Isingeniso ku-chemical vapor deposition (CVD) ubuchwepheshe bokufakwa kwefilimu emincane

I-Chemical Vapor Deposition (CVD) iwubuchwepheshe obubalulekile bokufakwa kwefilimu emincane, evame ukusetshenziselwa ukulungisa amafilimu ahlukahlukene asebenzayo nezinto zongqimba oluncane, futhi isetshenziswa kabanzi ekukhiqizeni ama-semiconductor nakweminye imikhakha.

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1. Umgomo wokusebenza we-CVD
Enqubweni ye-CVD, i-precursor yegesi (inhlanganisela eyodwa noma ngaphezulu ye-gaseous precursor) ihlanganiswa ne-substrate surface bese ishiselwa ezingeni elithile lokushisa ukuze kubangele ukusabela kwamakhemikhali futhi ifake endaweni engaphansi ukuze yakhe ifilimu noma i-coating oyifunayo. ungqimba. Umkhiqizo walokhu kusabela kwamakhemikhali uqinile, ngokuvamile inhlanganisela yezinto ezifunwayo. Uma sifuna ukunamathisela i-silicon endaweni engaphezulu, singasebenzisa i-trichlorosilane (SiHCl3) njengegesi eyandulela: SiHCl3 → Si + Cl2 + HCl Silicon izobophezela kunoma iyiphi indawo eveziwe (kokubili kwangaphakathi nangaphandle), kuyilapho igesi ye-chlorine ne-hydrochloric acid izobopha akhishwe ekamelweni.

2. Ukuhlukaniswa kwe-CVD
I-Thermal CVD: Ngokushisisa igesi eyandulelayo ukuze ibole futhi iyibeke endaweni engaphansi. I-Plasma Enhanced CVD (PECVD): I-Plasma yengezwa ku-CVD eshisayo ukuze kuthuthukiswe izinga lokusabela nokulawula inqubo yokubeka. I-Metal Organic CVD (MOCVD): Ukusebenzisa izinhlanganisela zensimbi eziphilayo njengamagesi andulelayo, amafilimu amancanyana ezinsimbi nama-semiconductors angalungiswa, futhi avame ukusetshenziswa ekwenzeni amadivaysi afana nama-LED.

3. Isicelo
(1) Ukukhiqizwa kwe-semiconductor
Ifilimu ye-Silicide: isetshenziselwa ukulungisa izendlalelo ezivikelayo, ama-substrates, izendlalelo zokuhlukanisa, njll. Ifilimu ye-Nitride: isetshenziselwa ukulungisa i-silicon nitride, i-aluminium nitride, njll., esetshenziswa kuma-LED, amadivayisi kagesi, njll. izendlalelo, njll.

(2) Ubuchwepheshe bokubonisa
Ifilimu ye-ITO: Ifilimu ye-transparent conductive oxide, evame ukusetshenziswa kumaphaneli ayisicaba kanye nezikrini zokuthinta. Ifilimu yethusi: isetshenziselwa ukulungisa izendlalelo zokupakisha, imigqa ye-conductive, njll., ukuthuthukisa ukusebenza kwamadivayisi wokubonisa.

(3) Eminye imikhakha
I-Optical coatings: kufaka phakathi ama-anti-reflective coatings, izihlungi ezibonakalayo, njll. I-anti-corrosion coating: isetshenziswa ezingxenyeni zezimoto, amadivayisi we-aerospace, njll.

4. Izici zenqubo ye-CVD
Sebenzisa indawo yokushisa ephezulu ukukhuthaza isivinini sokusabela. Ngokuvamile kwenziwa endaweni ye-vacuum. Ukungcola ebusweni bengxenye kufanele kususwe ngaphambi kokudweba. Inqubo ingase ibe nemikhawulo kuma-substrates angambozwa, okungukuthi ukulinganiselwa kwezinga lokushisa noma ukulinganiselwa kokusebenza kabusha. I-CVD coating izohlanganisa zonke izindawo zengxenye, kuhlanganise nezintambo, izimbobo ezingaboni kanye nezindawo zangaphakathi. Kungase kukhawulele ikhono lokufihla izindawo ezithile okuqondiwe kuzo. Ukushuba kwefilimu kunqunyelwe inqubo kanye nezimo zempahla. Ukunamathela okuphezulu.

5. Izinzuzo zobuchwepheshe be-CVD
Ukufana: Iyakwazi ukufeza ukubekelwa okufanayo phezu kwama-substrates endawo enkulu.

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Ukulawulwa: Izinga lokubeka kanye nezakhiwo zefilimu zingalungiswa ngokulawula izinga lokugeleza nezinga lokushisa legesi eyandulelayo.

I-Versatility: Ifanele ukufakwa kwezinto ezihlukahlukene, njengezinsimbi, ama-semiconductors, ama-oxides, njll.


Isikhathi sokuthumela: May-06-2024
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