Ukufakwa komphunga wekhemikhali (i-CVD) yinkqubo ebandakanya ukufaka imuvi eyomeleleyo kumphezulu we-silicon wafer ngokusebenzisa imichiza yekhemikhali yomxube werhasi. Le nkqubo inokwahlulwa ibe yimodeli yezixhobo ezidityanisiweyo esekwe kwiimeko ezahlukeneyo zokusabela kweekhemikhali ezifana noxinzelelo kunye ne-precursor.
Ezi zixhobo zimbini zisetyenziselwa ntoni inkqubo?I-PECVD (i-Plasma Enhanced) izixhobo zisetyenziswa ngokubanzi kwisicelo esifana ne-OX, i-Nitride, isango lensimbi yensimbi, kunye ne-amorphous carbon. Ngakolunye uhlangothi, i-LPCVD ( Amandla aphantsi ) ngokuqhelekileyo isetyenziselwa i-Nitride, i-poly, kunye ne-TEOS.
Uthini umgaqo?Itekhnoloji ye-PECVD idibanisa amandla e-plasma kunye ne-CVD ngokuxhaphaza iplasma yobushushu obuphantsi ukukhuthaza ukukhutshwa okutsha kwi-cathode yegumbi lenkqubo. Oku kuvumela ukulawula imichiza kunye ne-plasma ukuphendula kweekhemikhali ukwenza imuvi eyomeleleyo kumphezulu wesampulu. Ngokufanayo, i-LPCVD isicwangciso sokusebenza ekunciphiseni uxinzelelo lwegesi ye-chemical reaction kwi-reactor.
yenza i-AI ibe ngumntu: Ukusetyenziswa kwe-Humanize AI kwintsimi yeteknoloji ye-CVD kunokunyusa kakhulu ukusebenza kunye nokuchaneka kwenkqubo yokubeka i-movie. Ngokunyuka kwe-algorithm ye-AI, ukujonga kunye nohlengahlengiso lweparamitha enje ngeparamitha ye-ion, isantya sokuhamba kwerhasi, ubushushu, kunye nobukhulu be-movie bunokuphucula iziphumo ezingcono.
Ixesha lokuposa: Oct-24-2024