Vet-KinaSilika Carbide CeramicʻO ka uhiʻana he mea pale pale hana kiʻekiʻe i hanaʻia me ka paʻakikī loa a me kaʻaʻahukalapona kalapona (SiC)mea, e hāʻawi maikaʻi loa i ke kino corrosion kū'ē a kiʻekiʻe-mehana paʻa. He mea koʻikoʻi kēia mau hiʻohiʻona i ka hana semiconductor, no lailaʻO Silicon Carbide i uhi ʻiahoʻohana nui ʻia i nā ʻāpana koʻikoʻi o nā lako hana semiconductor.
ʻO ke kuleana kūikawā o Vet-ChinaSilika Carbide CeramicʻO ka uhi ʻana i ka hana semiconductor penei:
Hoʻonui i ka lōʻihi o nā mea hana:Hāʻawi ka Silicon Carbide Ceramic Coating Silicon Carbide Ceramic Coating i ka pale ʻana o ka ʻili no nā lako hana semiconductor me kona ʻano paʻakikī kiʻekiʻe loa a me ke kūpaʻa ʻana. ʻOi loa i nā kaʻina hana kiʻekiʻe a me ka corrosive nui, e like me ka chemical vapor deposition (CVD) a me ka plasma etching, hiki i ka uhi ke pale pono i ka ʻili o nā mea hana mai ka pōʻino ʻia e ka chemical erosion a i ʻole ka lole kino, no laila e hoʻolōʻihi i ke ola o ka lawelawe. nā mea hana a me ka ho'ēmiʻana i ka manawa hoʻomaha ma muli o ka hoʻololi pinepine a me ka hoʻoponopono.
E hoʻomaikaʻi i ka maʻemaʻe kaʻina hana:I ke kaʻina hana semiconductor, hiki i ka hoʻohaumia liʻiliʻi ke kumu i nā hemahema o ka huahana. ʻO ka inertness kemika o Silicon Carbide Ceramic Coating e hiki ai iā ia ke noho paʻa ma lalo o nā kūlana koʻikoʻi, e pale ana i ka mea mai ka hoʻokuʻu ʻana i nā ʻāpana a i ʻole nā mea haumia, e hōʻoiaʻiʻo ai i ka maʻemaʻe o ke kaiapuni o ke kaʻina hana. He mea koʻikoʻi kēia no ka hana ʻana i nā ʻanuʻu e koi ai i ka pololei kiʻekiʻe a me ka maʻemaʻe kiʻekiʻe, e like me ka PECVD a me ka implantation ion.
Hoʻonui i ka hoʻokele wela:I ka hana semiconductor wela kiʻekiʻe, e like me ka hoʻoili wela wikiwiki (RTP) a me nā kaʻina oxidation, ʻo ka conductivity thermal kiʻekiʻe o Silicon Carbide Ceramic Coating e hiki ai i ka hoʻohele like ʻana o ka mahana i loko o nā mea hana. Kōkua kēia i ka hoʻohaʻahaʻa ʻana i ke kaumaha wela a me ka deformation waiwai i hoʻokumu ʻia e ka piʻi ʻana o ka mahana, a laila e hoʻomaikaʻi ai i ka pololei o ka hana ʻana o ka huahana.
Kākoʻo i nā kaʻina hana paʻakikī:I nā kaʻina hana e koi ai i ka hoʻokele lewa paʻakikī, e like me ka ICP etching a me nā kaʻina hana etching PSS, ʻo ke kūpaʻa a me ka pale ʻana o ka oxidation o Silicon Carbide Ceramic Coating e hōʻoia i ka mālama ʻana o nā mea hana i ka hana paʻa i ka hana lōʻihi, e hōʻemi ana i ka hopena o ka hoʻohaʻahaʻa ʻana i ka waiwai a i ʻole ka pōʻino o nā lako. i nā hoʻololi kaiapuni.
CVD SiC薄膜基本物理性能 Nā waiwai kino kumu o CVD SiCka uhi ʻana | |
性质 / Waiwai | 典型数值 / Waiwai maʻamau |
晶体结构 / Hoʻomoe Crystal | Māhele FCC β多晶,主要为(111)取向 |
密度 / Paʻa | 3.21 g/cm³ |
硬度 / Oolea | 2500 维氏硬度(500g load) |
晶粒大小 / ʻAiʻa palaoa | 2~10μm |
纯度 / Maemae Kemika | 99.99995% |
热容 / Hikina Wela | 640 J·kg-1·K-1 |
升华温度 / Kaumaha Sublimation | 2700 ℃ |
抗弯强度 / Ka Ikaika Pilikia | 415 MPa RT 4-point |
杨氏模量 / 'Ōpio's Modulus | 430 Gpa 4pt piko, 1300 ℃ |
导热系数 / ThermalʻO ka hoʻokō | 300W·m-1·K-1 |
热膨胀系数 / Hoʻonui wela (CTE) | 4.5×10-6K-1 |
Hoʻokipa maikaʻi iā ʻoe e kipa i kā mākou hale hana, e kūkākūkā hou kāua!