INKINGA YOKUSEBENZA
Ukusetshenziswa komkhiqizo nokusebenza Izicelo zomkhiqizo kanye nokusetshenziswa
I-Si single crystal industry, i-GaN, i-AlN, isafire nezinye izisekelo ze-MOCVD. -I-graphite base coating yokukhula kwe-crystal silicon epitaxial eyodwa
Ukusebenza okuyinhloko: ukuhlanzeka okuphezulu, ukumelana nokuguguleka, ukuguquguquka okuphezulu kwe-thermal, - Inqubo ye-MOCVD, isisekelo se-graphite sokuhlanganisa ukukhula kwe-GaN epitaxial
ukumelana nokushisa okuphezulu, i-coefficient ephansi yokwandisa okushisayo.
I-Thermal Conductivity | 250 W/m °K | Indlela ye-Laser flash, RT |
I-Thermal Expansion (CTE) | 4.5 x 10-6°K | Izinga lokushisa legumbi liye ku-950 °C, i-silica dilatometer |
Impahla | Inani | Indlela |
Ukuminyana | 3.21 g/cc | Sink-float kanye nobukhulu |
Ukushisa okuqondile | 0.66 J/g °K | I-Pulsed laser flash |
Amandla e-Flexural | 450 MPa560 MPa | 4 iphuzu ukugoba, RT4 iphuzu ukugoba, 1300° |
Ukuqina kokuphuka | 2.94 MPa m1/2 | I-Microindentation |
Ukuqina | 2800 | Vicker, 500g umthwalo |
I-Elastic ModulusYoung's Modulus | 450 GPA430 GPA | 4 pt ukugoba, RT4 pt ukugoba, 1300 °C |
Usayizi wokusanhlamvu | 2 - 10µm | I-SEM |
Ukuhlanzeka, Isakhiwo se-SEM, ukuhlaziywa kokuqina kweUkufakwa kwe-SiC
Ukuhlanzeka kwezingubo ze-SiC ku-graphite ngokusebenzisa i-CVD kuphezulu njenge-99.9995%. Isakhiwo sayo yi-fcc. Amafilimu e-SiC ahlanganiswe ku-graphite (111) aqondiswe njengoba kuboniswe kudatha ye-XRD (Fig.1) ebonisa ikhwalithi yayo ephezulu ye-crystalline. Ubukhulu befilimu ye-SiC bufana kakhulu njengoba kuboniswe ku-Fig. 2.
Umfanekiso 2: iyunifomu yokuqina yamafilimu e-SiC
Isakhiwo sekristalu sefilimu ye-CVD SiC yisakhiwo se-cubic esigxile ebusweni, futhi ukuqondisa kokukhula kwefilimu kusondele ku-100%
I-SEM ne-XRD yefilimu ye-beta-SiC ku-graphite
I-SINGLE CRYSTAL SILICON EPITAXIAL BASE
Ukusebenza komkhiqizo kanye namathemba ohlelo lokusebenza.
I-Silicon carbide (SiC) ihlanganisweisisekelo siyisisekelo esingcono kakhulu se-crystal silicon eyodwa ne-GaN epitaxy, okuyingxenye eyinhloko yesithando somlilo se-epitaxy. Isisekelo siyisisetshenziswa esibalulekile sokukhiqiza se-silicon ye-monocrystalline yamasekethe amakhulu ahlanganisiwe. Inobumsulwa obuphezulu, ukumelana nokushisa okuphezulu, ukumelana nokugqwala, ukucinana komoya okuhle nezinye izici ezinhle kakhulu zempahla.
Isicelo kanye nokusetshenziswa komkhiqizo
Isisekelo se-graphite sokukhula kwe-crystal silicon epitaxial eyodwaIfanele imishini ye-Aixtron, njll Ugqinsi lwe-Coating: 90~150umUbubanzi be-wafer crater ngu-55mm.
I-SOLAR PHOTOVOLTAIC
I-GAupidpelitcubaetiaonnd
i-graphite crucible coatingye-crystal silicon eyodwa ngendlela yokudonsa okuqondile
Kungani ukhethe thina
Imishini yobuchwepheshe nethimba
I-workshop ye-Class 1000 engenazo izintuli
Isevisi esheshayo
Ngethegi ye-oda langaphambili, ithimba lethu labadayisi elichwepheshile lingaphendula umbuzo wakho phakathi kwemizuzu engama-50-100 phakathi namahora okusebenza naphakathi kwamahora ayi-12 phakathi nesikhathi sokuvala. Impendulo esheshayo nechwepheshile izokusiza ukuthi uwine iklayenti lakho ngenketho ekahle ekusebenzeni kahle okuphezulu.
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