Maemae Kiʻekiʻe 8 Iniha Silicon Wafer

ʻO ka wehewehe pōkole:

ʻO nā wafers silika 8-inihi maʻemaʻe kiʻekiʻe o VET Energy kāu koho kūpono no ka hana semiconductor. Hana ʻia me ka hoʻohana ʻana i ka ʻenehana holomua, loaʻa i kēia mau wafers ka maikaʻi kristal maikaʻi loa a me ka palahalaha o ka ʻili, e kūpono iā lākou no ka hana ʻana i nā ʻano microelectronic like ʻole.


Huahana Huahana

Huahana Huahana

Hoʻohana nui ʻia nā wafers silika 8-inihi o VET Energy i ka uila uila, nā mea ʻike, nā kaapuni hoʻohui a me nā kahua ʻē aʻe. Ma keʻano he alakaʻi i kaʻoihana semiconductor, ua paʻa mākou i ka hoʻolakoʻana i nā huahana Si Wafer kiʻekiʻe e hoʻokō i nā pono ulu o kā mākou mea kūʻai.

Ma waho aʻe o Si Wafer, hāʻawi pū ka VET Energy i kahi ākea o nā mea semiconductor substrate, me ka SiC Substrate, SOI Wafer, SiN Substrate, Epi Wafer, a me nā mea ʻē aʻe. ʻO Wafer, e hāʻawi ana i ke kākoʻo ikaika no ka hoʻomohala ʻana i nā mea uila mana o ka hanauna e hiki mai ana.

Loaʻa i ka VET Energy nā lako hana kiʻekiʻe a me kahi ʻōnaehana hoʻokele maikaʻi piha e hōʻoia i kēlā me kēia wafer e hoʻokō i nā kūlana ʻoihana koʻikoʻi. ʻAʻole i loaʻa i kā mākou huahana nā waiwai uila maikaʻi loa, akā loaʻa pū kekahi i ka ikaika mechanical a me ka paʻa wela.

Hāʻawi ʻo VET Energy i nā mea kūʻai aku i nā hoʻonā wafer maʻamau, me nā wafers o nā ʻano nui, nā ʻano a me nā manaʻo doping. Eia kekahi, hāʻawi pū mākou i ke kākoʻo ʻenehana loea a me ka lawelawe ma hope o ke kūʻai aku e kōkua i nā mea kūʻai aku e hoʻoponopono i nā pilikia like ʻole i loaʻa i ka wā o ke kaʻina hana.

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OLELO HOOLAHA WAFERING

*n-Pm=n-type Pm-Grade,n-Ps=n-type Ps-Grade,Sl=Semi-lnsulating

'ikamu

8-Inika

6-Iniha

4-Iniha

nP

n-Pm

n-Ps

SI

SI

TTV(GBIR)

≤6um

≤6um

Kakaka (GF3YFCD)-Waiwai Loa

≤15μm

≤15μm

≤25μm

≤15μm

Warp(GF3YFER)

≤25μm

≤25μm

≤40μm

≤25μm

LTV(SBIR)-10mmx10mm

<2μm

Wafer Edge

ʻO ka beveling

PAPA IHO

*n-Pm=n-type Pm-Grade,n-Ps=n-type Ps-Grade,Sl=Semi-lnsulating

'ikamu

8-Inika

6-Iniha

4-Iniha

nP

n-Pm

n-Ps

SI

SI

Hoʻopau ʻili

ʻaoʻao ʻelua Optical Polish, Si- Face CMP

ʻAhaʻulaʻula

(10um x 10um) Si-FaceRa≤0.2nm
C-Face Ra≤ 0.5nm

(5umx5um) Si-Face Ra≤0.2nm
C-Face Ra≤0.5nm

ʻOpi ʻEke

ʻAʻohe ʻae ʻia (lōʻihi a laula≥0.5mm)

Indents

ʻAʻole ʻae ʻia

Nā ʻōpala (Si-Face)

Ka nui.≤5, Huihui
Length≤0.5×wafer anawaena

Ka nui.≤5, Huihui
Length≤0.5×wafer anawaena

Ka nui.≤5, Huihui
Length≤0.5×wafer anawaena

māwae

ʻAʻole ʻae ʻia

Hoʻokuʻu Edge

3mm

tech_1_2_size
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