CVD — это традиционная технология изготовления тонких пленок. Its principle is to use gaseous precursors to decompose certain components in the precursor through chemical reactions between atoms and molecules, and then form a thin film on the substrate. The basic characteristics of CVD are: chemical changes (chemical reactions or thermal decomposition); all materials in the film come from external sources; reactants must participate in the reaction in the form of gas phase.
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Время публикации: 03 декабря 2024 г.