CVD adalah teknologi preparasi film tipis tradisional. Its principle is to use gaseous precursors to decompose certain components in the precursor through chemical reactions between atoms and molecules, and then form a thin film on the substrate. The basic characteristics of CVD are: chemical changes (chemical reactions or thermal decomposition); all materials in the film come from external sources; reactants must participate in the reaction in the form of gas phase.
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Waktu posting: 03 Des-2024