te mohio ki te hangarau Chemical Vapor Deposition ( CVD).

Ko te tukunga kohu matū ( CVD ) he tikanga e mau ai he kiriata totoka ki runga i te mata o te angiangi silicon ma te tauhohenga matū matū o te ranunga hau. Ka taea te wehewehe i tenei tikanga ki nga momo momo taputapu ka whakatauhia i runga i nga ahuatanga tauhohenga matū rereke penei i te pehanga me te tohu o mua.

He aha te tikanga e whakamahia ana enei taputapu e rua?Ko nga taputapu PECVD ( Plasma Enhanced ) e whakamahia nuitia ana ki te tono penei i te OX, Nitride, te kuaha huānga konganuku, me te waro amorphous. I tetahi atu taha, ko te LPCVD (Te Mana iti) ka whakamahia mo te Nitride, poly, me te TEOS.

He aha te kaupapa?Ko te hangarau PECVD e whakakotahi ana i te kaha plasma me te CVD ma te whakamahi i te plasma iti-mahana ki te whakakorikori i te rerenga hou ki te cathode o te ruma mahi. Ma tenei ka taea te whakahaere matū me te plasma tauhohenga matū kia hanga he kiriata totoka ki te mata tauira. Waihoki, kei te whakamahere a LPCVD ki te whakaheke i te pehanga hau tauhohenga matū i roto i te reactor.

tangata AI: Ko te whakamahi i te Humanize AI i roto i te mara o te hangarau CVD ka taea te whakanui ake i te pai me te tika o te tikanga whakahekenga kiriata. Ma te whakamahi i te algorithm AI, ko te aro turuki me te whakarereketanga o te tawhā penei i te tawhā katote, te rere o te hau, te pāmahana, me te matotoru kiriata ka taea te arotau mo nga hua pai ake.


Te wa tuku: Oketopa-24-2024
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