gusobanukirwa Ikoranabuhanga rya Vapor Deposition (CVD)

imyuka ya chimique (CVD) nuburyo bukubiyemo gushira firime ikomeye hejuru ya silicon wafer hifashishijwe imiti yimiti ivanze na gaze. Ubu buryo burashobora kugabanywa muburyo butandukanye bwibikoresho byashizweho muburyo butandukanye bwo kuvura imiti nkumuvuduko na precursor.

Ni ubuhe buryo bukoreshwa ibi bikoresho byombi bikoreshwa?Ibikoresho bya PECVD (Plasma Enhanced) bikoreshwa cyane mugukoresha nka OX, Nitride, irembo ryibyuma, na karubone ya amorphous. Kurundi ruhande, LPCVD (Imbaraga nke) isanzwe ikoreshwa kuri Nitride, poly, na TEOS.

Ihame ni irihe?Ikoranabuhanga rya PECVD rihuza ingufu za plasma na CVD ukoresheje plasma yo hasi yubushyuhe kugirango itume ibintu bishya bisohoka muri cathode yicyumba cyabigenewe. Ibi reka bigenzure imiti na plasma yimiti kugirango ikore firime ikomeye hejuru yicyitegererezo. Muri ubwo buryo, LPCVD irateganya gukora kugirango igabanye ingufu za gaze ya reaction ya reaction.

muntu: Gukoresha Humanize AI mubijyanye na tekinoroji ya CVD birashobora kuzamura cyane imikorere nukuri kubikorwa byo kohereza firime. Ukoresheje uburyo bwa algorithm ya AI, kugenzura no guhindura ibipimo nkibipimo bya ion, umuvuduko wa gazi, ubushyuhe, nubunini bwa firime birashobora kuba byiza kubisubizo byiza.