Samar da kowane samfurin semiconductor yana buƙatar ɗaruruwan matakai. Mun raba dukkan tsarin masana'antu zuwa matakai takwas:wafersarrafa-oxidation-photolithography-etching-bakin ciki-nauyin fim ɗin-epitaxial girma-yaɗawa-ion implantation.
Don taimaka muku fahimta da kuma gane semiconductor da alaka matakai, za mu tura WeChat articles a cikin kowane batu don gabatar da kowane daga cikin sama matakai daya bayan daya.
A cikin labarin da ya gabata, an ambaci cewa don kare lafiyarwaferdaga nau'ikan datti daban-daban, an yi fim ɗin oxide - tsari na iskar shaka. A yau za mu tattauna "tsarin daukar hoto" na daukar hoto na zane-zane na semiconductor akan wafer tare da fim din oxide da aka kafa.
Tsarin daukar hoto
1. Menene tsarin photolithography
Photolithography shine don yin da'irori da wuraren aiki da ake buƙata don samarwa guntu.
Ana amfani da hasken da na'urar daukar hoto na photolithography ke fitarwa don fallasa fim ɗin bakin ciki wanda aka lulluɓe da hoto ta hanyar abin rufe fuska tare da tsari. Mai daukar hoto zai canza kayansa bayan ya ga haske, don haka samfurin a kan abin rufe fuska an kwafi shi zuwa fim na bakin ciki, don haka fim din na bakin ciki yana da aikin zane-zane na lantarki. Wannan shine aikin photolithography, kama da ɗaukar hotuna da kyamara. Ana buga hotunan da kyamarar ta ɗauka akan fim ɗin, yayin da hoton hoto ba ya zana hotuna, amma zane-zane da sauran kayan lantarki.
Photolithography daidaitaccen fasahar kere-kere ne
Photolithography na al'ada tsari ne da ke amfani da hasken ultraviolet tare da tsawon 2000 zuwa 4500 angstroms a matsayin mai ɗaukar bayanan hoto, kuma yana amfani da photoresis a matsayin matsakaici (rikodin hoto) matsakaici don cimma canji, canja wuri da sarrafa hotuna, kuma a ƙarshe yana watsa hoton. bayanai zuwa guntu (yafi siliki guntu) ko dielectric Layer.
Ana iya cewa photolithography shine ginshiƙi na zamani semiconductor, microelectronics, da masana'antun bayanai, kuma photolithography kai tsaye ya ƙayyade matakin ci gaban waɗannan fasahohin.
A cikin fiye da shekaru 60 tun bayan samun nasarar ƙirƙira haɗaɗɗun da'irori a cikin 1959, an rage faɗin layin zanensa da kusan umarni huɗu, kuma an inganta haɗin da'ira ta fiye da umarni shida na girma. Saurin ci gaban waɗannan fasahohin an danganta shi da haɓakar hoto na hoto.
(Bukatun fasaha na photolithography a matakai daban-daban na ci gaban masana'antun da'ira mai haɗaka)
2. Ka'idodin asali na photolithography
Kayayyakin Photolithography gabaɗaya suna nufin masu ɗaukar hoto, wanda kuma aka sani da photoresists, waɗanda sune mafi mahimmancin kayan aiki a cikin hoto. Wannan nau'in kayan yana da halayen haske (ciki har da haske mai gani, hasken ultraviolet, katako na lantarki, da dai sauransu) dauki. Bayan amsawar photochemical, solubility yana canzawa sosai.
Daga cikin su, solubility na tabbatacce photoresist a cikin developer yana ƙaruwa, kuma samfurin da aka samu daidai yake da abin rufe fuska; korau photoresist shine akasin haka, wato, solubility yana raguwa ko ma ya zama marar narkewa bayan an fallasa shi ga mai haɓakawa, kuma samfurin da aka samu ya saba wa abin rufe fuska. Filayen aikace-aikacen nau'ikan photoresists iri biyu sun bambanta. Ana amfani da ingantaccen photoresists, wanda ya kai fiye da 80% na jimlar.
Abin da ke sama shine zane-zane na tsarin daukar hoto
(1) Manne:
Wato, ƙirƙirar fim ɗin hoto tare da kauri iri ɗaya, mannewa mai ƙarfi kuma babu lahani akan wafer silicon. Don haɓaka mannewa tsakanin fim ɗin photoresist da wafer siliki, sau da yawa ya zama dole a fara gyara saman wafer silicon tare da abubuwa kamar hexamethyldisilazane (HMDS) da trimethylsilyldiethylamine (TMSDEA). Sa'an nan kuma, an shirya fim ɗin photoresist ta hanyar sutura.
