Amandla e-VETInkqubo ye-PECVD ye-graphite carrier yinkqubo yokusetyenziswa komgangatho ophezulu elungiselelwe i-PECVD (i-plasma ephuculweyo yokubeka umphunga wekhemikhali) inkqubo. Lo mphathiswa wegraphite wenziwa ngococeko oluphezulu, olunoxinano oluphezulu lwegraphite, kunye nokumelana nobushushu obuphezulu, ukumelana nokugqwala, ukuzinza kwedimensional kunye nezinye iimpawu, kunokubonelela ngeqonga elizinzileyo lokuthwala inkqubo ye-PECVD, ukuqinisekisa ukufana kunye nokuthe tyaba kwefilimu encinci. ukubekwa.
Abathwali beGraphite kwinkqubo ye-PECVD banezi mpawu zilandelayo:
▪ Ubunyulu obuphezulu: ubumdaka obuphantsi kakhulu, ukuphepha ukungcoliseka kwefilimu nokuqinisekisa umgangatho wefilimu.
▪ Uxinaniso oluphezulu: ubuninzi obuphezulu, amandla aphezulu omatshini, okwazi ukumelana nobushushu obuphezulu kunye noxinzelelo oluphezulu lwe-PECVD indawo.
▪ Uzinzo oluhle lomgangatho: utshintsho oluncinci lwe-dimensional kwiqondo lokushisa eliphezulu, ukuqinisekisa ukuzinza kwenkqubo.
▪ I-thermal conductivity egqwesileyo: ngokufanelekileyo ukudlulisa ubushushu ukuthintela ukufudumeza kwe-wafer.
▪ Ukumelana nomhlwa okunamandla: iyakwazi ukuxhathisa ukhukuliseko ngenxa yeegesi ezonakalisayo ezahlukahlukeneyo kunye neplasma.
▪ Inkonzo eyenziwe ngokwezifiso: abathwali begraphite bobukhulu obuhlukeneyo kunye neemilo zinokwenziwa ngokwezifiso ngokweemfuno zabathengi.
Imathiriyeli yeGrafite evela kwi-SGL:
Iparameter eqhelekileyo: R6510 | |||
Isalathiso | Umgangatho wovavanyo | Ixabiso | Iyunithi |
Ubungakanani obuphakathi kweenkozo | ISO 13320 | 10 | μm |
Unizi lolwapho kuyiwa khona | I-DIN IEC 60413/204 | 1.83 | g/cm3 |
I-porosity evulekile | DIN66133 | 10 | % |
Ubungakanani bepore obuphakathi | DIN66133 | 1.8 | μm |
Ukufikeleleka | DIN 51935 | 0.06 | cm²/s |
Ubunzima be-Rockwell HR5/100 | I-DIN IEC60413/303 | 90 | HR |
Ukuxhatshazwa kombane okuthe ngqo | I-DIN IEC 60413/402 | 13 | μΩm |
Amandla e-Flexural | I-DIN IEC 60413/501 | 60 | MPa |
Amandla acinezelayo | DIN 51910 | 130 | MPa |
Imodyuli yolutsha | DIN 51915 | 11.5×10³ | MPa |
Ukwandiswa kweThermal(20-200℃) | DIN 51909 | 4.2X10-6 | K-1 |
I-Thermal conductivity (20℃) | DIN 51908 | 105 | Wm-1K-1 |
Yenzelwe ngokukodwa ukwenziwa komgangatho ophezulu wokwenziwa kweeseli zelanga, ezixhasa i-G12 ubungakanani obukhulu be-wafer processing. Uyilo oluphuculweyo lomthwali wonyusa kakhulu umthamo, uvumela amazinga esivuno aphezulu kunye neendleko eziphantsi zemveliso.
Into | Uhlobo | Inombolo yomphathi wewafer |
PEVCD Grephite iphenyane - The 156 series | 156-13 isikhephe segrephite | 144 |
156-19 isikhephe segrephite | 216 | |
156-21 isikhephe segrephite | 240 | |
156-23 isikhephe segraphite | 308 | |
PEVCD Grephite iphenyane - The 125 series | 125-15 isikhephe segrephite | 196 |
125-19 isikhephe segrephite | 252 | |
125-21 isikhephe se-grphite | 280 |