ka mea hoʻoheheʻe kiʻekiʻe kiʻekiʻe

ʻO ka wehewehe pōkole:

Ma ke ʻano he loea Silicon Carbide Ceramic Coating mea hana a me ka mea hoʻolako ma Kina, Vet-China's Silicon Carbide Ceramic Coating ua hoʻohana nui ʻia ma nā ʻāpana koʻikoʻi o nā lako hana semiconductor, ʻoi aku ka nui o nā kaʻina CVD a me PECVD. Hoʻokumu ʻo Vet-China i ka hana ʻana a me ka hoʻolako ʻana i ka Silicon Carbide Ceramic Coating kiʻekiʻe, a ua kūpaʻa ʻo ia i ka hoʻolako ʻana i nā ʻenehana holomua a me nā hopena huahana no ka ʻoihana semiconductor. Welina mai i kāu mau nīnau.


Huahana Huahana

Huahana Huahana

Vet-KinaSilika Carbide CeramicʻO ka uhiʻana he mea pale pale hana kiʻekiʻe i hanaʻia me ka paʻakikī loa a me kaʻaʻahukalapona kalapona (SiC)mea, e hāʻawi maikaʻi loa i ke kino corrosion kū'ē a kiʻekiʻe-mehana paʻa. He mea koʻikoʻi kēia mau hiʻohiʻona i ka hana semiconductor, no lailaʻO Silicon Carbide i uhi ʻiahoʻohana nui ʻia i nā ʻāpana koʻikoʻi o nā lako hana semiconductor.

ʻO ke kuleana kūikawā o Vet-ChinaSilika Carbide CeramicʻO ka uhi ʻana i ka hana semiconductor penei:

Hoʻonui i ka lōʻihi o nā mea hana:Hāʻawi ka Silicon Carbide Ceramic Coating Silicon Carbide Ceramic Coating i ka pale ʻana o ka ʻili no nā lako hana semiconductor me kona ʻano paʻakikī kiʻekiʻe loa a me ke kūpaʻa ʻana. ʻOi loa i nā kaʻina hana kiʻekiʻe a me ka corrosive nui, e like me ka chemical vapor deposition (CVD) a me ka plasma etching, hiki i ka uhi ke pale pono i ka ʻili o nā mea hana mai ka pōʻino ʻia e ka chemical erosion a i ʻole ka lole kino, no laila e hoʻolōʻihi i ke ola o ka lawelawe. nā mea hana a me ka ho'ēmiʻana i ka manawa hoʻomaha ma muli o ka hoʻololi pinepine a me ka hoʻoponopono.

E hoʻomaikaʻi i ka maʻemaʻe kaʻina hana:I ke kaʻina hana semiconductor, hiki i ka hoʻohaumia liʻiliʻi ke kumu i nā hemahema o ka huahana. ʻO ka inertness kemika o Silicon Carbide Ceramic Coating e hiki ai iā ia ke noho paʻa ma lalo o nā kūlana koʻikoʻi, e pale ana i ka mea mai ka hoʻokuʻu ʻana i nā ʻāpana a i ʻole nā ​​​​mea haumia, e hōʻoiaʻiʻo ai i ka maʻemaʻe o ke kaiapuni o ke kaʻina hana. He mea koʻikoʻi kēia no ka hana ʻana i nā ʻanuʻu e koi ai i ka pololei kiʻekiʻe a me ka maʻemaʻe kiʻekiʻe, e like me ka PECVD a me ka implantation ion.

Hoʻonui i ka hoʻokele wela:I ka hana semiconductor wela kiʻekiʻe, e like me ka hoʻoili wela wikiwiki (RTP) a me nā kaʻina oxidation, ʻo ka conductivity thermal kiʻekiʻe o Silicon Carbide Ceramic Coating e hiki ai i ka hoʻohele like ʻana o ka mahana i loko o nā mea hana. Kōkua kēia i ka hoʻohaʻahaʻa ʻana i ke kaumaha wela a me ka deformation waiwai i hoʻokumu ʻia e ka piʻi ʻana o ka mahana, a laila e hoʻomaikaʻi ai i ka pololei o ka hana ʻana o ka huahana.

Kākoʻo i nā kaʻina hana paʻakikī:I nā kaʻina hana e koi ai i ka hoʻokele lewa paʻakikī, e like me ka ICP etching a me nā kaʻina hana etching PSS, ʻo ke kūpaʻa a me ka pale ʻana o ka oxidation o Silicon Carbide Ceramic Coating e hōʻoia i ka mālama ʻana o nā mea hana i ka hana paʻa i ka hana lōʻihi, e hōʻemi ana i ka hopena o ka hoʻohaʻahaʻa ʻana i ka waiwai a i ʻole ka pōʻino o nā lako. i nā hoʻololi kaiapuni.

ka uhi ʻia ʻana o ka silika carbide
Mea hoʻomehana graphite (4)

CVD SiC薄膜基本物理性能

Nā waiwai kino kumu o CVD SiCka uhi ʻana

性质 / Waiwai

典型数值 / Waiwai maʻamau

晶体结构 / Hoʻomoe Crystal

Māhele FCC β多晶,主要为(111)取向

密度 / Paʻa

3.21 g/cm³

硬度 / Oolea

2500 维氏硬度(500g load)

晶粒大小 / ʻAiʻa palaoa

2~10μm

纯度 / Maemae Kemika

99.99995%

热容 / Hikina Wela

640 J·kg-1·K-1

升华温度 / Kaumaha Sublimation

2700 ℃

抗弯强度 / Ka Ikaika Pilikia

415 MPa RT 4-point

杨氏模量 / 'Ōpio's Modulus

430 Gpa 4pt piko, 1300 ℃

导热系数 / ThermalʻO ka hoʻokō

300W·m-1·K-1

热膨胀系数 / Hoʻonui wela (CTE)

4.5×10-6K-1

1

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