(2) Kafin yin burodi:
Bayan jujjuyawar juzu'i, fim ɗin photoresist har yanzu yana ƙunshe da wani adadin ƙarfi. Bayan yin burodi a cikin zafin jiki mafi girma, za'a iya cire sauran ƙarfi kamar yadda zai yiwu. Bayan pre-baking, abun ciki na photoresist an rage zuwa kusan 5%.
(3) Bayyanawa:
Wato, photoresist yana fuskantar haske. A wannan lokacin, wani photoreaction yana faruwa, kuma bambancin solubility tsakanin ɓangaren haske da ɓangaren da ba ya haskaka yana faruwa.
(4) Ci gaba & taurin kai:
An nutsar da samfurin a cikin mai haɓakawa. A wannan lokaci, da fallasa yankin na tabbatacce photoresist da kuma wadanda ba fallasa yankin na korau photoresisist za su narke a cikin ci gaba. Wannan yana gabatar da tsari mai girma uku. Bayan haɓakawa, guntu yana buƙatar tsarin kulawa da zafin jiki don zama fim mai wuyar gaske, wanda galibi yana aiki don ƙara haɓaka mannewa na photoresisist zuwa substrate.
(5) Ciwon kai:
Abubuwan da ke ƙarƙashin photoresisist an yi su. Ya haɗa da jikawar ruwa da bushewar gaseous etching. Alal misali, don rigar etching na silicon, ana amfani da maganin ruwa na acidic acid na hydrofluoric acid; Don jika na jan ƙarfe, ana amfani da maganin acid mai ƙarfi kamar nitric acid da sulfuric acid, yayin da bushewar etching yakan yi amfani da filasta ko ion ion mai ƙarfi mai ƙarfi don lalata saman kayan kuma a cire shi.
(6) Tsarkakewa:
A ƙarshe, ana buƙatar cire photoresist daga saman ruwan tabarau. Ana kiran wannan mataki degumming.
Tsaro shine mafi mahimmancin batu a duk samar da semiconductor. Babban haɗari da cutarwa gas na photolithography a cikin guntu lithography tsari ne kamar haka:
1. Hydrogen peroxide
Hydrogen peroxide (H2O2) yana da ƙarfi mai ƙarfi. Haɗuwa kai tsaye na iya haifar da kumburin fata da ido da ƙonewa.
2. Xylene
Xylene wani ƙarfi ne kuma mai haɓakawa da ake amfani da shi a cikin lithography mara kyau. Yana da flammable kuma yana da ƙananan zafin jiki na 27.3 ℃ kawai (kimanin zafin jiki). Yana da fashewa lokacin da maida hankali a cikin iska shine 1% -7%. Maimaita lamba tare da xylene na iya haifar da kumburin fata. Turin Xylene yana da daɗi, kama da warin jirgin sama; daukan hotuna zuwa xylene na iya haifar da kumburin idanu, hanci da makogwaro. Shakar iskar gas na iya haifar da ciwon kai, tashin hankali, rashin ci da gajiya.
3. Hexamethyldisilazane (HMDS)
Hexamethyldisilazane (HMDS) an fi amfani da shi azaman farar fata don ƙara mannewa na photoresist a saman samfurin. Yana da flammable kuma yana da madaidaicin walƙiya na 6.7 ° C. Yana da fashewa lokacin da maida hankali a cikin iska shine 0.8% -16%. HMDS yana maida martani da ƙarfi da ruwa, barasa da acid acid don sakin ammonia.
4. Tetramethylammonium hydroxide
Tetramethylammonium hydroxide (TMAH) ana amfani dashi sosai azaman mai haɓakawa don ingantaccen lithography. Yana da guba da lalata. Yana iya zama m idan an haɗiye ko kuma yana hulɗa da fata kai tsaye. Haɗuwa da ƙurar TMAH ko hazo na iya haifar da kumburin idanu, fata, hanci da makogwaro. Shakar yawan adadin TMAH zai kai ga mutuwa.
5. Chlorine da fluorine
Chlorine (Cl2) da fluorine (F2) ana amfani da su a cikin lasers excimer azaman zurfin ultraviolet da matsanancin hasken ultraviolet (EUV). Dukansu iskar gas suna da guba, suna bayyana kore mai haske, kuma suna da ƙaƙƙarfan wari mai ban haushi. Shakar yawan iskar wannan iskar zai kai ga mutuwa. Gas na fluorine na iya amsawa da ruwa don samar da iskar hydrogen fluoride. Hydrogen fluoride gas wani acid ne mai ƙarfi wanda ke fusatar da fata, idanu da tsarin numfashi kuma yana iya haifar da alamu kamar ƙonewa da wahalar numfashi. Yawan sinadarin fluoride na iya haifar da guba ga jikin mutum, yana haifar da alamu kamar ciwon kai, amai, gudawa, da kuma suma.
