Ukukhiqizwa komkhiqizo ngamunye we-semiconductor kudinga amakhulu ezinqubo. Sihlukanisa yonke inqubo yokukhiqiza ibe yizinyathelo eziyisishiyagalombili:isilucwecwanaprocessing-oxidation-photolithography-etching-filimi encane deposition-epitaxial growth-diffusion-ion implantation.
Ukukusiza ukuthi uqonde futhi ubone ama-semiconductors nezinqubo ezihlobene, sizophusha izindatshana ze-WeChat kumagazini ngamunye ukuze sethule isinyathelo ngasinye kwezingenhla ngasinye ngasinye.
Esihlokweni esandulele, kwashiwo ukuthi ukuze kuvikelweisilucwecwanakusuka ekungcoleni okuhlukahlukene, kwenziwa ifilimu ye-oxide - inqubo ye-oxidation. Namuhla sizoxoxa "ngenqubo ye-photolithography" yokuthwebula umjikelezo we-semiconductor design ku-wafer enefilimu ye-oxide eyakhiwe.
Inqubo ye-Photolithography
1. Iyini inqubo ye-photolithography
I-Photolithography ukwenza amasekhethi nezindawo zokusebenza ezidingekayo ekukhiqizeni ama-chip.
Ukukhanya okukhishwa umshini we-photolithography kusetshenziselwa ukuveza ifilimu elincanyana elimbozwe i-photoresist ngokusebenzisa imaski enephethini. I-photoresist izoshintsha izakhiwo zayo ngemva kokubona ukukhanya, ukuze iphethini kumaski ikopishwe kwifilimu encane, ukuze ifilimu encane inomsebenzi womdwebo wesifunda se-electronic. Lena indima ye-photolithography, efana nokuthatha izithombe ngekhamera. Izithombe ezithathwe ikhamera ziphrintiwe kwifilimu, kanti i-photolithography ayiqophi izithombe, kodwa imidwebo yesifunda nezinye izingxenye ze-elekthronikhi.
I-Photolithography iwubuchwepheshe obunembile be-micro-machining
I-conventional photolithography inqubo esebenzisa ukukhanya kwe-ultraviolet okunobude beza beza obungu-2000 kuya ku-4500 njengesithwali solwazi lwesithombe, futhi isebenzisa i-photoresist njengendawo emaphakathi (yokuqoshwa kwesithombe) ukuze kuzuzwe ukuguqulwa, ukudluliswa nokucutshungulwa kwezithombe, futhi ekugcineni idlulisele isithombe. ulwazi ku-chip (ikakhulukazi i-silicon chip) noma isendlalelo se-dielectric.
Kungashiwo ukuthi i-photolithography iyisisekelo se-semiconductor yesimanje, i-microelectronics, kanye nezimboni zolwazi, futhi i-photolithography inquma ngokuqondile izinga lokuthuthukiswa lalobu buchwepheshe.
Eminyakeni engaphezu kwengu-60 kusukela ekusungulweni okuphumelelayo kwamasekhethi ahlanganisiwe ngo-1959, ububanzi bomugqa wemifanekiso yayo buye bancishiswa cishe ngama-oda amane obukhulu, futhi ukuhlanganiswa kwesifunda kuye kwathuthukiswa ngama-oda angaphezu kwesithupha obukhulu. Inqubekelaphambili esheshayo yalezi zobuchwepheshe ikakhulukazi ibangelwa ukuthuthukiswa kwe-photolithography.
(Izidingo zobuchwepheshe be-photolithography ezigabeni ezahlukahlukene zokuthuthukiswa kokukhiqizwa kwesekethe ehlanganisiwe)
2. Izimiso eziyisisekelo ze-photolithography
Izinto ze-Photolithography ngokuvamile zibhekisela kuma-photoresists, aziwa nangokuthi ama-photoresists, okuyizinto zokusebenza ezibaluleke kakhulu ku-photolithography. Lolu hlobo lwezinto lunezici zokukhanya (okuhlanganisa ukukhanya okubonakalayo, ukukhanya kwe-ultraviolet, i-electron beam, njll.) ukuphendula. Ngemuva kokusabela kwe-photochemical, ukuncibilika kwayo kushintsha kakhulu.
