Monocrystalline 8 Iniha Silicon Wafer

ʻO ka wehewehe pōkole:

ʻO VET Energy hoʻokahi aniani 8-ʻīniha silicon wafer he mea maʻemaʻe kiʻekiʻe, kiʻekiʻe semiconductor kumu. Hoʻohana ʻo VET Energy i ke kaʻina ulu CZ holomua e hōʻoia i ka maikaʻi o ka wafer maikaʻi loa, ka haʻahaʻa haʻahaʻa haʻahaʻa a me ke kūlike kiʻekiʻe, e hāʻawi ana i kahi substrate paʻa a hilinaʻi no kāu mau mea semiconductor.


Huahana Huahana

Huahana Huahana

ʻO ka Monocrystalline 8 Inch Silicon Wafer mai VET Energy kahi hopena alakaʻi alakaʻi no ka semiconductor a me nā mea uila uila. Ke hāʻawi nei i ka maʻemaʻe maikaʻi a me ka hoʻolālā crystalline, kūpono kēia mau wafers no nā noi hana kiʻekiʻe ma nā ʻoihana photovoltaic a me semiconductor. Hoʻomaopopo ʻo VET Energy i ka hana ʻia ʻana o kēlā me kēia wafer e hoʻokō i nā kūlana kiʻekiʻe loa, e hāʻawi ana i ka lokahi maikaʻi a me ka hoʻopau ʻana i ka ʻili maʻemaʻe, he mea nui ia no ka hana ʻana i nā mea uila.

Ua kūpono kēia mau Monocrystalline 8 Inch Silicon Wafers me nā ʻano mea like ʻole, me Si Wafer, SiC Substrate, SOI Wafer, SiN Substrate, a kūpono loa ia no ka ulu ʻana o Epi Wafer. ʻO kā lākou ʻoi aku ka maikaʻi o ka thermal conductivity a me nā waiwai uila e koho pono iā lākou no ka hana kiʻekiʻe. Hoʻohui ʻia, ua hoʻolālā ʻia kēia mau wafers e hana maʻalahi me nā mea e like me Gallium Oxide Ga2O3 a me AlN Wafer, e hāʻawi ana i kahi ākea o nā noi mai ka uila uila a i nā polokalamu RF. Ua kūpono pū nā wafers i nā ʻōnaehana Cassette no nā kaiapuni hoʻomohala kiʻekiʻe.

ʻAʻole i kaupalena ʻia ka laina huahana o VET Energy i nā wafer silika. Hāʻawi pū mākou i kahi ākea o nā mea semiconductor substrate, me SiC Substrate, SOI Wafer, SiN Substrate, Epi Wafer, etc., a me nā mea semiconductor broadgap hou e like me Gallium Oxide Ga2O3 a me AlN Wafer. Hiki i kēia mau huahana ke hoʻokō i nā pono noi o nā mea kūʻai aku i ka uila uila, ka lekiō, nā sensor a me nā ʻano ʻē aʻe.

Hāʻawi ʻo VET Energy i nā mea kūʻai aku i nā hoʻonā wafer maʻamau. Hiki iā mākou ke hana i nā wafers me nā resistivity like ʻole, ka ʻike oxygen, ka mānoanoa, a me nā mea ʻē aʻe e like me nā pono kikoʻī o nā mea kūʻai aku. Eia kekahi, hāʻawi pū mākou i ke kākoʻo ʻenehana loea a me ka lawelawe ma hope o ke kūʻai aku e kōkua i nā mea kūʻai aku e hoʻoponopono i nā pilikia like ʻole i loaʻa i ka wā o ke kaʻina hana.

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OLELO HOOLAHA WAFERING

*n-Pm=n-type Pm-Grade,n-Ps=n-type Ps-Grade,Sl=Semi-lnsulating

'ikamu

8-Inika

6-Iniha

4-Iniha

nP

n-Pm

n-Ps

SI

SI

TTV(GBIR)

≤6um

≤6um

Kakaka (GF3YFCD)-Waiwai Loa

≤15μm

≤15μm

≤25μm

≤15μm

Warp(GF3YFER)

≤25μm

≤25μm

≤40μm

≤25μm

LTV(SBIR)-10mmx10mm

<2μm

Wafer Edge

ʻO ka beveling

ILI HOPE

*n-Pm=n-type Pm-Grade,n-Ps=n-type Ps-Grade,Sl=Semi-lnsulating

'ikamu

8-Inika

6-Iniha

4-Iniha

nP

n-Pm

n-Ps

SI

SI

Hoʻopau ʻili

ʻaoʻao ʻelua Optical Polish, Si- Face CMP

ʻAhaʻulaʻula

(10um x 10um) Si-FaceRa≤0.2nm
C-Face Ra≤ 0.5nm

(5umx5um) Si-Face Ra≤0.2nm
C-Face Ra≤0.5nm

ʻOpeʻa lihi

ʻAʻohe ʻae ʻia (lōʻihi a laula≥0.5mm)

Indents

ʻAʻole ʻae ʻia

Nā ʻōpala (Si-Face)

Ka nui.≤5, Huihui
Length≤0.5×wafer anawaena

Ka nui.≤5, Huihui
Length≤0.5×wafer anawaena

Ka nui.≤5, Huihui
Length≤0.5×wafer anawaena

māwae

ʻAʻole ʻae ʻia

Hoʻokuʻu Edge

3mm

tech_1_2_size
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