I nā makahiki i hala iho nei, ua komo kā mākou hui i nā ʻenehana holomua ma ka home a ma waho. I kēia manawa, hoʻolako kā mākou hui i kahi hui o nā loea i hoʻolaʻa i ka hoʻomohala ʻanaʻO ka uhi SiC i uhi ʻia o ka substrate Graphite no Semiconductor, ka uhi ʻana o ka silikon carbide,MOCVD Susceptor, Hoʻoikaika nui i ka hoʻopili ʻana o nā mea kūʻai aku e pale aku i nā pōʻino i ka wā o ka lawe ʻana, E nānā pono i nā manaʻo maikaʻi a me nā ʻōlelo aʻoaʻo o kā mākou mea kūʻai.
I nā makahiki i hala iho nei, ua komo kā mākou hui i nā ʻenehana holomua ma ka home a ma waho. I kēia manawa, hoʻolako kā mākou hui i kahi hui o nā loea i hoʻolaʻa i ka hoʻomohala ʻanaMOCVD Susceptor, ʻO ka uhi SiC i uhi ʻia o ka substrate Graphite no Semiconductor, ʻO ka uhi ʻana o Silicon Carbide, Ma ke ʻano he mea hana akamai e ʻae pū mākou i ke kauoha maʻamau a hiki iā mākou ke hana like me kāu kiʻi a i ʻole nā kikoʻī kikoʻī. ʻO ka pahuhopu nui o kā mākou hui e ola i kahi hoʻomanaʻo maikaʻi i nā mea kūʻai aku a pau, a hoʻokumu i kahi pilina ʻoihana lōʻihi me nā mea kūʻai aku a me nā mea hoʻohana a puni ka honua.
Loaʻa i ka uhi CVD-SiC nā hiʻohiʻona o ke ʻano like ʻole, nā mea paʻa, ke kūpaʻa wela kiʻekiʻe, ke kūpaʻa ʻana o ka oxidation, ka maʻemaʻe kiʻekiʻe, ke kūpaʻa a me ka alkali a me ka reagent, me nā waiwai kino a me nā kemika.
Ke hoʻohālikelike ʻia me nā mea graphite maʻemaʻe kiʻekiʻe, hoʻomaka ka graphite e oxidize ma 400C, ka mea e hoʻopau ai i ka pauka ma muli o ka oxidation, ka hopena i ka pollution kaiapuni i nā ʻaoʻao peripheral a me nā keʻena māmā, a hoʻonui i nā haumia o ke kaiapuni maʻemaʻe kiʻekiʻe.
Eia nō naʻe, hiki i ka uhi ʻana o SiC ke mālama i ke kūpaʻa kino a me ke kemika ma 1600 degere, hoʻohana nui ʻia i ka ʻoihana hou, ʻoi loa i ka ʻoihana semiconductor.
Hāʻawi kā mākou hui i nā lawelawe kaʻina hana hoʻoheheʻe SiC ma ke ʻano CVD ma ka ʻili o ka graphite, ceramics a me nā mea ʻē aʻe, i hiki ai i nā kinoea kūikawā i loaʻa ke kalapona a me ke silika i ke kiʻekiʻe kiʻekiʻe e loaʻa ai nā molekala SiC maʻemaʻe kiʻekiʻe. e hana ana i ka papa pale SIC. ʻO ka SIC i hoʻokumuʻia ua paʻa paʻa i ka graphite base, e hāʻawi ana i ka graphite base waiwai kūikawā, pēlā e hana ai i kaʻili o ka graphite compact, Porosity-free, kiʻekiʻe o ka mahana wela, ke kū'ēʻana a me ke kū'ēʻana.
Nā hiʻohiʻona nui:
1. Kiʻekiʻe wela oxidation kū'ē:
ʻoi aku ka maikaʻi o ka pale ʻana i ka oxidation ke kiʻekiʻe ka mahana e like me 1600 C.
2. Maʻemaʻe kiʻekiʻe: hana ʻia e ka hoʻoheheʻe ʻana i ka mahu ma lalo o ke kūlana chlorination kiʻekiʻe.
3. Erosion kū'ē: kiʻekiʻe paakiki, paʻaʻiliʻili, maikaʻi particles.
4. Ke kū'ē i ka corrosion: acid, alkali, paʻakai a me nā mea hoʻoulu.
ʻO nā kikoʻī nui o ka CVD-SIC Coatings:
SiC-CVD | ||
ʻO ka mānoanoa | (g/cc)
| 3.21 |
Ka ikaika wiliwili | (Mpa)
| 470 |
Hoʻonui wela | (10-6/K) | 4
|
ʻO ke kau wela wela | (W/mK) | 300 |
Hiki ke hoolako:
10000 ʻāpana / ʻāpana i kēlā me kēia mahina
Puke a me ka lawe ʻana:
Hoʻopili: Kūʻai maʻamau & ikaika
ʻeke poli + pahu + pahu pahu + pallet
Awa:
Ningbo/Shenzhen/Shanghai
Ka manawa o waena o ka hoʻomaka a i ka wā pau:
Nui (Nā ʻāpana) | 1 – 1000 | >1000 |
Est. Manawa(lā) | 15 | E kūkākūkā ʻia |
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