Phakathi kwazo, i-solubility ye-photoresist enhle kunjiniyela iyanda, futhi iphethini etholiwe iyafana ne-mask; I-photoresist engalungile iphambene, okungukuthi, ukuncibilika kuyehla noma kungancibiliki ngemva kokuvezwa kunjiniyela, futhi iphethini etholiwe iphambene nemaski. Izinkambu zohlelo lokusebenza zezinhlobo ezimbili zama-photoresists zihlukile. Ama-photoresists amahle asetshenziswa kakhulu, ahlanganisa ngaphezu kuka-80% wengqikithi.
Okungenhla umdwebo wohlelo lwenqubo ye-photolithography
(1) Ukunamathela:
Okusho ukuthi, ukwakha ifilimu ye-photoresist enobukhulu obufanayo, ukunamathela okuqinile futhi akukho sici ku-wafer ye-silicon. Ukuze kuthuthukiswe ukunamathela phakathi kwefilimu ye-photoresist kanye ne-silicon wafer, ngokuvamile kuyadingeka ukuthi kuqala uguqule ingaphezulu le-silicon wafer ngezinto ezifana ne-hexamethyldisilazane (HMDS) ne-trimethylsilyldiethylamine (TMSDEA). Khona-ke, ifilimu ye-photoresist ilungiswa nge-spin coating.
(2) Ukubhaka ngaphambilini:
Ngemuva kokugcoba nge-spin, ifilimu ye-photoresist isaqukethe inani elithile le-solvent. Ngemuva kokubhaka ekushiseni okuphezulu, i-solvent ingasuswa kancane ngangokunokwenzeka. Ngemuva kokubhaka kwangaphambili, okuqukethwe kwe-photoresist kuncishiswa ku-5%.
(3) Ukuvezwa:
Okusho ukuthi, i-photoresist ivezwa ekukhanyeni. Ngalesi sikhathi, i-photoreaction iyenzeka, futhi umehluko wokuncibilika phakathi kwengxenye ekhanyisiwe nengxenye engakhanyisiwe uyenzeka.
(4) Ukuthuthukiswa nokuqina:
Umkhiqizo ugxile kunjiniyela. Ngalesi sikhathi, indawo eveziwe ye-photoresist enhle kanye nendawo engavezwanga ye-photoresist engalungile izoncibilika ekuthuthukisweni. Lokhu kuveza iphethini enezinhlangothi ezintathu. Ngemuva kokuthuthukiswa, i-chip idinga inqubo yokwelapha enezinga eliphezulu lokushisa ukuze ibe ifilimu eqinile, esebenza ngokuyinhloko ukuthuthukisa ukunamathela kwe-photoresist ku-substrate.
(5) Ukuqopha:
Izinto ezingaphansi kwe-photoresist zibhaliwe. Kuhlanganisa ukucwiliswa okumanzi okuwuketshezi kanye ne-gaseous dry etching. Isibonelo, ekufakweni okumanzi kwe-silicon, isixazululo esine-asidi samanzi se-hydrofluoric acid sisetshenziswa; ukuze kufakwe ithusi elimanzi, isixazululo esiqinile se-asidi esifana ne-nitric acid ne-sulfuric acid sisetshenziswa, kuyilapho ukucwiliswa okomile kuvame ukusebenzisa i-plasma noma imishayo ye-ion enamandla kakhulu ukuze kulimaze ingaphezulu lezinto futhi liyifake.
(6) Ukunciphisa:
Ekugcineni, i-photoresist idinga ukususwa ebusweni be-lens. Lesi sinyathelo sibizwa ngokuthi i-degumming.
Ukuphepha kuyindaba ebaluleke kakhulu kukho konke ukukhiqizwa kwe-semiconductor. Amagesi amakhulu ayingozi futhi ayingozi e-photolithography kunqubo ye-chip lithography ami kanje:
1. I-hydrogen peroxide
I-hydrogen peroxide (H2O2) iyi-oxidant enamandla. Ukuthintana ngqo kungabangela ukuvuvukala kwesikhumba namehlo kanye nokusha.
