Chemical vapor deposition (CVD) inzira inosanganisira kuisa bhaisikopo rakasimba pamusoro pesilicon wafer kuburikidza nekemikari kuita kwegasi musanganiswa. Iyi nzira inogona kupatsanurwa kuita yakasanganiswa michina modhi inomisikidzwa pane akasiyana makemikari maitiro akadai sekumanikidza uye precursor.
Michina miviri iyi inoshandiswa sei?PECVD (Plasma Enhanced) midziyo inoshandiswa zvakanyanya mukushandisa seOX, Nitride, metallic element gedhi, uye amorphous kabhoni. Kune rimwe divi, LPCVD (Low Power) inowanzo shandiswa kuNitride, poly, uye TEOS.
Chii chiri musimboti?PECVD tekinoroji inosanganisa plasma simba uye CVD nekushandisa yakaderera-tembiricha plasma kuti iite kutsva kuburitswa pane cathode yekamuri yekuita. Izvi zvinorega kudzora kemikari uye plasma kemikari kuita kuti iite bhaisikopo rakasimba pane iyo sampuli yepamusoro. Saizvozvo, LPCVD iri hurongwa hwekushanda pakudzikisa kemikari reaction gasi kudzvanywa mune reactor.
kuita munhu AI: Kushandiswa kweHumanize AI mumunda weCVD tekinoroji kunogona kuwedzera zvakanyanya kushanda uye kurongeka kwemafirimu deposition maitiro. Nekuwedzera AI algorithm, iyo yekutarisa uye gadziriso yeparameter senge ion parameter, gasi kuyerera mwero, tembiricha, uye bhaisikopo ukobvu kunogona kukwirisa kune zvirinani mhedzisiro.
Nguva yekutumira: Oct-24-2024