ʻO VET Energy 12-inch SOI wafer kahi mea hoʻoheheʻe semiconductor substrate kiʻekiʻe, i makemake nui ʻia no kāna mau waiwai uila maikaʻi loa a me ke ʻano kū hoʻokahi. Hoʻohana ʻo VET Energy i nā kaʻina hana wafer SOI kiʻekiʻe e hōʻoia i ka haʻahaʻa haʻahaʻa o ka leakage o ka wafer, ka wikiwiki kiʻekiʻe a me ka pale ʻana i ka radiation, e hāʻawi ana i kumu paʻa no kāu mau kaapuni hoʻohui kiʻekiʻe.
ʻAʻole i kaupalena ʻia ka laina huahana o VET Energy i nā wafers SOI. Hāʻawi pū mākou i kahi ākea o nā mea semiconductor substrate, e like me Si Wafer, SiC Substrate, SiN Substrate, Epi Wafer, etc., a me nā mea semiconductor broadgap hou e like me Gallium Oxide Ga2O3 a me AlN Wafer. Hiki i kēia mau huahana ke hoʻokō i nā pono noi o nā mea kūʻai like ʻole i ka uila uila, RF, sensors a me nā kahua ʻē aʻe.
Ke nānā nei i ka maikaʻi, hoʻohana pū kā mākou wafers SOI i nā mea holomua e like me gallium oxide Ga2O3, cassette a me AlN wafers e hōʻoia i ka hilinaʻi a me ka pono i kēlā me kēia pae hana. E hilinaʻi i ka VET Energy e hāʻawi i nā hoʻonā ʻokiʻoki e hoʻolalelale i ke ala no ka holomua ʻenehana.
E hoʻokuʻu i ka hiki o kāu papahana me ka hana ʻoi loa o VET Energy 12-inch SOI wafers. E hoʻonui i kāu mau hana hou me nā wafers e hoʻokomo i ka maikaʻi, pololei a me ka hana hou, e kau ana i ke kumu no ka kūleʻa i ke kahua ikaika o ka ʻenehana semiconductor. E koho i ka VET Energy no nā haʻina wafer SOI ma mua o ka manaʻolana.
OLELO HOOLAHA WAFERING
*n-Pm=n-type Pm-Grade,n-Ps=n-type Ps-Grade,Sl=Semi-lnsulating
'ikamu | 8-Inika | 6-Iniha | 4-Iniha | ||
nP | n-Pm | n-Ps | SI | SI | |
TTV(GBIR) | ≤6um | ≤6um | |||
Kakaka (GF3YFCD)-Waiwai Loa | ≤15μm | ≤15μm | ≤25μm | ≤15μm | |
Warp(GF3YFER) | ≤25μm | ≤25μm | ≤40μm | ≤25μm | |
LTV(SBIR)-10mmx10mm | <2μm | ||||
Wafer Edge | ʻO ka beveling |
ILI HOPE
*n-Pm=n-type Pm-Grade,n-Ps=n-type Ps-Grade,Sl=Semi-lnsulating
'ikamu | 8-Inika | 6-Iniha | 4-Iniha | ||
nP | n-Pm | n-Ps | SI | SI | |
Hoʻopau ʻili | ʻaoʻao ʻelua Optical Polish, Si- Face CMP | ||||
ʻAhaʻulaʻula | (10um x 10um) Si-FaceRa≤0.2nm | (5umx5um) Si-Face Ra≤0.2nm | |||
ʻOpeʻa lihi | ʻAʻohe ʻae ʻia (lōʻihi a laula≥0.5mm) | ||||
Indents | ʻAʻole ʻae ʻia | ||||
Nā ʻōpala (Si-Face) | Ka nui.≤5, Huihui | Ka nui.≤5, Huihui | Ka nui.≤5, Huihui | ||
māwae | ʻAʻole ʻae ʻia | ||||
Hoʻokuʻu Edge | 3mm |