Mkpokọta vapor kemịkalụ (CVD) bụ usoro nke gụnyere itinye ihe nkiri siri ike n'elu silicon wafer site na mmeghachi omume kemịkal nke ngwakọta gas. Enwere ike kewaa usoro a n'ime ụdị akụrụngwa dị iche iche guzobe na ọnọdụ mmeghachi omume kemịkalụ dị iche iche dị ka nrụgide na nke mbụ.
Kedu usoro eji eji ngwaọrụ abụọ a?A na-eji ngwa PECVD (Plasma Enhanced) eme ihe n'ọtụtụ ebe na ngwa dịka OX, Nitride, ọnụ ụzọ mmewere ọla, na carbon amorphous. N'aka nke ọzọ, LPCVD (Obere Ike) na-ejikarị Nitride, poly, na TEOS.
Gịnị bụ ụkpụrụ?Teknụzụ PECVD na-ejikọta ike plasma na CVD site na iji plasma na-ekpo ọkụ dị ala iji mee ka mpụ dị ọhụrụ na cathode nke ụlọ usoro. Nke a na-ahapụ maka njikwa kemịkalụ kemịkalụ na plasma ka ọ bụrụ ihe nkiri siri ike na elu nlele. N'otu aka ahụ, LPCVD na-eme atụmatụ ịrụ ọrụ iji belata nrụgide mmeghachi omume kemịkalụ na reactor.
eme mmadu AI: Iji Humanize AI n'ọhịa nke teknụzụ CVD nwere ike ịkwalite arụmọrụ na izi ezi nke usoro ntinye ihe nkiri. Site na leverage AI algọridim, nleba anya na ngbanwe nke oke dị ka ion parameter, ọnụego gas, okpomọkụ, na ọkpụrụkpụ ihe nkiri nwere ike ịkwalite maka nsonaazụ kacha mma.
Oge nzipu: Ọktoba 24-2024