E masani ona fa'atatau i tagata fa'atau, ma o la tatou sini sili lea e le gata ina avea ma tagata e sili ona ta'uta'ua, fa'atuatuaina ma fa'amaoni, ae fa'apea fo'i ma paaga mo a tatou tagata fa'atau mo le Super Lowest Price China 1200c Plasma Enhanced Chemical Vapor Deposition.PecvdVacuum Funace, Ina ia aoao atili e uiga i mea e mafai ona matou faia mo oe, faafesootai matou i soo se taimi. Matou te tulimatai atu i le faʻavaeina o sootaga pisinisi lelei ma umi ma oe.
E masani ona fa'atatau i tagata fa'atau, ma o la tatou fa'amoemoega sili lea e le gata ina avea ma tagata e sili ona ta'uta'ua, fa'atuatuaina ma fa'amaoni, ae fa'apea fo'i ma paaga mo a tatou tagata fa'atau moSaina Plasma Fa'aleleia Ausa Fa'ama'i, Pecvd, O a matou meafaigaluega faʻapitoa, pulega sili ona lelei, suʻesuʻega ma atinaʻe gafatia e faʻaitiitia ai le tau. O le tau matou te ofoina atu atonu e le maualalo, ae matou te faʻamautinoa e matua faʻatauva! Faʻafeiloaʻi e faʻafesoʻotaʻi vave i matou mo soʻotaga pisinisi i le lumanaʻi ma manuia faʻatasi!
Carbon / carbon composite(e ta'ua mulimuli ane o le “C / C poʻo CFC”) o se ituaiga o mea tuʻufaʻatasia e faʻavae i luga o le carbon ma faʻamalosia e le alava carbon ma ana oloa (carbon fiber preform). E i ai uma le inertia o le carbon ma le malosi maualuga o le alava carbon. O lo'o i ai mea fa'ainisinia lelei, fa'afefe vevela, fa'afefete, fa'afefe fa'afefe ma uiga fa'avevela ma eletise
CVD-SiCfaʻapipiʻi o loʻo i ai uiga o le fausaga tutusa, mea faʻapipiʻi, maualuga le vevela o le vevela, faʻamaʻi faʻamaʻi, maualuga le mama, faʻamaʻi ma le alkali ma le faʻaogaina o meaola, faʻatasi ai ma mea faʻaletino ma vailaʻau.
Pe a faatusatusa i mea graphite maualuga-mama, e amata ona oxidize graphite i le 400C, lea o le a mafua ai le leiloa o le paʻu ona o le oxidation, e mafua ai le faaleagaina o le siosiomaga i masini peripheral ma potu gaogao, ma faateleina ai le mama o le siosiomaga mama-maualuga.
Ae ui i lea, o le SiC coating e mafai ona faatumauina le mautu o le tino ma le vailaʻau i le 1600 tikeri, E faʻaaogaina lautele i alamanuia faʻaonapo nei, aemaise lava ile semiconductor industry.
O la matou kamupani e tuʻuina atu auaunaga faʻapipiʻi SiC e ala i le auala CVD i luga o le graphite, ceramics ma isi mea, ina ia mafai ai e kasa faʻapitoa o loʻo i ai carbon ma silicon ona tali atu i le maualuga o le vevela e maua ai le mama maualuga SiC mole, molelaʻau teuina i luga o mea faʻapipiʻi, fa'atūina le SIC fa'apipi'i puipui. O le SIC o loʻo faʻapipiʻiina o loʻo faʻapipiʻiina mau i le faavae o le graphite, e tuʻuina atu ai le faʻavae o le graphite o mea faʻapitoa, ma faʻapea ona faʻapipiʻiina le pito i luga ole graphite, Porosity-free, maualuga le vevela o le vevela, faʻafefete ma faʻamaʻi faʻamaʻi.
Vaega autu:
1. maualuga le vevela oxidation tetee:
o loʻo lelei tele le faʻamaʻiina o le faʻamaʻi pe a maualuga le vevela ile 1600 C.
2. Mamaa maualuga: faia e vailaau ausa tuu i lalo o le maualuga vevela tulaga chlorination.
3. Erosion tete'e: maualuga ma'a'a, fa'apipi'i luga, vaega laiti.
4. Tete'e a'a: acid, alkali, masima ma organic reagents.
Fa'amatalaga autu o le CVD-SIC Coatings:
| SiC-CVD | ||
| Malosi | (g/cc)
| 3.21 |
| Malosi fa'apa'u | (Mpa)
| 470 |
| Fa'alauteleina o le vevela | (10-6/K) | 4
|
| Fa'avevela vevela | (W/mK) | 300
|
