Kakaka (GF3YFCD)-Waiwai Loa | ≤15μm | ≤15μm | ≤25μm | ≤15μm | |
Warp(GF3YFER) | ≤25μm | ≤25μm | ≤40μm | ≤25μm | |
LTV(SBIR)-10mmx10mm | <2μm | ||||
Wafer Edge | ʻO ka beveling |
PAPA IHO
*n-Pm=n-type Pm-Grade,n-Ps=n-type Ps-Grade,Sl=Semi-lnsulating
'ikamu | 8-Inika | 6-Iniha | 4-Iniha | ||
nP | n-Pm | n-Ps | SI | SI | |
Hoʻopau ʻili | ʻaoʻao ʻelua Optical Polish, Si- Face CMP | ||||
ʻAhaʻulaʻula | (10um x 10um) Si-FaceRa≤0.2nm | (5umx5um) Si-Face Ra≤0.2nm | |||
ʻOpi ʻEke | ʻAʻohe ʻae ʻia (lōʻihi a laula≥0.5mm) | ||||
Indents | ʻAʻole ʻae ʻia | ||||
Nā ʻōpala (Si-Face) | Ka nui.≤5, Huihui | Ka nui.≤5, Huihui | Ka nui.≤5, Huihui | ||
māwae | ʻAʻole ʻae ʻia | ||||
Hoʻokuʻu Edge | 3mm |