Samar da na'urar Semiconductor galibi ya haɗa da na'urori masu hankali, haɗaɗɗun da'irori da hanyoyin tattara su.
Za a iya raba samar da Semiconductor zuwa matakai uku: samar da kayan jiki na samfur, samfurwafermasana'antu da haɗin na'ura. Daga cikin su, mafi munin gurɓataccen gurɓataccen abu shine matakin masana'anta na wafer.
An raba gurɓatattun abubuwa zuwa ruwan sharar gida, da iskar gas da datti.
Tsarin masana'anta na guntu:
Silicon waferbayan waje nika - tsaftacewa - hadawan abu da iskar shaka - uniform tsayayya - photolithography - ci gaba - etching - yadawa, ion implantation - sinadaran tururi jijiya - sinadaran inji polishing - metallization, da dai sauransu.
Ruwan sharar gida
Ana samar da ruwa mai yawa a cikin kowane mataki na masana'antu na semiconductor da gwajin marufi, galibi ruwan sharar acid-base, ruwan datti mai ɗauke da ammonia da ruwan datti.
1. Ruwa mai dauke da fluorine:
Hydrofluoric acid ya zama babban kaushi da ake amfani da shi a cikin hadawan abu da iskar shaka da etching tafiyar matakai saboda ta oxidizing da lalata Properties. Ruwa mai dauke da fluorine a cikin tsari ya fito ne daga tsarin yadawa da kuma aikin goge gogen sinadarai a cikin aikin kera guntu. A cikin aikin tsaftacewa na siliki da kayan aiki masu alaƙa, ana amfani da acid hydrochloric sau da yawa. Duk waɗannan hanyoyin ana kammala su a cikin keɓaɓɓun tankuna ko kayan tsaftacewa, don haka ana iya fitar da ruwan sha mai ɗauke da fluorine da kansa. Dangane da maida hankali, ana iya raba shi zuwa babban madaidaicin ruwa mai ɗauke da fluorine da ruwan datti mai ƙarancin ammonia. Gabaɗaya, yawan tattara ruwa mai ɗauke da ammonia mai girma zai iya kaiwa 100-1200 mg/l. Yawancin kamfanoni suna sake yin amfani da wannan ɓangaren ruwan sharar gida don hanyoyin da ba sa buƙatar ingantaccen ruwa.
2. Ruwan sharar acid-base:
Kusan kowane tsari a cikin haɗe-haɗen tsarin kera da'ira yana buƙatar tsabtace guntu. A halin yanzu, sulfuric acid da hydrogen peroxide sune ruwan tsaftacewa da aka fi amfani da su a cikin tsarin kera da'ira. A lokaci guda kuma, ana amfani da reagents na tushen acid kamar nitric acid, hydrochloric acid da ruwan ammonia.
Ruwan sharar acid-tushe na tsarin masana'antu ya fito ne daga tsarin tsaftacewa a cikin tsarin kera guntu. A cikin tsarin marufi, ana kula da guntu tare da maganin acid-base yayin nazarin lantarki da nazarin sinadarai. Bayan magani, ana buƙatar wanke shi da ruwa mai tsabta don samar da ruwa mai wanke acid-base. Bugu da kari, ana amfani da reagents-base reagents kamar sodium hydroxide da hydrochloric acid a cikin tsaftataccen tashar ruwa don sake farfado da anion da resin cation don samar da ruwan sharar acid-tushe. Ana kuma samar da ruwan wutsiya a lokacin aikin wanke-wanke gas na sharar acid-base. A cikin kamfanonin kera da'ira, adadin ruwan datti na acid-base ya fi girma.
3. Ruwan sharar jiki:
Saboda matakai daban-daban na samarwa, adadin abubuwan da ake amfani da su a cikin masana'antar semiconductor ya bambanta sosai. Koyaya, a matsayin wakilai masu tsaftacewa, har yanzu ana amfani da kaushi mai ƙarfi a cikin hanyoyin haɗin masana'anta daban-daban. Wasu abubuwan kaushi suna zama zubar da ruwan sharar jiki.
4. Sauran ruwan sharar gida:
Tsarin etching na tsarin samar da semiconductor zai yi amfani da adadi mai yawa na ammonia, fluorine da ruwa mai tsafta don ƙazanta, ta yadda za a samar da babban taro mai ɗauke da ruwan sharar gida mai ɗauke da ammonia.
