I-Chemical Vapor Deposition (CVD) yitekhnoloji ebalulekileyo yokubekwa kwefilim ebhityileyo, ehlala isetyenziselwa ukulungisa iifilimu ezahlukeneyo ezisebenzayo kunye nezixhobo ezinomaleko obhityileyo, kwaye isetyenziswa ngokubanzi kwimveliso ye-semiconductor kunye namanye amacandelo.
1. Umgaqo wokusebenza weCVD
Kwinkqubo ye-CVD, i-precursor yegesi (i-gaseous precursor compounds enye okanye ngaphezulu) idityaniswe ne-substrate surface kwaye ifudunyezwe kwiqondo lokushisa elithile ukuze kubangele ukusabela kweekhemikhali kunye ne-deposit kwi-substrate surface ukwenza ifilimu efunwayo okanye i-coating. umaleko. Imveliso yale mpendulo yekhemikhali iqinile, ngokuqhelekileyo i-compound yezinto ezifunwayo. Ukuba sifuna ukuncamathelisa i-silicon kumphezulu, sinokusebenzisa i-trichlorosilane (SiHCl3) njengerhasi ye-precursor: SiHCl3 → Si + Cl2 + HCl Silicon iya kubophelela kuyo nayiphi na indawo evezwayo (ngaphakathi nangaphandle), ngelixa i-chlorine kunye neegesi ze-hydrochloric acid ziyakubopha. akhutshwe egumbini.
2. Ukuhlelwa kweCVD
I-Thermal CVD: Ngokufudumeza irhasi ye-precursor ukuze ibole kwaye iyifake kumphezulu we-substrate. I-Plasma Enhanced CVD (PECVD): I-Plasma yongezwa kwi-CVD ye-thermal ukunyusa izinga lokuphendula kunye nokulawula inkqubo yokubeka. I-Metal Organic CVD (MOCVD): Ukusebenzisa i-metal organic compounds njenge-precursor gases, iifilimu ezincinci zesinyithi kunye ne-semiconductors zinokulungiswa, kwaye zihlala zisetyenziselwa ukuveliswa kwezixhobo ezifana nee-LED.
3. Isicelo
(1) Ukwenziwa kweSemiconductor
Ifilimu ye-Silicide: isetyenziselwa ukulungisa i-insulating layers, i-substrates, i-isolation layers, njl. Ifilimu ye-Nitride: isetyenziselwa ukulungisa i-silicon nitride, i-aluminium nitride, njl., isetyenziswe kwii-LED, izixhobo zamandla, njl. iileya, njl.
(2) Bonisa iteknoloji
Ifilimu ye-ITO: Ifilimu ye-transparent conductive oxide, edla ngokusetyenziswa kwimiboniso yephaneli ecaba kunye nezikrini zokuchukumisa. Ifilimu yobhedu: isetyenziselwa ukulungiselela iileyile zokupakisha, imigca ye-conductive, njl., Ukuphucula ukusebenza kwezixhobo zokubonisa.
(3) Eminye imimandla
Iingubo ze-Optical: kubandakanywa ii-anti-reflective coatings, izihlungi ze-optical, njl.
4. Iimpawu zenkqubo yeCVD
Sebenzisa indawo yobushushu obuphezulu ukukhuthaza isantya sokusabela. Ngokuqhelekileyo yenziwa kwindawo engenanto. Ukungcola ebusweni benxalenye kufuneka kususwe ngaphambi kokupenda. Inkqubo inokuba nemida kwi-substrates enokuthi igqunywe, oko kukuthi, ukunciphisa ubushushu okanye ukulinganiselwa kokusebenza kwakhona. I-coating ye-CVD iya kugubungela zonke iindawo zenxalenye, kubandakanywa imicu, imingxuma eyimfama kunye neendawo zangaphakathi. Inokunciphisa isakhono sokugquma iindawo ezithile ekujoliswe kuzo. Ubukhulu befilimu bukhawulelwe yinkqubo kunye neemeko zempahla. Ukubambelela okuphezulu.
5. Izinto eziluncedo zobuchwepheshe beCVD
Ukufana: Iyakwazi ukuphumeza ukubekwa okufanayo kwindawo enkulu.
Ukulawulwa: Izinga lokubeka kunye neempawu zefilimu zinokuhlengahlengiswa ngokulawula izinga lokuhamba kunye nobushushu begesi yangaphambili.
I-Versatility: Ilungele ukubekelwa izinto ezahlukeneyo, njengesinyithi, i-semiconductors, i-oxides, njl.
Ixesha lokuposa: May-06-2024