SiC Coating/Coated Graphite Substrate/Tray for Semiconductor

ʻO ka wehewehe pōkole:

ʻO VET Energy SiC Coated Graphite Susceptor for Epitaxial Growth kahi huahana hana kiʻekiʻe i hoʻolālā ʻia e hāʻawi i ka hana kūpaʻa a hilinaʻi hoʻi i kahi manawa lōʻihi. Loaʻa iā ia ke kūpaʻa wela maikaʻi loa a me ka like ʻana o ka wela, ka maʻemaʻe kiʻekiʻe, ka pale ʻana i ka erosion, e hana ana i ka hopena kūpono no nā noi hana wafer.


Huahana Huahana

Huahana Huahana

ʻO ka uhi SiC / uhi ʻia o ka susceptor Graphite no Semiconductor
 
ʻO kaSiC Coated Graphite Substratehe hopena lōʻihi loa a maikaʻi i hoʻolālā ʻia e hoʻokō i nā koi koʻikoʻi o ka ʻoihana hoʻoponopono semiconductor. E hōʻike ana i kahi papa o ka maʻemaʻe kiʻekiʻeka uhi kalapona (SiC)., Hāʻawi kēia substrate i ke kūpaʻa wela ʻē aʻe, ka pale ʻana i ka oxidation, a me ke ola lawelawe lōʻihi, i mea kūpono no nā noi i nā kaʻina MOCVD, nā mea lawe wafer graphite, a me nā kaiapuni wela kiʻekiʻe.

 Nā hiʻohiʻona: 
· ʻOi loa ka Thermal Shock Resistance
· Kūleʻa haʻalulu kino maikaʻi
· Kūʻē Kemika maikaʻi loa
· Maʻemaʻe Kiʻekiʻe
· Loaʻa ma ke ʻano paʻakikī
· Hoʻohana ʻia ma lalo o ka Oxidizing Atmosphere

Noi:

3

Nā hiʻohiʻona a me nā pono o ka huahana:

1. ʻOi aku ka pale wela wela:Me kahi maʻemaʻe kiʻekiʻeKa uhi ʻana o SiC, kū'ē ka substrate i nā mahana wela, e hōʻoia i ka hana mau i nā wahi koi e like me ka epitaxy a me ka hana semiconductor.

2. Hoʻonui i ka lōʻihi:Hoʻolālā ʻia nā ʻāpana graphite i uhi ʻia ʻo SiC e pale aku i ka ʻino a me ka oxidation, e hoʻonui ana i ke ola o ka substrate i hoʻohālikelike ʻia me nā substrate graphite maʻamau.

3. ʻO ka Graphite i uhi ʻia me ka Vitreous:ʻO ke ʻano vitreous kū hoʻokahi o kaKa uhi ʻana o SiChāʻawi i ka paʻakikī o ka ʻili maikaʻi, e hōʻemi ana i ka ʻaʻahu a me ka waimaka i ka wā o ka hana wela kiʻekiʻe.

4. Kiʻekiʻe Maʻemaʻe SiC Coating:ʻO kā mākou substrate e hōʻoia i ka liʻiliʻi o ka haumia i nā kaʻina semiconductor koʻikoʻi, e hāʻawi ana i ka hilinaʻi no nā ʻoihana e koi ana i ka maʻemaʻe maʻemaʻe.

5. Noi makeke akea:ʻO kaSusceptor graphite i uhi ʻia ʻo SiCKe hoʻomau nei ka mākeke i ka piʻi ʻana o ka noi no nā huahana SiC coated kiʻekiʻe i ka hana semiconductor, hoʻonoho i kēia substrate ma ke ʻano he mea pāʻani nui ma ka mākeke wafer graphite a me ka mākeke graphite trays silicon carbide coated.

Nā ʻano maʻamau o ka Material Graphite Base:

ʻIke ʻia ka mānoanoa: 1.85 g/cm3
Ke kū'ē uila: 11 μΩm
ʻO ke koʻikoʻi ʻoluʻolu: 49 MPa (500kgf/cm2)
Paʻa Paʻa: 58
lehu: <5ppm
ʻO ka wela wela: 116 W/mK (100 kcal/mhr- ℃)

 

CVD SiC薄膜基本物理性能

Nā waiwai kino kumu o CVD SiCka uhi ʻana

性质 / Waiwai

典型数值 / Waiwai maʻamau

晶体结构 / Kahua Crystal

FCC β phase 多晶,主要为(111)取向

密度 / Density

3.21 g/cm³

硬度 / Paʻakiki

2500 维氏硬度(500g load)

晶粒大小 / Grain SiZe

2~10μm

纯度 / Maʻemaʻe Kemika

99.99995%

热容 / Kaha Wela

640 J·kg-1·K-1

升华温度 / Kaumaha Sublimation

2700 ℃

抗弯强度 / Ikaika Flexural

415 MPa RT 4-point

杨氏模量 / Young's Modulus

430 Gpa 4pt piko, 1300 ℃

导热系数 / Hoʻokaʻawale wela

300W·m-1·K-1

热膨胀系数 / Hoʻonui Thermal(CTE)

4.5×10-6K-1

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ʻO VET Energy ka mea hana maoli i nā huahana graphite a me nā silicon carbide me nā ʻāpana like ʻole e like me ka uhi SiC, ka uhi TaC, ka uhi kalapona aniani, ka uhi kalapona pyrolytic, a me nā mea ʻē aʻe, hiki ke hāʻawi i nā ʻāpana like ʻole no ka semiconductor a me ka ʻoihana photovoltaic.

Hele mai kā mākou hui ʻenehana mai nā keʻena noiʻi kūloko kiʻekiʻe, hiki iā ia ke hāʻawi i nā hoʻonā ʻoihana ʻoihana hou aku no ʻoe.

Hoʻomohala mau mākou i nā kaʻina hana kiʻekiʻe e hāʻawi i nā mea ʻoi aku ka holomua, a ua hana mākou i kahi ʻenehana patented kūʻokoʻa, hiki ke hoʻoikaika i ka paʻa ʻana ma waena o ka uhi a me ka substrate a ʻoi aku ka liʻiliʻi o ka wehe.

Hoʻokipa maikaʻi iā ʻoe e kipa i kā mākou hale hana, e kūkākūkā hou kāua!

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