6. Argon
Argon (Ar) iskar gas ce mara aiki wacce yawanci baya cutar da jikin dan adam kai tsaye. A cikin yanayi na al'ada, iskar da mutane ke shaka ta ƙunshi kusan 0.93% argon, kuma wannan ƙaddamarwa ba shi da wani tasiri a jikin ɗan adam. Duk da haka, a wasu lokuta, argon na iya haifar da lahani ga jikin mutum.
Anan akwai wasu yanayi masu yuwuwa: A cikin keɓaɓɓen sararin samaniya, ƙaddamarwar argon na iya ƙaruwa, ta yadda zai rage yawan iskar oxygen a cikin iska kuma yana haifar da hypoxia. Wannan na iya haifar da alamun kamar dizziness, gajiya, da ƙarancin numfashi. Bugu da kari, argon iskar gas ce mara amfani, amma yana iya fashe a karkashin tsananin zafin jiki ko matsa lamba.
7. Neon
Neon (Ne) iskar gas ne mai tsayayye, mara launi da wari wanda baya shiga cikin iskar Neon ba ya shiga cikin tsarin numfashi na mutum, don haka shakar iskar gas mai yawa zai haifar da hypoxia. Idan kun kasance cikin yanayin hypoxia na dogon lokaci, kuna iya samun alamun bayyanar cututtuka kamar ciwon kai, tashin zuciya, da amai. Bugu da kari, iskar Neon na iya amsawa da wasu abubuwa a karkashin matsanancin zafin jiki ko matsa lamba don haifar da wuta ko fashewa.
8. xenon gas
Gas na xenon (Xe) iskar gas ce mai tsayayye, mara launi da wari wanda baya shiga cikin tsarin numfashin dan adam, don haka shakar iskar gas mai yawa na xenon zai haifar da hypoxia. Idan kun kasance cikin yanayin hypoxia na dogon lokaci, kuna iya samun alamun bayyanar cututtuka kamar ciwon kai, tashin zuciya, da amai. Bugu da kari, iskar Neon na iya amsawa da wasu abubuwa a karkashin matsanancin zafin jiki ko matsa lamba don haifar da wuta ko fashewa.
9. Krypton gas
Krypton gas (Kr) iskar gas ce mai tsayayye mara launi da wari wanda baya shiga tsarin numfashin dan adam, don haka shakar iskar krypton mai yawa zai haifar da hypoxia. Idan kun kasance cikin yanayin hypoxia na dogon lokaci, kuna iya samun alamun bayyanar cututtuka kamar ciwon kai, tashin zuciya, da amai. Bugu da ƙari, iskar xenon na iya amsawa tare da wasu abubuwa a ƙarƙashin matsanancin zafin jiki ko matsa lamba don haifar da wuta ko fashewa. Numfashi a cikin yanayi tare da rashin iskar oxygen na iya haifar da hypoxia. Idan kun kasance cikin yanayin hypoxia na dogon lokaci, kuna iya samun alamun bayyanar cututtuka kamar ciwon kai, tashin zuciya, da amai. Bugu da kari, krypton gas na iya amsawa tare da wasu abubuwan da ke ƙarƙashin matsanancin zafin jiki ko matsa lamba don haifar da wuta ko fashewa.
Hanyoyin gano iskar gas mai haɗari ga masana'antar semiconductor
Masana'antar semiconductor ta ƙunshi samarwa, masana'anta, da aiwatar da iskar gas mai ƙonewa, fashewar abubuwa, mai guba, da iskar gas mai cutarwa. A matsayinka na mai amfani da iskar gas a masana'antar masana'antar semiconductor, kowane memba ya kamata ya fahimci bayanan aminci na iskar gas iri-iri masu haɗari kafin amfani da shi, kuma yakamata ya san yadda za'a magance hanyoyin gaggawa lokacin da waɗannan iskar gas ke zubowa.
A cikin kera, masana'anta, da kuma ajiyar masana'antar semiconductor, don guje wa asarar rayuka da dukiyoyin da ke haifar da zubewar wadannan iskar gas mai hatsarin gaske, ya zama dole a sanya na'urorin gano iskar gas don gano iskar gas din da ake nufi.
Masu gano iskar gas sun zama mahimman kayan aikin sa ido akan muhalli a masana'antar semiconductor na yau, kuma sune mafi kyawun kayan aikin sa ido kai tsaye.
Riken Keiki ya ko da yaushe kula da lafiya ci gaban da semiconductor masana'antu masana'antu, tare da manufa na samar da wani aminci yanayin aiki ga mutane, da kuma ya sadaukar da kanta ga bunkasa gas na'urori masu auna sigina dace da semiconductor masana'antu, samar da m mafita ga daban-daban matsalolin da suka ci karo da. masu amfani, da ci gaba da haɓaka ayyukan samfur da inganta tsarin.
Lokacin aikawa: Yuli-16-2024