Ana buƙatar tsarin lantarki a cikin tsarin marufi na semiconductor. Ana buƙatar goge guntu bayan yin amfani da wutar lantarki, kuma za a samar da ruwan sharar wutar lantarki a cikin wannan tsari. Tun da ana amfani da wasu karafa wajen sarrafa wutar lantarki, za a samu fitar da sinadarin ion karfe a cikin injin tsabtace ruwan datti, kamar gubar, tin, disc, zinc, aluminum, da sauransu.
Gas mai sharar gida
Tun da tsarin semiconductor yana da babban buƙatu don tsabtar ɗakin aiki, yawanci ana amfani da magoya baya don fitar da nau'ikan iskar gas iri-iri da aka canza yayin aiwatarwa. Sabili da haka, iskar gas mai sharar gida a cikin masana'antar semiconductor yana da girman girman shayewa da ƙarancin fitarwa. Har ila yau, sharar iskar gas yana da rauni.
Ana iya raba waɗannan sharar iskar gas ɗin zuwa rukuni huɗu: iskar acidic, gas ɗin alkaline, iskar gas ɗin shara da iskar gas mai guba.
1. Acid-base sharar gas:
Gas mai sharar acid-base yana fitowa ne daga yaduwa,CVD, CMP da tsarin etching, waɗanda ke amfani da maganin tsabtace tushen acid don tsaftace wafer.
A halin yanzu, mafi yawan amfani da kaushi mai tsaftacewa a cikin tsarin masana'antar semiconductor shine cakuda hydrogen peroxide da sulfuric acid.
Gas mai sharar da ake samu a cikin wadannan matakai ya hada da iskar acidic kamar su sulfuric acid, hydrofluoric acid, hydrochloric acid, nitric acid da phosphoric acid, kuma iskar alkaline yafi ammonia ne.
2. Gas mai sharar jiki:
Gas mai sharar jiki ya fito ne daga matakai kamar photolithography, haɓakawa, etching da yadawa. A cikin waɗannan matakai, ana amfani da maganin kwayoyin halitta (kamar isopropyl barasa) don tsaftace farfajiyar wafer, kuma iskar gas ɗin da aka samu ta hanyar haɓakawa yana ɗaya daga cikin tushen iskar gas mai sharar gida;
A lokaci guda kuma, photoresist (photoresist) da ake amfani da shi wajen aiwatar da hoto da kuma etching yana ƙunshe da abubuwan da ba su da kyau, irin su butyl acetate, wanda ke jujjuyawa cikin yanayi yayin aikin sarrafa wafer, wanda shine wani tushen iskar gas.
3. Gas mai guba mai guba:
Gas mai guba mai guba ya fito ne daga matakai kamar crystal epitaxy, bushe etching da CVD. A cikin waɗannan matakai, ana amfani da iskar gas na musamman masu tsabta iri-iri don sarrafa wafer, irin su silicon (SiHj), phosphorus (PH3), carbon tetrachloride (CFJ), borane, boron trioxide, da sauransu. Wasu iskar gas na musamman suna da guba. asphyxiating da lalata.
A lokaci guda, a cikin bushe etching da tsaftacewa tsari bayan sinadaran tururi jijiya a semiconductor masana'antu, babban adadin cikakken oxide (PFCS) gas ake bukata, kamar NFS, C2F & CR, C3FS, CHF3, SF6, da dai sauransu Wadannan perfluorinated mahadi. suna da ƙarfi mai ƙarfi a cikin yankin hasken infrared kuma ku zauna a cikin yanayi na dogon lokaci. Gabaɗaya ana ɗaukar su a matsayin babban tushen tasirin tasirin greenhouse na duniya.
4. Marufi tsari sharar gas:
Idan aka kwatanta da tsarin masana'antu na semiconductor, iskar gas ɗin da aka samar ta hanyar tattarawar semiconductor abu ne mai sauƙi, galibi gas ɗin acidic, resin epoxy da ƙura.
Gas mai daɗaɗɗen acid ana haifar da shi ne a cikin matakai kamar na'urar lantarki;
Ana samar da iskar gas ɗin yin burodi a cikin tsarin yin burodi bayan manna samfur da hatimi;
Na'urar dicing tana haifar da iskar gas mai ɗauke da ƙurar siliki a yayin aikin yankan wafer.
Matsalolin gurbatar muhalli
Ga matsalolin gurɓacewar muhalli a masana'antar semiconductor, manyan matsalolin da ake buƙatar warware su sune:
· Babban yawan watsi da gurɓataccen iska da mahaɗan ƙwayoyin cuta masu canzawa (VOCs) a cikin tsarin hoto;
Fitar da abubuwan da aka lalata (PFCS) a cikin etching na plasma da tafiyar matakai na tururi;
· Yawan amfani da makamashi da ruwa a cikin samarwa da kare lafiyar ma'aikata;
Sake yin amfani da su da kuma lura da gurbatar yanayi na samfuran;
Matsalolin amfani da sinadarai masu haɗari a cikin tsarin marufi.
