Okokuqala, sidinga ukwaziI-PECVD(I-Plasma Enhanced Chemical Vapor Deposition). I-Plasma iwukuqiniswa kokunyakaza okushisayo kwama-athomu. Ukungqubuzana phakathi kwabo kuzobangela ukuthi ama-molecule egesi abe yi-ionized, futhi impahla izoba yingxube yama-ion ahamba ngokukhululekile, ama-electron kanye nezinhlayiya ezingathathi hlangothi ezisebenzisana nomunye nomunye.
Kulinganiselwa ukuthi izinga lokulahlekelwa kwesibonisi sokukhanya endaweni ye-silicon liphezulu cishe cishe ngama-35%. Ifilimu elimelene ne-reflection lingathuthukisa kakhulu izinga lokusetshenziswa kokukhanya kwelanga ngeseli yebhethri, esiza ukukhulisa ukuminyana kwamanje okukhiqizwe isithombe futhi ngaleyo ndlela kuthuthukise ukusebenza kahle kokuguqulwa. Ngesikhathi esifanayo, i-hydrogen esefilimini idlula ngaphezulu kweseli yebhethri, yehlisa izinga lokuhlanganiswa kabusha kwendawo okuhlangana kuyo i-emitter, inciphisa ubumnyama bamanje, ikhuphule i-voltage yesekethe evulekile, futhi ithuthukise ukusebenza kahle kokuguqulwa kwe-photoelectric. I-annealing esheshayo yezinga eliphezulu lokushisa enqubweni yokusha kwephula amanye amabhondi e-Si-H kanye ne-NH, futhi u-H okhululiwe uqinisa futhi amandla ebhethri.
Njengoba izinto ze-silicon zebanga le-photovoltaic ziqukethe inani elikhulu lokungcola kanye nokukhubazeka, isikhathi sempilo yenkampani yenethiwekhi encane kanye nobude bokusabalalisa ku-silicon buyancishiswa, okuholela ekwehleni kokuguqula ukusebenza kahle kwebhethri. H ingasabela ngokukhubazeka noma ukungcola ku-silicon, ngaleyo ndlela idlulisele ibhande lamandla ku-bandgap kuyibhendi ye-valence noma ibhendi yokuqhuba.
1. Isimiso se-PECVD
Uhlelo lwe-PECVD luwuchungechunge lwamajeneretha asetshenziswayoIsikebhe se-graphite se-PECVD kanye ne-high-frequency plasma exciters. I-generator ye-plasma ifakwe ngokuqondile phakathi kwepuleti yokugqoka ukuze isabele ngaphansi kwengcindezi ephansi kanye nokushisa okuphezulu. Amagesi asebenzayo asetshenziswa i-silane SiH4 kanye ne-ammonia NH3. Lawa magesi asebenza ku-silicon nitride egcinwe ku-silicon wafer. Izinkomba ze-refractive ezihlukene zingatholakala ngokushintsha isilinganiso se-silane kuya ku-ammonia. Ngesikhathi senqubo yokubeka, inani elikhulu lama-athomu e-hydrogen nama-ion e-hydrogen akhiqizwa, okwenza ukudlula kwe-hydrogen kwe-wafer kube kuhle kakhulu. Ku-vacuum kanye nezinga lokushisa elizungezile elingu-480 degrees Celsius, ungqimba lwe-SixNy lumbozwa phezu kwewafa ye-silicon ngokwenzaIsikebhe se-graphite se-PECVD.
3SiH4+4NH3 → Si3N4+12H2
2. Si3N4
Umbala wefilimu iSi3N4 uyashintsha ngokujiya kwayo. Ngokuvamile, ukujiya okuhle kuphakathi kuka-75 no-80 nm, okubonakala kuluhlaza okwesibhakabhaka okumnyama. Inkomba ye-refractive yefilimu ye-Si3N4 ihamba phambili phakathi kuka-2.0 no-2.5. Utshwala ngokuvamile busetshenziselwa ukukala inkomba ye-refractive.
Umphumela omuhle kakhulu wokudlula indawo, ukusebenza kahle kwe-optical anti-reflection (ukuqina kwenkomba ye-refractive index), inqubo yokushisa ephansi (eyehlisa ngempumelelo izindleko), kanye nama-H akhiqiziwe adlula i-silicon wafer surface.
3. Izindaba ezijwayelekile ku-coating workshop
Ukujiya kwefilimu:
Isikhathi sokubeka sihlukile kubukhulu befilimu obuhlukene. Isikhathi sokubeka kufanele sikhuliswe ngokufanelekile noma sincishiswe ngokuya ngombala we-coating. Uma ifilimu imhlophe, isikhathi sokufakwa kufanele sincishiswe. Uma ibomvu, kufanele ikhuliswe ngokufanelekile. Isikebhe ngasinye samafilimu kufanele siqinisekiswe ngokugcwele, futhi imikhiqizo enesici ayivunyelwe ukugeleza kunqubo elandelayo. Isibonelo, uma okunamathelayo kungalungile, njengamachashaza ombala nama-watermark, ukucwenga kwendawo okuvame kakhulu, umehluko wombala, namachashazi amhlophe emugqeni wokukhiqiza kufanele kukhethwe ngesikhathi. Ubumhlophe obungaphezulu bubangelwa ikakhulukazi ifilimu ewugqinsi ye-silicon nitride, engalungiswa ngokulungisa isikhathi sokubeka ifilimu; ifilimu yomehluko wombala ibangelwa ikakhulukazi ukuvinjwa kwendlela yegesi, ukuvuza kweshubhu ye-quartz, ukwehluleka kwe-microwave, njll.; amachashaza amhlophe abangelwa ikakhulukazi amachashaza amancane amnyama enqubweni yangaphambilini. Ukuqapha ukubukeka, inkomba ye-refractive, njll., ukuphepha kwamagesi akhethekile, njll.
Amabala amhlophe ebusweni:
I-PECVD iyinqubo ebaluleke kakhulu kumaseli elanga kanye nenkomba ebalulekile yokusebenza kahle kwamaseli elanga enkampani. Inqubo ye-PECVD ivamise ukuba matasa, futhi iqoqo ngalinye lamaseli lidinga ukugadwa. Kunamashubhu amaningi esithandweni somlilo, futhi ishubhu ngalinye ngokuvamile linamakhulu amaseli (kuya ngemishini). Ngemva kokushintsha amapharamitha enqubo, umjikelezo wokuqinisekisa mude. Ubuchwepheshe be-coating ubuchwepheshe imboni yonke ye-photovoltaic ihlanganisa ukubaluleka okukhulu kubo. Ukusebenza kahle kwamaseli elanga kungathuthukiswa ngokuthuthukisa ubuchwepheshe bokugqoka. Ngokuzayo, ubuchwepheshe be-solar cell surface bungase bube impumelelo ekusebenzeni kahle kwethiyori yamaseli elanga.
Isikhathi sokuthumela: Dec-23-2024