2. Xylene
I-Xylene iyi-solvent kanye nonjiniyela osetshenziswa ku-lithography engalungile. Iyavutha futhi inezinga lokushisa eliphansi elingu-27.3℃ kuphela (cishe izinga lokushisa legumbi). Kuyaqhuma lapho ukugxila emoyeni kungu-1% -7%. Ukuthintana okuphindaphindiwe ne-xylene kungabangela ukuvuvukala kwesikhumba. Umhwamuko we-Xylene umnandi, ufana nephunga le-tack yendiza; ukuchayeka ku-xylene kungabangela ukuvuvukala kwamehlo, ikhala nomphimbo. Ukuhogela igesi kungabangela ubuhlungu bekhanda, isiyezi, ukungakuthandi ukudla nokukhathala.
3. I-Hexamethyldisilazane (HMDS)
I-Hexamethyldisilazane (HMDS) isetshenziswa kakhulu njengesendlalelo sokuqala ukwandisa ukunamathela kwe-photoresist ebusweni bomkhiqizo. Iyavutha futhi ine-flash point engu-6.7°C. Kuyaqhuma lapho ukugxila emoyeni kungu-0.8% -16%. I-HMDS isabela ngokuqinile emanzini, utshwala nama-mineral acid ukuze ikhiphe i-ammonia.
4. I-Tetramethylammonium hydroxide
I-Tetramethylammonium hydroxide (TMAH) isetshenziswa kabanzi njengomthuthukisi we-lithography eqondile. Inobuthi futhi iyagqwala. Ingabulala uma igwinywa noma ithintana ngqo nesikhumba. Ukuthintana nothuli noma inkungu ye-TMAH kungabangela ukuvuvukala kwamehlo, isikhumba, ikhala nomphimbo. Ukuhogela okugxilile kwe-TMAH kuzoholela ekufeni.
5. I-chlorine ne-fluorine
I-Chlorine (Cl2) ne-fluorine (F2) womabili asetshenziswa kumalaser e-excimer njengemithombo yokukhanya ejulile ye-ultraviolet kanye ne-ultraviolet (EUV) ejulile. Womabili amagesi anobuthi, abonakala eluhlaza okwesibhakabhaka, futhi anephunga elinamandla elicasulayo. Ukuhogela umoya ophezulu wale gesi kuzoholela ekufeni. Igesi ye-fluorine ingase isabele emanzini ukuze ikhiqize igesi ye-hydrogen fluoride. Igesi ye-Hydrogen fluoride iyi-asidi eqinile ecasula isikhumba, amehlo kanye nomgudu wokuphefumula futhi ingase ibangele izimpawu ezifana nokusha kanye nobunzima bokuphefumula. Ukugcwala Okuphezulu kwe-fluoride kungabangela ubuthi emzimbeni womuntu, kubangele izimpawu ezifana nekhanda elibuhlungu, ukuhlanza, isifo sohudo, kanye ne-coma.
6. I-Argon
I-Argon (Ar) igesi engasebenzi ngokuvamile engabangeli ukulimala okuqondile emzimbeni womuntu. Ngaphansi kwezimo ezijwayelekile, umoya abantu abaphefumulayo uqukethe cishe u-0.93% we-argon, futhi lokhu kugxila akunawo umphumela osobala emzimbeni womuntu. Nokho, kwezinye izimo, i-argon ingase ibangele umonakalo emzimbeni womuntu.
Nazi ezinye izimo ezingenzeka: Esikhaleni esivalekile, ukugxila kwe-argon kungase kwande, ngaleyo ndlela kunciphise ukuhlushwa komoya-mpilo emoyeni futhi kubangele i-hypoxia. Lokhu kungase kubangele izimpawu ezifana nesiyezi, ukukhathala, nokuphelelwa umoya. Ngaphezu kwalokho, i-argon iyigesi e-inert, kodwa ingase iqhume ngaphansi kokushisa okuphezulu noma ukucindezela okukhulu.