Tsaftace samarwa
Za'a iya inganta fasahar samarwa mai tsabta na Semiconductor daga bangarorin albarkatun kasa, matakai da sarrafa tsari.
Inganta albarkatun kasa da makamashi
Na farko, ya kamata a kula da tsaftataccen kayan aiki don rage ƙaddamar da ƙazanta da ƙwayoyin cuta.
Na biyu, zazzabi daban-daban, gano ɗigogi, girgiza, girgizar wutar lantarki mai ƙarfi da sauran gwaje-gwaje ya kamata a yi a kan abubuwan da ke shigowa ko samfuran da aka kammala kafin a saka su cikin samarwa.
Bugu da kari, ya kamata a sarrafa tsaftar kayan taimako sosai. Akwai fasaha da yawa da za a iya amfani da su don samar da makamashi mai tsabta.
Inganta tsarin samarwa
Masana'antar semiconductor kanta tana ƙoƙarin rage tasirinta akan muhalli ta hanyar haɓaka fasahar aiwatarwa.
Misali, a cikin shekarun 1970s, ana amfani da kaushi mai kaushi don tsaftace wafers a cikin fasahar tsaftace kewaye. A cikin 1980s, an yi amfani da maganin acid da alkali irin su sulfuric acid don tsaftace wafers. Har zuwa 1990s, an haɓaka fasahar tsabtace oxygen ta plasma.
Dangane da marufi, yawancin kamfanoni a halin yanzu suna amfani da fasahar lantarki, wanda zai haifar da gurɓataccen ƙarfe ga muhalli.
Duk da haka, masana'antar tattara kaya a Shanghai sun daina amfani da fasahar lantarki, don haka babu wani tasiri da manyan karafa ke yi ga muhalli. Ana iya gano cewa masana'antar semiconductor sannu a hankali tana rage tasirinta akan muhalli ta hanyar inganta tsari da maye gurbin sinadarai a cikin tsarin ci gabanta, wanda kuma ya biyo bayan yanayin ci gaban duniya na yanzu na ba da shawarwari da ƙirar samfura bisa yanayin.
A halin yanzu, ana aiwatar da ƙarin inganta tsarin gida, gami da:
Sauya da rage duk-ammonium PFCS gas, kamar yin amfani da PFCs gas tare da ƙananan sakamako na greenhouse don maye gurbin gas tare da babban tasiri na greenhouse, kamar inganta tsarin tafiyarwa da rage yawan iskar PFCS da aka yi amfani da shi a cikin tsari;
· Inganta tsaftacewa mai yawa-wafer zuwa tsaftacewa guda-wafer don rage yawan adadin sinadarai masu tsaftacewa da aka yi amfani da su a cikin aikin tsaftacewa.
· Ƙuntataccen tsari:
a. Gane aiki da kai na masana'antu tsari, wanda zai iya gane daidai aiki da tsari samar, da kuma rage babban kuskure kudi na manual aiki;
b. Tsaftataccen tsari mai tsaftar muhalli dalilai, kusan 5% ko ƙasa da asarar amfanin amfanin ƙasa mutane da muhalli ne ke haifar da su. Ultra-tsaftataccen tsari abubuwan muhalli musamman sun haɗa da tsabtar iska, ruwa mai tsafta, iska mai matsewa, CO2, N2, zafin jiki, zafi, da dai sauransu. Ana auna matakin tsafta na tsaftataccen bita sau da yawa da matsakaicin adadin barbashi da aka yarda da kowace juzu'in naúrar. iska, wato, ƙwaƙƙwaran ƙididdiga;
c. Ƙarfafa ganowa, kuma zaɓi mahimman mahimman bayanai don ganowa a wuraren aiki tare da ɗimbin sharar gida yayin aikin samarwa.
Maraba da kowane abokin ciniki daga ko'ina cikin duniya don ziyartar mu don ƙarin tattaunawa!
https://www.vet-china.com/
https://www.facebook.com/people/Ningbo-Miami-Advanced-Material-Technology-Co-Ltd/100085673110923/
https://www.linkedin.com/company/100890232/admin/page-posts/published/
https://www.youtube.com/@user-oo9nl2qp6j
Lokacin aikawa: Agusta-13-2024