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  • O a ni faaletonu o le silicon carbide epitaxial layer

    O a ni faaletonu o le silicon carbide epitaxial layer

    O le tekonolosi autu mo le tuputupu aʻe o mea epitaxial SiC o le faʻaogaina muamua o tekinolosi faʻaletonu, aemaise lava mo le faʻaogaina o tekonolosi e faigofie i le faʻaogaina o masini poʻo le faʻaleagaina. O le suʻesuʻega o le faʻaogaina o faʻafitauli o le substrate e oʻo atu i totonu o le epi ...
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  • Saito tu oxidized ma epitaxial tuputupu aʻe tekinolosi-Ⅱ

    Saito tu oxidized ma epitaxial tuputupu aʻe tekinolosi-Ⅱ

    2. Epitaxial thin film tuputupu aʻe O le substrate e maua ai se vaega lagolago faaletino poʻo le conductive layer mo Ga2O3 masini eletise. O le isi vaega taua o le alalaupapa po'o le epitaxial layer e fa'aaogaina mo le tete'e voltage ma felauaiga ave. Ina ia faʻateleina le voltage malepe ma faʻaitiitia le faʻaogaina ...
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  • Gallium oxide tioata tasi ma tekinolosi tuputupu aʻe epitaxial

    Gallium oxide tioata tasi ma tekinolosi tuputupu aʻe epitaxial

    Wide bandgap (WBG) semiconductors o loʻo faʻatusalia e le silicon carbide (SiC) ma le gallium nitride (GaN) ua faʻasalalau lautele. O loʻo i ai i tagata le maualuga o faʻamoemoega mo le faʻaogaina o le silicon carbide i taʻavale eletise ma eletise eletise, faʻapea foʻi ma le faʻaogaina o le gallium ...
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  • O a ni pa fa'atekinisi i le silicon carbide?Ⅱ

    O a ni pa fa'atekinisi i le silicon carbide?Ⅱ

    O faʻafitauli faʻapitoa i le faʻapipiʻiina o le silicon carbide wafers ma le faʻatinoina o galuega faʻapitoa e aofia ai: 1) Talu ai e manaʻomia le tupu aʻe o tioata i se siosiomaga faʻamaufaʻailoga maualuga i luga o le 2000 ° C, o manaʻoga o le vevela e matua maualuga lava; 2) Talu ai o le silicon carbide ua ...
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  • O a ni pa fa'atekinisi i le silicon carbide?

    O a ni pa fa'atekinisi i le silicon carbide?

    O le augatupulaga muamua o mea semiconductor o loʻo faʻatusalia e le silikoni masani (Si) ma le germanium (Ge), o le faʻavae lea mo le gaosiga faʻatasi. E masani ona faʻaaogaina i le maualalo-voltage, maualalo-televave, ma le maualalo-mana transistors ma detectors. E sili atu i le 90% o semiconductor prod...
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  • E fa'afefea ona fai le SiC micro powder?

    E fa'afefea ona fai le SiC micro powder?

    SiC tioata tasi o le Vaega IV-IV mea semiconductor faʻapipiʻi e aofia ai elemene e lua, Si ma C, i se fua faatatau stoichiometric o 1:1. O lona maaa e lona lua i le taimane. O le fa'aitiitiga o le kaponi o le silicon oxide metotia e saunia ai le SiC e fa'avae i luga o le fua fa'atatau fa'afoma'i nei...
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  • E fa'afefea ona fesoasoani le epitaxial layers i masini semiconductor?

    E fa'afefea ona fesoasoani le epitaxial layers i masini semiconductor?

    O le amataga o le igoa epitaxial wafer Muamua, se'i o tatou fa'alauiloa se manatu la'ititi: o le tapenaina o wafer e aofia ai so'oga tetele se lua: tapenaga o mea'ai ma le fa'agasologa o le epitaxial. O le mea'ai o se mea fa'apipi'i e faia i le semiconductor mea tioata tasi. O le substrate e mafai ona ulufale tuusao i le wafer manufacturi...
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  • Fa'atomuaga i le fa'a'ofuina o ausa vaila'au (CVD).

    Fa'atomuaga i le fa'a'ofuina o ausa vaila'au (CVD).

    Chemical Vapor Deposition (CVD) o se tekinolosi faʻapipiʻi ata manifinifi taua, e masani ona faʻaaogaina e saunia ai ata tifaga eseese ma mea manifinifi, ma e faʻaaogaina lautele i le gaosiga o semiconductor ma isi fanua. 1. Fa'avae galue o le CVD I le fa'agasologa o le CVD, o se kesi muamua (tasi pe...
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  • Le mealilo "auro uliuli" i tua atu o le photovoltaic semiconductor industry: o le manaʻoga ma le faʻalagolago i le isostatic graphite

    Le mealilo "auro uliuli" i tua atu o le photovoltaic semiconductor industry: o le manaʻoga ma le faʻalagolago i le isostatic graphite

    Isostatic graphite o se mea taua tele i photovoltaics ma semiconductors. Faatasi ai ma le televave o le siitia o kamupani isostatic graphite i totonu o le atunuu, ua malepe le pule a kamupani mai fafo i Saina. Fa'atasi ai ma su'esu'ega tuto'atasi ma atina'e ma fa'agasologa fa'atekonolosi, o le ...
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