Qhov chaw muaj kuab paug thiab kev tiv thaiv hauv kev lag luam semiconductor

Cov khoom siv semiconductor feem ntau suav nrog cov khoom siv sib cais, kev sib xyaw ua ke thiab lawv cov txheej txheem ntim khoom.
Kev tsim khoom semiconductor tuaj yeem muab faib ua peb theem: cov khoom siv lub cev tsim khoom, cov khoom lag luamwaferkev tsim khoom thiab cov khoom sib dhos. Ntawm lawv, cov pa phem tshaj plaws yog cov khoom lag luam wafer raug tsim.
Cov pa phem feem ntau yog muab faib ua cov dej khib nyiab, khib nyiab thiab cov khoom khib nyiab.
Chip manufacturing txheej txheem:
Silicon waferTom qab kev sib tsoo sab nraud - tu - oxidation - uniform resist - photolithography - kev loj hlob - etching - diffusion, ion implantation - tshuaj vapor deposition - tshuaj mechanical polishing - metallization, thiab lwm yam.

Cov dej khib nyiab
Ib tug loj npaum li cas ntawm cov dej khib nyiab yog tsim nyob rau hauv txhua tus txheej txheem ntawm semiconductor manufacturing thiab ntim kuaj, feem ntau yog acid-base dej khib nyiab, ammonia-muaj cov dej khib nyiab thiab cov organic pov tseg.

1. Cov dej khib nyiab uas muaj fluorine:
Hydrofluoric acid dhau los ua cov kuab tshuaj tseem ceeb siv hauv oxidation thiab etching txheej txheem vim nws cov oxidizing thiab corrosive zog. Cov dej khib nyiab uas muaj fluorine hauv cov txheej txheem feem ntau yog los ntawm cov txheej txheem diffusion thiab cov txheej txheem tshuaj lom neeg polishing hauv cov txheej txheem chip manufacturing. Hauv kev tu cov txheej txheem ntawm silicon wafers thiab lwm yam khoom siv, hydrochloric acid kuj tau siv ntau zaus. Tag nrho cov txheej txheem no tau ua tiav nyob rau hauv etching tso tsheb hlau luam lossis cov khoom siv tu, yog li cov dej khib nyiab muaj fluorine tuaj yeem tso tawm ntawm nws tus kheej. Raws li qhov concentration, nws tuaj yeem muab faib ua high-concentration fluorine-muaj dej khib nyiab thiab tsawg-concentration ammonia-muaj dej khib nyiab. Feem ntau, cov concentration ntawm high-concentration ammonia-muaj cov dej khib nyiab tuaj yeem ncav cuag 100-1200 mg / L. Feem ntau cov tuam txhab lag luam rov ua dua qhov no ntawm cov dej khib nyiab rau cov txheej txheem uas tsis xav tau dej zoo.
2. Acid-base dej khib nyiab:
Yuav luag txhua tus txheej txheem hauv kev tsim hluav taws xob sib xyaw ua ke yuav tsum tau muab cov nti kom huv. Tam sim no, sulfuric acid thiab hydrogen peroxide yog cov tshuaj ntxuav dej ntau tshaj plaws hauv cov txheej txheem tsim hluav taws xob sib xyaw. Nyob rau tib lub sijhawm, acid-base reagents xws li nitric acid, hydrochloric acid thiab ammonia dej kuj tseem siv.
Cov kua qaub-puag dej khib nyiab ntawm cov txheej txheem tsim khoom feem ntau yog los ntawm cov txheej txheem ntxuav hauv cov txheej txheem tsim chip. Hauv cov txheej txheem ntim, cov nti tau kho nrog cov kua qaub-puag thaum lub sij hawm electroplating thiab tshuaj ntsuam xyuas. Tom qab kev kho mob, nws yuav tsum tau ntxuav nrog dej ntshiab kom tsim cov kua qaub-puag ntxuav cov dej khib nyiab. Tsis tas li ntawd, acid-base reagents xws li sodium hydroxide thiab hydrochloric acid kuj tseem siv rau hauv qhov chaw nres tsheb dej ntshiab kom rov tsim cov anion thiab cation resins los tsim cov kua qaub-puag rov tsim cov dej khib nyiab. Ntxuav tus Tsov tus tw kuj yog tsim thaum lub sij hawm acid-base khib nyiab txheej txheem. Hauv cov tuam txhab tsim hluav taws xob sib xyaw ua ke, cov kua qaub-puag dej khib nyiab yog qhov tshwj xeeb.
3. Organic wastewater:
Vim muaj cov txheej txheem ntau lawm, tus nqi ntawm cov kuab tshuaj organic siv hauv kev lag luam semiconductor sib txawv heev. Txawm li cas los xij, raws li cov neeg ua haujlwm tu, cov kuab tshuaj organic tseem siv dav hauv ntau qhov sib txuas ntawm kev ntim khoom. Qee cov kuab tshuaj ua cov dej khib nyiab organic.
4. Lwm cov dej khib nyiab:
Cov txheej txheem etching ntawm cov txheej txheem tsim khoom semiconductor yuav siv ntau cov ammonia, fluorine thiab dej purity siab rau decontamination, yog li tsim kom muaj cov kua qaub ammonia uas muaj cov dej khib nyiab.
Cov txheej txheem electroplating yuav tsum muaj nyob rau hauv cov txheej txheem ntim khoom semiconductor. Cov nti yuav tsum tau ntxuav tom qab electroplating, thiab electroplating tu cov dej khib nyiab yuav tsim nyob rau hauv cov txheej txheem no. Txij li qee cov hlau siv hauv electroplating, yuav muaj hlau ion emissions hauv electroplating tu dej khib nyiab, xws li txhuas, tin, disc, zinc, txhuas, thiab lwm yam.

