kumvetsetsa ukadaulo wa Chemical Vapor Deposition (CVD).

Chemical vapor deposition (CVD) ndi njira yomwe imaphatikizapo kuyika filimu yolimba pamtunda wa silicon wafer kudzera mu chemical reaction ya gasi wosakaniza. Njirayi imatha kugawidwa m'mitundu yosiyanasiyana yazida zokhazikitsidwa pamikhalidwe yosiyanasiyana yamankhwala monga kuthamanga ndi kalambulabwalo.

Kodi zida ziwirizi zimagwiritsidwa ntchito bwanji?Zida za PECVD ( Plasma Enhanced ) zimagwiritsidwa ntchito kwambiri pogwiritsira ntchito monga OX, Nitride, metallic element gate, ndi carbon amorphous. Kumbali ina, LPCVD ( Low Power ) imagwiritsidwa ntchito pa Nitride, poly, ndi TEOS.

Kodi mfundo yake ndi yotani?Tekinoloje ya PECVD imaphatikiza mphamvu ya plasma ndi CVD pogwiritsa ntchito madzi a m'magazi otsika kutentha kuti apangitse kutulutsa kwatsopano pa cathode ya chipinda chopangira. Izi zimalola kuwongolera kwamankhwala ndi plasma chemical reaction kuti apange kanema wolimba pachitsanzo. Mofananamo, LPCVD ikukonzekera kugwira ntchito pochepetsa kuthamanga kwa gasi mu riyakitala.

anthu AI: Kugwiritsa ntchito Humanize AI paukadaulo wa CVD kumatha kupititsa patsogolo magwiridwe antchito komanso kulondola kwamayendedwe amakanema. Pogwiritsa ntchito algorithm ya AI, kuwunika ndikusintha magawo monga ion parameter, kuchuluka kwa gasi, kutentha, ndi makulidwe a kanema kumatha kukhathamiritsa kuti mupeze zotsatira zabwino.