I-chemical vapor deposition (CVD) inqubo ehilela ukufaka imuvi eqinile endaweni eyisicwecwana se-silicon ngokusabela kwamakhemikhali engxube yegesi. Le nqubo ingahlukaniswa ibe yimodeli yemishini ehlukahlukene esungulwe ezimeni ezihlukene zokusabela kwamakhemikhali njengokucindezela kanye nesandulela.
Iyiphi inqubo le mishini emibili esetshenziselwa yona?Imishini ye-PECVD (i-Plasma Enhanced) isetshenziswa kabanzi ekusetshenzisweni njenge-OX, i-Nitride, isango lesici sensimbi, ne-amorphous carbon. Ngakolunye uhlangothi, i-LPCVD ( Amandla Aphansi ) ngokuvamile isetshenziselwa i-Nitride, i-poly, ne-TEOS.
Siyini isimiso?Ubuchwepheshe be-PECVD buhlanganisa amandla e-plasma kanye ne-CVD ngokuxhaphaza i-plasma enezinga lokushisa eliphansi ukuze kukhishwe ukukhishwa okusha ku-cathode yegumbi lenqubo. Lokhu kuvumela ukulawula ukusabela kwamakhemikhali e-plasma ukwenza ifilimu eqinile endaweni eyisampula. Ngokufanayo, i-LPCVD ihlela ukusebenza ekwehliseni ingcindezi yegesi yokusabela kwamakhemikhali ku-reactor.
yenza i-AI ibe ngumuntu: Ukusetshenziswa kwe-Humanize AI emkhakheni wobuchwepheshe be-CVD kungathuthukisa kakhulu ukusebenza kahle nokunemba kwenqubo yokubeka i-movie. Ngokusebenzisa i-algorithm ye-AI, ukuqapha nokulungiswa kwepharamitha efana nepharamitha ye-ion, izinga lokugeleza kwegesi, izinga lokushisa, nokushuba kwe-movie kungathuthukiswa ukuze kube nemiphumela engcono.
Isikhathi sokuthumela: Oct-24-2024