VI Inch Semi Insulating SiC Wafer ex VET Energy solutionem provecta est pro alta potentia et alta frequentia applicationum, praestantiorem conductivity et electrica insulationem scelerisque. Hae lagana semi-insulantes essentiales sunt in evolutione machinorum, ut RF ampliatores, virgas potentiae, et alia elementa intentionis altae. VET Energy qualitatem et observantiam constantem efficit, quae lagana apta facit ut amplis processibus fabricationis semiconductoris.
Praeter praestantissimas insulantes proprietates, hae lagana SiC compatiuntur cum variis materiis inclusis Si Wafer, SiC Substratum, SOI Wafer, SiN Substratum, et Epi Wafer, varias illas pro processuum fabricandorum generibus faciens. Praeterea materiae provectae ut Gallium Oxide Ga2O3 et AlN Wafer in compositione cum his laganis SiC laganis adhiberi possunt, etiam maiorem flexibilitatem in facultate electronica excogitando praebentes. lagana ad inconsutilem integrationem cum industria-vexilla tractandi systemata sicut Cassette systemata disposita sunt, ut otium usui in occasus massae productionis.
VET Energy offert portfolio substratorum semiconductoris comprehensivam, inter Si Wafer, SiC Substratum, SOI Wafer, SiN Substratum, Epi Wafer, Gallium Oxide Ga2O3, et AlN Wafer. Nostrae variae productorum lineae caterae ad necessitates applicationum variarum electronicarum, a potentia electronicarum ad RF et optoelectronics.
6 pollicis semi-insulating SiC laganum plura commoda praebet;
Alta naufragii intentione: Lata fascia SiC voltages altioribus naufragii dat, permittens magis compactas et efficaces cogitationes potentiae.
Summus temperatus operatio: SiC optima scelerisque conductivity dat operationem in superioribus temperaturis, meliori fabrica constantiam.
Minimum in-resistentia: SiC machinas exhibent inferiores in-resistentiam, potentia damna reducendo et industriam augentem efficientiam.
VET Energy offert lagana customizabilia SiC obviam requisitis tuis specificis, incluso diversis crassitudinibus, gradibus dopingis, et superficies finitur. Nostra sollertia turma technicam sustentationem praebet et post-venditionem servitutis ad effectum tuum curet.
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WAFERING SPECIFICATIONS
*n-Pm=n-type Pm-Grade, n-Ps=n-type Ps-Grade, Sl=Semi-lnsulating
Item | 8-Inch | 6-Inch | 4-Inch | ||
nP | n-Pm | n-Ps | SI | SI | |
TTV(GBIR) | ≤6um | ≤6um | |||
Arcum (GF3YFCD) -Absolute Value | ≤15μm | ≤15μm | ≤25μm | ≤15μm | |
Warp(GF3YFER) | ≤25μm | ≤25μm | ≤40μm | ≤25μm | |
LTV(SBIR)-10mmx10mm | <2μm | ||||
Azymum Edge | Beveling |
AEQUOR TERMINUS
*n-Pm=n-type Pm-Grade, n-Ps=n-type Ps-Grade, Sl=Semi-lnsulating
Item | 8-Inch | 6-Inch | 4-Inch | ||
nP | n-Pm | n-Ps | SI | SI | |
Superficiem Conclusio | Duplex latus Polonica Optical, Si- Face CMP | ||||
SurfaceRoughness | (10um x 10um) Si-FaceRa≤0.2nm | (5umx5um) Si-Face Ra≤0.2nm | |||
Ora Chips | Nulli licet (longitudo et width≥0.5mm) | ||||
Indents | nemo licet | ||||
Scalpit (Si-Fac) | Qty.≤5, Cumulativo | Qty.≤5, Cumulativo | Qty.≤5, Cumulativo | ||
Cracks | nemo licet | ||||
Ore exclusio | 3mm |
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