Kenyelletso ea theknoloji ea deposition ea "chemical vapor deposition" (CVD) e tšesaane

Chemical Vapor Deposition (CVD) ke thekenoloji ea bohlokoa e tšesaane ea ho beha lifilimi, e atisang ho sebelisoa ho lokisa lifilimi tse fapaneng tse sebetsang le lisebelisoa tse mosesaane, 'me e sebelisoa haholo tlhahisong ea li-semiconductor le likarolo tse ling.

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1. Molao-motheo oa ho sebetsa oa CVD
Ts'ebetsong ea CVD, selelekela sa khase (motsoako o le mong kapa ho feta oa gaseous precursor) se kopana le karolo e ka tlase ea metsi ebe se futhumatsoa ho mocheso o itseng ho baka karabelo ea lik'hemik'hale le ho beha holim'a substrate ho etsa filimi e lakatsehang kapa ho roala. lera. Sehlahisoa sa karabelo ena ea lik'hemik'hale ke ntho e tiileng, hangata e le motsoako oa thepa e lakatsehang. Haeba re batla ho khomarela silicon holim'a metsi, re ka sebelisa trichlorosilane (SiHCl3) e le khase ea pele: SiHCl3 → Si + Cl2 + HCl Silicon e tla tlama sebakeng leha e le sefe se pepeneneng (ka hare le ka ntle), ha likhase tsa chlorine le hydrochloric acid li tla. ho ntšoa phaposing.

2. Sehlopha sa CVD
Thermal CVD: Ka ho futhumatsa khase ea selelekela ho bola le ho e beha sebakeng sa substrate. Plasma Enhanced CVD (PECVD): Plasma e eketsoa ho CVD e futhumetseng ho ntlafatsa sekhahla sa karabelo le ho laola ts'ebetso ea deposition. Metal Organic CVD (MOCVD): Ho sebelisa metsoako ea tšepe ea organic e le likhase tse tlang pele, lifilimi tse tšesaane tsa tšepe le li-semiconductors li ka lokisoa, 'me hangata li sebelisoa ha ho etsoa lisebelisoa tse kang li-LED.

3. Kopo
(1) Ho etsa semiconductor
Filimi ea Silicide: e sebelisetsoang ho lokisa li-insulating layers, substrates, ho itšehla thajana, joalo-joalo Filimi ea Nitride: e sebelisetsoang ho lokisa silicon nitride, aluminium nitride, joalo-joalo, e sebelisoang ho li-LED, lisebelisoa tsa matla, joalo-joalo Filimi ea tšepe: e sebelisetsoang ho lokisetsa likarolo tse tsamaisang, tse entsoeng ka tšepe. lilaea, joalo-joalo.

(2) Theknoloji ea pontšo
Filimi ea ITO: Filimi ea Transparent conductive oxide, e sebelisoang hangata ho li-panels tse bataletseng le li-skrini tsa touch. Filimi ea koporo: e sebelisetsoang ho lokisa likarolo tsa ho paka, mela e tsamaisang, joalo-joalo, ho ntlafatsa ts'ebetso ea lisebelisoa tsa ponts'o.

(3) Likarolo tse ling
Li-optical coatings: ho kenyelletsa le li-anti-reflective coatings, li-filters tsa optical, joalo-joalo. Anti-corrosion coating: e sebelisoang likarolong tsa likoloi, lisebelisoa tsa sefofane, joalo-joalo.

4. Litšobotsi tsa mokhoa oa CVD
Sebelisa tikoloho ea mocheso o phahameng ho phahamisa lebelo la ho arabela. Hangata e etsoa sebakeng sa vacuum. Litšila ka holim'a karolo li tlameha ho tlosoa pele ho penta. Ts'ebetso e kanna ea ba le mefokolo ho li-substrates tse ka koaeloang, ke hore, meeli ea mocheso kapa mefokolo ea reactivity. Seaparo sa CVD se tla koahela libaka tsohle tsa karolo, ho kenyeletsa likhoele, likoti tse foufetseng le libaka tse ka hare. E ka fokotsa bokhoni ba ho pata libaka tse ikhethileng. Botenya ba filimi bo lekanyelitsoe ke maemo a ts'ebetso le thepa. Ho khomarela ka holimo.

5. Melemo ea theknoloji ea CVD
Uniformity: E khona ho fihlella ho beoa ka mokhoa o ts'oanang holim'a li-substrates tse kholo tsa sebaka.

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Controllability: Sekhahla sa deposition le thepa ea filimi e ka fetoloa ka ho laola sekhahla sa phallo le mocheso oa khase e tlang pele.

Versatility: E loketse ho beoa ha lisebelisoa tse fapaneng, joalo ka tšepe, li-semiconductors, li-oxide, jj.


Nako ea poso: May-06-2024
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