SiC e koahetsoeng ka karolo e nyenyane ea Graphite bakeng sa Semiconductor, Literene tsa Graphite, Sic Graphiteli-susceptors tsa epitaxy,
Carbon e fana ka li-susceptors, li-susceptors tsa epitaxy, Li-Susceptors tsa Graphite, SiC Epitaxy, li-substrates tse tšehetsang,
SiC Coated Graphite Carriers

Re boloka mamello e haufi haholo ha re sebelisa seaparo sa SiC, re sebelisa machining a phahameng ka ho fetisisa ho etsa bonnete ba hore ho na le boemo bo tšoanang ba susceptor. Re boetse re hlahisa lisebelisoa tse nang le thepa e nepahetseng ea ho hanyetsa motlakase bakeng sa ho sebelisoa lits'ebetsong tse futhumatsang ka matla. Likarolo tsohle tse phethiloeng li tla le setifikeiti sa ho hloeka le ho lumellana ha dimensional.

Khamphani ea rona e fana ka lits'ebeletso tsa ts'ebetso ea ho roala SiC ka mokhoa oa CVD holim'a graphite, li-ceramics le lisebelisoa tse ling, e le hore likhase tse khethehileng tse nang le carbon le silicon li sebetsane le mocheso o phahameng ho fumana limolek'hule tsa SiC tse hloekileng, limolek'hule tse behiloeng holim'a thepa e koahetsoeng, ho etsa lera la tšireletso la SIC. SIC e entsoeng e tlamahane ka thata ho setsi sa graphite, e fana ka lisebelisoa tse khethehileng tsa graphite, kahoo e etsa hore bokaholimo ba graphite bo kopane, bo se ke ba e-ba le Porosity, ho hanyetsa mocheso o phahameng, ho hanyetsa kutu le ho hanyetsa oxidation.

Ts'ebetso ea CVD e fana ka bohloeki bo phahameng haholo le boits'oaro ba mohopolo oa SiC coating ntle le porosity. Ho feta moo, kaha silicon carbide e thata haholo, e ka belisoa hore e be holim'a seipone. Ho roala ha CVD silicon carbide (SiC) ho ile ha fana ka melemo e mengata ho kenyeletsoa boleng bo holimo ba bohloeki le ho tšoarella ka nako e telele. Kaha lihlahisoa tse koahetsoeng li na le ts'ebetso e ntle maemong a phahameng a vacuum le mocheso o phahameng, li loketse lits'ebetso indastering ea semiconductor le tikolohong e 'ngoe e hloekileng haholo. Re boetse re fana ka lihlahisoa tsa pyrolytic graphite (PG).

Lintlha tse ka sehloohong:

1. Ho hanyetsa mocheso o phahameng oa oxidation:

khanyetso ea oxidation e ntse e le ntle haholo ha mocheso o le holimo ho 1600 C.

2. Bohloeki bo phahameng: bo entsoeng ka ho kenngoa ha mouoane oa lik'hemik'hale tlas'a boemo bo phahameng ba mocheso oa chlorination.

3. Ho hanyetsa khoholeho ea mobu: boima bo phahameng, bokaholimo bo kopanetsoeng, likaroloana tse ntle.

4. Ho hanyetsa kutu: acid, alkali, letsoai le li-reagents tse phelang.

Lintlha tse ka sehloohong tsa CVD-SIC Coatings:

Kopo: CVD silicon carbide coating e se e sebelisitsoe indastering ea semiconductor e se e ntse e sebelisoa, joalo ka tray ea MOCVD, RTP le oxide etching chamber ho tloha ha silicon nitride e na le matla a maholo a ho hanyetsa mocheso 'me e khona ho mamella plasma e matla ea matla.
-Silicon carbide e sebelisoa haholo ho semiconductor le ho roala.

Matla a Phepelo:

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