Li-wafers tsa silicon tsa 8-inch tsa VET Energy li sebelisoa haholo ho lisebelisoa tsa motlakase tsa motlakase, li-sensor, li-circuits tse kopaneng le likarolo tse ling. Joaloka moetapele indastering ea semiconductor, re ikemiselitse ho fana ka lihlahisoa tsa boleng bo holimo tsa Si Wafer ho fihlela litlhoko tse ntseng li eketseha tsa bareki ba rona.
Ntle le Si Wafer, VET Energy e boetse e fana ka lisebelisoa tse ngata tse fapaneng tsa semiconductor substrate, ho kenyeletsoa SiC Substrate, SOI Wafer, SiN Substrate, Epi Wafer, joalo-joalo. Sehlahisoa sa rona se boetse se akaretsa lisebelisoa tse ncha tse pharaletseng tsa semiconductor tse kang Gallium Oxide Ga2O3 le AlN. Wafer, e fanang ka ts'ehetso e matla bakeng sa nts'etsopele ea lisebelisoa tsa motlakase tsa motlakase tsa moloko o latelang.
VET Energy e na le lisebelisoa tse tsoetseng pele tsa tlhahiso le sistimi e felletseng ea taolo ea boleng ho netefatsa hore sephaphatha ka seng se kopana le maemo a thata a indasteri. Lihlahisoa tsa rona ha li na lisebelisoa tse ntle tsa motlakase feela, empa hape li na le matla a matle a mochine le botsitso ba mocheso.
VET Energy e fa bareki litharollo tsa liphaephe tse ikhethileng, ho kenyeletsoa liphaephe tsa boholo bo fapaneng, mefuta le likhakanyo tsa doping. Ntle le moo, re boetse re fana ka ts'ehetso ea botekgeniki le ts'ebeletso ea morao-rao ho thusa bareki ho rarolla mathata a fapaneng a kopaneng nakong ea tlhahiso.
LIEKETSENG MATS'OA
*n-Pm=n-type Pm-Grade,n-Ps=n-type Ps-Grade,Sl=Semi-lnsulation
Ntho | 8-Intshi | 6-Intshi | 4-Intshi | ||
nP | n-Pm | n-Pes | SI | SI | |
TTV(GBIR) | ≤6um | ≤6um | |||
Bow(GF3YFCD)-Boleng bo Felletseng | ≤15μm | ≤15μm | ≤25μm | ≤15μm | |
Warp(GF3YFER) | ≤25μm | ≤25μm | ≤40μm | ≤25μm | |
LTV(SBIR) -10mmx10mm | <2μm | ||||
Wafer Edge | Beveling |
SEBAKA PHETHA
*n-Pm=n-type Pm-Grade,n-Ps=n-type Ps-Grade,Sl=Semi-lnsulation
Ntho | 8-Intshi | 6-Intshi | 4-Intshi | ||
nP | n-Pm | n-Pes | SI | SI | |
Surface Finish | Mahlakore a mabeli a Optical Polish, Si- Face CMP | ||||
SurfaceRoughness | (10um x 10um) Si-FaceRa≤0.2nm | (5umx5um) Si-Face Ra≤0.2nm | |||
Li-Chips tsa Edge | Ha ho e dumellwe (bolelele le bophara≥0.5mm) | ||||
Li-indent | Ha ho le e 'ngoe e Lumelloang | ||||
Scratches(Si-Face) | Kty.≤5, Kakaretso | Kty.≤5, Kakaretso | Kty.≤5, Kakaretso | ||
Mapetso | Ha ho le e 'ngoe e Lumelloang | ||||
Kenyelletso ea Edge | 3mm |