Chemical Vapor Deposition (CVD) yakakosha yakaonda firimu deposition tekinoroji, inowanzoshandiswa kugadzirira akasiyana siyana anoshanda mafirimu uye nhete-layer zvinhu, uye inoshandiswa zvakanyanya mukugadzira semiconductor uye mamwe minda.
1. Kushanda nheyo yeCVD
Muchiitiko cheCVD, gasi precursor (imwe kana anopfuura gaseous precursor compounds) inounzwa kusangana neiyo substrate pamusoro uye inopisa kune imwe tembiricha kukonzeresa kuita kemikari uye kuisa pane substrate pamusoro kuti igadzire firimu raunoda kana kupfekwa. layer. Chibereko cheiyi kemikari reaction yakasimba, kazhinji kacho musanganiswa wezvinhu zvinodiwa. Kana tichida kunamira silicon kumusoro, tinogona kushandisa trichlorosilane (SiHCl3) seyakatangira gasi: SiHCl3 → Si + Cl2 + HCl Silicon inosunga kune chero nzvimbo yakafumurwa (zvemukati nekunze), nepo chlorine uye hydrochloric acid magasi achaita. kuburitswa mukamuri.
2. CVD classification
Thermal CVD: Nekupisa iyo precursor gasi kuti iparadze uye kuiisa pane substrate pamusoro. Plasma Enhanced CVD (PECVD): Plasma inowedzerwa kune inopisa CVD kuti iwedzere maitiro ekuita uye kutonga maitiro ekuisa. Metal Organic CVD (MOCVD): Kushandisa metal organic compounds semagasi anotangira, mafirimu matete esimbi uye semiconductors anogona kugadzirwa, uye anowanzoshandiswa mukugadzira michina yakaita se LED.
3. Kushandisa
(1) Semiconductor kugadzira
Silicide film: inoshandiswa kugadzira insulating layers, substrates, isolation layers, etc. Nitride film: inoshandiswa kugadzira silicon nitride, aluminium nitride, nezvimwewo, inoshandiswa mu LEDs, magetsi emagetsi, etc. Metal film: inoshandiswa kugadzira conductive layers, metallized layers, etc.
(2) Ratidza tekinoroji
ITO firimu: Transparent conductive oxide firimu, rinowanzo shandiswa mumafurati epaneru anoratidza uye ekubata skrini. Firimu remhangura: rinoshandiswa kugadzirira machira ekurongedza, mitsara inoitisa, nezvimwe, kuvandudza mashandiro emidziyo yekuratidzira.
(3) Mimwe minda
Optical coatings: kusanganisira anti-reflective coatings, optical filters, etc. Anti-corrosion coating: inoshandiswa muzvikamu zvemotokari, zvigadziridzo zvemhepo, nezvimwewo.
4. Hunhu hweCVD process
Shandisa yakakwira tembiricha nharaunda kusimudzira kukurumidza kuita. Kazhinji inoitwa munzvimbo ine vacuum. Kusvibiswa kwepamusoro pechikamu kunofanira kubviswa pamberi pekupenda. Maitiro acho anogona kunge aine zvisingakwanisi pane ma substrates anogona kuvharwa, kureva kudzikamisa tembiricha kana kuganhurwa kwekuitazve. Iyo CVD yekuvhara ichavhara nzvimbo dzese dzechikamu, kusanganisira tambo, mapofu maburi uye mukati memukati. Inogona kudzikisira kugona kuvhara nzvimbo dzakanangwa. Ukobvu hwefirimu hunoganhurwa nemaitiro uye mamiriro ezvinhu. Superior adhesion.
5. Zvakanakira zveCVD tekinoroji
Uniformity: Inokwanisa kuwana yunifomu deposition pamusoro penzvimbo huru substrates.
Kudzora: The deposition rate uye firimu zvivakwa zvinogona kugadziridzwa nekudzora kuyerera kweyero uye tembiricha yeinotangira gasi.
Versatility: Inokodzera kuiswa kwezvinhu zvakasiyana-siyana, sesimbi, semiconductors, okisidhi, nezvimwe.
Nguva yekutumira: Chivabvu-06-2024