VET Energy cov khoom lag luam tsis txwv rau GaN ntawm SiC wafers. Peb kuj muab ntau yam khoom siv semiconductor substrate, suav nrog Si Wafer, SiC Substrate, SOI Wafer, SiN Substrate, Epi Wafer, thiab lwm yam. Tsis tas li ntawd, peb tseem nquag tsim cov ntaub ntawv dav dav ntawm cov khoom siv semiconductor, xws li Gallium Oxide Ga2O3 thiab AlN. Wafer, kom ua tau raws li lub zog hluav taws xob yav tom ntej kev lag luam hluav taws xob qhov kev thov rau cov cuab yeej ua haujlwm siab dua.
VET Energy muab cov kev pabcuam hloov kho tau yooj yim, thiab tuaj yeem kho GaN epitaxial txheej ntawm cov thicknesses sib txawv, ntau hom doping, thiab sib txawv wafer ntau thiab tsawg raws li cov kev xav tau tshwj xeeb ntawm cov neeg siv khoom. Tsis tas li ntawd, peb kuj muab kev pabcuam kev tshaj lij thiab kev pabcuam tomqab muag los pab cov neeg siv khoom sai sai tsim cov khoom siv hluav taws xob ua haujlwm siab.
WAFFERING SPECIFICATIONS
*n-Pm=n-type Pm-Grade,n-Ps=n-type Ps-Qib,Sl=Semi-lnsulating
Yam khoom | 8-Inch | 6-Inch | 4-Inch | ||
np | n- Pm | n-Ps | SI | SI | |
TVV (GBIR) | ≤ 6 hli | ≤ 6 hli | |||
Hneev (GF3YFCD) - Tus Nqi Tsis Muaj | ≤15μm | ≤15μm | ≤ 25μm | ≤15μm | |
Warp (GF3YFER) | ≤ 25μm | ≤ 25μm | ≤ 40μm | ≤ 25μm | |
LTV (SBIR)-10mmx10mm | < 2 m os | ||||
Wafer Ntug | Beveling |
NTAU NTAU
*n-Pm=n-type Pm-Grade,n-Ps=n-type Ps-Qib,Sl=Semi-lnsulating
Yam khoom | 8-Inch | 6-Inch | 4-Inch | ||
np | n- Pm | n-Ps | SI | SI | |
Nto tiav | Ob chav sab Optical Polish, Si- ntsej muag CMP | ||||
SurfaceRoughness | (10um x 10um) Si-FaceRa≤0.2nm | (5umx5um) Si-Face Ra≤0.2nm | |||
Ntug Chips | Tsis Muaj Kev Tso Cai (ntev thiab dav ≥0.5mm) | ||||
Indents | Tsis Muaj Tso Cai | ||||
Scratches (Si-Face) | Qty.≤ 5, Ua kom tiav | Qty.≤ 5, Ua kom tiav | Qty.≤ 5, Ua kom tiav | ||
Kev tawg | Tsis Muaj Tso Cai | ||||
Ntug Exclusion | 3mm ib |