12 Iniha SOI Wafer

ʻO ka wehewehe pōkole:

E ʻike i ka hana hou e like me ka wā ma mua me ka 12 Inch SOI Wafer hou, he mea kupanaha ʻenehana i lawe haʻaheo iā ʻoe e VET Energy. Hana ʻia me ka pololei a me ka ʻike, ʻo kēia wafer Silicon-On-Insulator e wehewehe hou i nā kūlana ʻoihana, hāʻawi i ka maikaʻi ʻole a me ka hana.


Huahana Huahana

Huahana Huahana

ʻO VET Energy 12-inch SOI wafer kahi mea hoʻoheheʻe semiconductor substrate kiʻekiʻe, i makemake nui ʻia no kāna mau waiwai uila maikaʻi loa a me ke ʻano kū hoʻokahi. Hoʻohana ʻo VET Energy i nā kaʻina hana wafer SOI kiʻekiʻe e hōʻoia i ka haʻahaʻa haʻahaʻa o ka leakage o ka wafer, ka wikiwiki kiʻekiʻe a me ka pale ʻana i ka radiation, e hāʻawi ana i kumu paʻa no kāu mau kaapuni hoʻohui kiʻekiʻe.

ʻAʻole i kaupalena ʻia ka laina huahana o VET Energy i nā wafers SOI. Hāʻawi pū mākou i kahi ākea o nā mea semiconductor substrate, e like me Si Wafer, SiC Substrate, SiN Substrate, Epi Wafer, etc., a me nā mea semiconductor broadgap hou e like me Gallium Oxide Ga2O3 a me AlN Wafer. Hiki i kēia mau huahana ke hoʻokō i nā pono noi o nā mea kūʻai like ʻole i ka uila uila, RF, sensors a me nā kahua ʻē aʻe.

Ke nānā nei i ka maikaʻi, hoʻohana pū kā mākou wafers SOI i nā mea holomua e like me gallium oxide Ga2O3, cassette a me AlN wafers e hōʻoia i ka hilinaʻi a me ka pono i kēlā me kēia pae hana. E hilinaʻi i ka VET Energy e hāʻawi i nā hoʻonā ʻokiʻoki e hoʻolalelale i ke ala no ka holomua ʻenehana.

E hoʻokuʻu i ka hiki o kāu papahana me ka hana ʻoi loa o VET Energy 12-inch SOI wafers. E hoʻonui i kāu mau hana hou me nā wafers e hoʻokomo i ka maikaʻi, pololei a me ka hana hou, e kau ana i ke kumu no ka kūleʻa i ke kahua ikaika o ka ʻenehana semiconductor. E koho i ka VET Energy no nā haʻina wafer SOI ma mua o ka manaʻolana.

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OLELO HOOLAHA WAFERING

*n-Pm=n-type Pm-Grade,n-Ps=n-type Ps-Grade,Sl=Semi-lnsulating

'ikamu

8-Inika

6-Iniha

4-Iniha

nP

n-Pm

n-Ps

SI

SI

TTV(GBIR)

≤6um

≤6um

Kakaka (GF3YFCD)-Waiwai Loa

≤15μm

≤15μm

≤25μm

≤15μm

Warp(GF3YFER)

≤25μm

≤25μm

≤40μm

≤25μm

LTV(SBIR)-10mmx10mm

<2μm

Wafer Edge

ʻO ka beveling

ILI HOPE

*n-Pm=n-type Pm-Grade,n-Ps=n-type Ps-Grade,Sl=Semi-lnsulating

'ikamu

8-Inika

6-Iniha

4-Iniha

nP

n-Pm

n-Ps

SI

SI

Hoʻopau ʻili

ʻaoʻao ʻelua Optical Polish, Si- Face CMP

ʻAhaʻulaʻula

(10um x 10um) Si-FaceRa≤0.2nm
C-Face Ra≤ 0.5nm

(5umx5um) Si-Face Ra≤0.2nm
C-Face Ra≤0.5nm

ʻOpeʻa lihi

ʻAʻohe ʻae ʻia (lōʻihi a laula≥0.5mm)

Indents

ʻAʻole ʻae ʻia

Nā ʻōpala (Si-Face)

Ka nui.≤5, Huihui
Length≤0.5×wafer anawaena

Ka nui.≤5, Huihui
Length≤0.5×wafer anawaena

Ka nui.≤5, Huihui
Length≤0.5×wafer anawaena

māwae

ʻAʻole ʻae ʻia

Hoʻokuʻu Edge

3mm

tech_1_2_size
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