Nqus roj
Txij li cov txheej txheem semiconductor muaj qhov xav tau siab heev rau kev ua haujlwm huv ntawm chav ua haujlwm, cov kiv cua feem ntau yog siv los rho tawm ntau hom khib nyiab volatilized thaum lub sijhawm ua haujlwm. Yog li ntawd, cov emissions pov tseg nyob rau hauv lub semiconductor kev lag luam yog characterized los ntawm loj tso ntim thiab tsawg emission concentration. Cov emissions khib nyiab kuj tseem yog volatilized.
Cov pa hluav taws xob pov tseg no tuaj yeem muab faib ua plaub pawg: cov pa roj acidic, alkaline gas, organic pov tseg roj thiab cov pa phem.
1. Acid-base khib nyiab:
Acid-base khib nyiab feem ntau yog los ntawm diffusion,CVD, CMP thiab cov txheej txheem etching, uas siv cov kua qaub-puag ntxuav kom huv si wafer.
Tam sim no, feem ntau siv cov kuab tshuaj ntxuav hauv cov txheej txheem semiconductor yog kev sib xyaw ntawm hydrogen peroxide thiab sulfuric acid.
Cov roj khib nyiab tsim tawm hauv cov txheej txheem no suav nrog cov kua qaub xws li sulfuric acid, hydrofluoric acid, hydrochloric acid, nitric acid thiab phosphoric acid, thiab cov roj alkaline feem ntau yog ammonia.
2. Organic pov tseg roj:
Organic khib nyiab tsuas yog los ntawm cov txheej txheem xws li photolithography, kev loj hlob, etching thiab diffusion. Nyob rau hauv cov txheej txheem no, cov tshuaj organic (xws li isopropyl cawv) yog siv los ntxuav lub wafer, thiab cov roj pov tseg uas tsim los ntawm volatilization yog ib qho ntawm cov khoom pov tseg cov pa roj;
Nyob rau tib lub sijhawm, photoresist (photoresist) siv nyob rau hauv cov txheej txheem ntawm photolithography thiab etching muaj volatile organic solvents, xws li butyl acetate, uas volatilizes rau hauv cov huab cua thaum lub sij hawm ua wafer, uas yog lwm qhov chaw ntawm cov organic pov tseg roj.
3. Cov pa phem pov tseg:
Cov pa phem pov tseg feem ntau yog los ntawm cov txheej txheem xws li siv lead ua epitaxy, qhuav etching thiab CVD. Nyob rau hauv cov txheej txheem no, ntau yam high-purity tshwj xeeb gases yog siv los ua cov wafer, xws li silicon (SiHj), phosphorus (PH3), carbon tetrachloride (CFJ), borane, boron trioxide, thiab lwm yam. Qee qhov tshwj xeeb gases yog tshuaj lom, asphyxiating thiab corrosive.
Nyob rau tib lub sij hawm, nyob rau hauv qhuav etching thiab tu txheej txheem tom qab tshuaj vapor deposition nyob rau hauv semiconductor manufacturing, ib tug loj npaum li cas ntawm tag nrho cov oxide (PFCS) roj yuav tsum, xws li NFS, C2F & CR, C3FS, CHF3, SF6, thiab lwm yam. Cov perfluorinated compounds. muaj zog nqus nyob rau hauv cheeb tsam lub teeb infrared thiab nyob rau hauv cov huab cua ntev. Lawv feem ntau suav hais tias yog lub hauv paus tseem ceeb ntawm lub ntiaj teb lub tsev cog qoob loo.
4. Ntim txheej txheem pov tseg roj:
Piv nrog rau cov txheej txheem tsim khoom semiconductor, cov roj khib nyiab tsim los ntawm cov txheej txheem ntim khoom semiconductor yog qhov yooj yim, feem ntau yog acidic gas, epoxy resin thiab plua plav.
Acidic khib nyiab yog tsim los ntawm cov txheej txheem xws li electroplating;
Ci khib nyiab yog tsim nyob rau hauv cov txheej txheem ntawm ci tom qab cov khoom pasting thiab sealing;
Lub tshuab dicing tsim cov roj khib nyiab uas muaj cov kab mob silicon plua plav thaum lub sij hawm wafer txiav.