7. Neon
I-Neon (Ne) iyigesi ezinzile, engenambala futhi engenaphunga engahlanganyeli ku-Igesi ye-neon ayibandakanyi ohlelweni lokuphefumula komuntu, ngakho ukuphefumula ekugxilweni okuphezulu kwegesi ye-neon kuzodala i-hypoxia. Uma usesimweni se-hypoxia isikhathi eside, ungase ube nezimpawu ezifana nekhanda elibuhlungu, isicanucanu, nokuhlanza. Ukwengeza, igesi ye-neon ingase isabele nezinye izinto ngaphansi kwezinga lokushisa eliphezulu noma ukucindezela okukhulu ukuze kubangele umlilo noma ukuqhuma.
8. Igesi yeXenon
I-Xenon gas (Xe) iyigesi ezinzile, engenambala futhi engenaphunga engahlanganyeli enqubweni yokuphefumula komuntu, ngakho ukuphefumula ngenqwaba yegesi ye-xenon kuzodala i-hypoxia. Uma usesimweni se-hypoxia isikhathi eside, ungase ube nezimpawu ezifana nekhanda elibuhlungu, isicanucanu, nokuhlanza. Ukwengeza, igesi ye-neon ingase isabele nezinye izinto ngaphansi kwezinga lokushisa eliphezulu noma ukucindezela okukhulu ukuze kubangele umlilo noma ukuqhuma.
9. Igesi ye-Krypton
I-Krypton gas (Kr) iyigesi ezinzile, engenambala futhi engenaphunga engahlanganyeli enqubweni yokuphefumula komuntu, ngakho-ke ukuphefumula ekugxilweni okuphezulu kwegesi ye-krypton kuzodala i-hypoxia. Uma usesimweni se-hypoxia isikhathi eside, ungase ube nezimpawu ezifana nekhanda elibuhlungu, isicanucanu, nokuhlanza. Ukwengeza, igesi ye-xenon ingase isabele nezinye izinto ngaphansi kwezinga lokushisa eliphezulu noma ukucindezela okukhulu ukuze kubangele umlilo noma ukuqhuma. Ukuphefumula endaweni entula umoya-mpilo kungabangela i-hypoxia. Uma usesimweni se-hypoxia isikhathi eside, ungase ube nezimpawu ezifana nekhanda elibuhlungu, isicanucanu, nokuhlanza. Ukwengeza, igesi ye-krypton ingase isabele nezinye izinto ngaphansi kwezinga lokushisa eliphezulu noma ukucindezela okukhulu ukuze kubangele umlilo noma ukuqhuma.
Izixazululo zokuthola igesi eyingozi embonini ye-semiconductor
Imboni ye-semiconductor ibandakanya ukukhiqizwa, ukukhiqiza, kanye nenqubo yamagesi avuthayo, aqhumayo, anobuthi, namagesi ayingozi. Njengomsebenzisi wamagesi ezimbonini ezikhiqiza ama-semiconductor, wonke umsebenzi kufanele aqonde idatha yokuphepha yamagesi ayingozi ahlukahlukene ngaphambi kokusetshenziswa, futhi kufanele azi ukuthi angabhekana kanjani nezinqubo eziphuthumayo lapho la magesi evuza.
Emkhiqizweni, ekukhiqizeni, nasekugcinweni kwemboni ye-semiconductor, ukuze kugwenywe ukulahleka kwempilo nempahla okubangelwa ukuvuza kwala magesi ayingozi, kuyadingeka ukuthi kufakwe amathuluzi okuthola igesi ukuze kutholwe igesi eqondiwe.
Izitholi zegesi seziphenduke amathuluzi okuqapha imvelo abalulekile embonini yanamuhla ye-semiconductor, futhi zingamathuluzi okuqapha aqonde kakhulu.
U-Riken Keiki ubelokhu enaka ukuthuthukiswa okuphephile kwemboni yokukhiqiza i-semiconductor, ngenhloso yokwakha indawo yokusebenza ephephile yabantu, futhi uye wazinikela ekuthuthukiseni izinzwa zegesi ezifanele imboni ye-semiconductor, ehlinzeka ngezixazululo ezifanele zezinkinga ezihlukahlukene ezihlangatshezwana nazo. abasebenzisi, futhi ngokuqhubekayo uthuthukisa imisebenzi yomkhiqizo kanye nokwenza ngcono izinhlelo.
Isikhathi sokuthumela: Jul-16-2024