Environmental pollution teeb meem
Rau cov teeb meem ib puag ncig hauv kev lag luam semiconductor, cov teeb meem tseem ceeb uas yuav tsum tau daws yog:
· Loj-loj emissions ntawm huab cua paug thiab volatile organic compounds (VOCs) nyob rau hauv cov txheej txheem photolithography;
· Emission ntawm perfluorinated compounds (PFCS) nyob rau hauv plasma etching thiab tshuaj vapor deposition txheej txheem;
· Kev siv lub zog loj thiab dej hauv kev tsim khoom thiab kev tiv thaiv kev nyab xeeb ntawm cov neeg ua haujlwm;
· Recycling thiab pollution soj ntsuam ntawm by-products;
· Cov teeb meem ntawm kev siv cov tshuaj phem hauv cov txheej txheem ntim khoom.

Kev tsim tawm huv
Cov khoom siv semiconductor huv huv ntau lawm tuaj yeem txhim kho los ntawm cov khoom siv raw, cov txheej txheem thiab cov txheej txheem tswj.

Txhim kho cov khoom siv raw thiab lub zog
Ua ntej, lub purity ntawm cov ntaub ntawv yuav tsum nruj me ntsis tswj kom txo tau cov kev taw qhia ntawm impurities thiab hais.
Thib ob, ntau yam kub, kev kuaj pom, kev vibration, high-voltage hluav taws xob poob siab thiab lwm yam kev ntsuam xyuas yuav tsum tau nqa tawm ntawm cov khoom tuaj lossis cov khoom tiav ua ntej lawv muab tso rau hauv ntau lawm.
Tsis tas li ntawd, lub purity ntawm cov khoom pab yuav tsum nruj me ntsis tswj. Muaj ntau yam thev naus laus zis uas tuaj yeem siv rau kev tsim hluav taws xob huv.

Optimize ntau lawm txheej txheem
Kev lag luam semiconductor nws tus kheej siv zog los txo nws txoj kev cuam tshuam rau ib puag ncig los ntawm kev txhim kho thev naus laus zis.
Piv txwv li, nyob rau xyoo 1970s, cov kuab tshuaj organic feem ntau yog siv los ntxuav cov wafers hauv kev sib xyaw ua ke ntawm kev tu tshuab. Hauv xyoo 1980s, cov kua qaub thiab alkali daws xws li sulfuric acid tau siv los ntxuav wafers. Txog thaum xyoo 1990, plasma oxygen tu tshuab tau tsim.
Hais txog kev ntim khoom, feem ntau cov tuam txhab tam sim no siv tshuab electroplating, uas yuav ua rau hnyav hlau ua paug rau ib puag ncig.
Txawm li cas los xij, ntim cov nroj tsuag hauv Shanghai tsis siv cov tshuab electroplating, yog li tsis muaj kev cuam tshuam ntawm cov hlau hnyav rau ib puag ncig. Nws tuaj yeem pom tau tias kev lag luam semiconductor maj mam txo nws qhov cuam tshuam rau ib puag ncig los ntawm cov txheej txheem kev txhim kho thiab kev hloov tshuaj lom neeg hauv nws tus kheej txoj kev loj hlob, uas kuj ua raws li kev tsim kho thoob ntiaj teb tam sim no ntawm cov txheej txheem tawm tswv yim thiab cov khoom tsim raws li ib puag ncig.

Tam sim no, kev txhim kho cov txheej txheem hauv zos ntau dua tau ua, suav nrog:
· Hloov thiab txo tag nrho-ammonium PFCS roj, xws li siv cov roj PFCs uas tsis tshua muaj tsev cog khoom los hloov cov roj uas muaj tsev cog khoom siab, xws li kev txhim kho cov txheej txheem ntws thiab txo cov PFCS roj siv hauv cov txheej txheem;
· Txhim kho kev tu ntau lub wafer rau ib leeg-wafer tu kom txo tau cov tshuaj ntxuav cov tshuaj siv hauv cov txheej txheem tu.
· Tswj txheej txheem nruj:
a. Paub txog automation ntawm cov txheej txheem tsim khoom, uas tuaj yeem paub txog kev ua tiav thiab kev tsim khoom ntau lawm, thiab txo qis kev ua yuam kev siab ntawm phau ntawv ua haujlwm;
b. Ultra-huv txheej txheem ib puag ncig yam tseem ceeb, kwv yees li 5% lossis tsawg dua ntawm cov txiaj ntsig poob yog tshwm sim los ntawm tib neeg thiab ib puag ncig. Cov txheej txheem huv huv ntawm ib puag ncig feem ntau suav nrog huab cua huv, dej purity siab, cua compressed, CO2, N2, qhov kub thiab txias, av noo, thiab lwm yam. huab cua, uas yog, particle suav concentration;
c. Txhim khu kev tshawb nrhiav, thiab xaiv cov ntsiab lus tseem ceeb uas tsim nyog rau kev kuaj xyuas ntawm cov chaw ua haujlwm nrog cov khoom pov tseg ntau thaum lub sijhawm tsim khoom.

 

Txais tos txhua tus neeg muas zaub los ntawm thoob plaws lub ntiaj teb tuaj xyuas peb rau kev sib tham ntxiv!

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Post lub sij hawm: Aug-13-2024
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