"ʻO kaʻoiaʻiʻo, ka hana hou, ka ikaika, a me ka maikaʻi" ʻo ia ka manaʻo hoʻomau o kā mākou hui no ka wā lōʻihi e hoʻomohala pū me nā mea kūʻai aku no ka launa like ʻana a me ka pōmaikaʻi like ʻole no ka Quality Inspection no China Industrial PolycrystallinePauda Daimana3-6um no Sapphire Wafer, Ua hilinaʻi mākou e hiki iā mākou ke hāʻawi i nā huahana kiʻekiʻe a me nā hoʻonā i ke kumukūʻai kumukūʻai resonable, ke kākoʻo ma hope o ke kūʻai aku i nā mea kūʻai. A e kūkulu mākou i kahi holo lōʻihi.
"ʻO kaʻoiaʻiʻo, ka hana hou, ka ikaika, a me ka maikaʻi" ʻo ia ka manaʻo mau o kā mākou hui no ka wā lōʻihi e hoʻomohala pū me nā mea kūʻai aku no ka launa like ʻana a me ka pōmaikaʻi like ʻole.ʻO Daimana Hana ʻia ʻo Kina, Pauda Daimana, Ke koi mau nei mākou i ka manaʻo hoʻokele o ka "Quality is First, Technology is Basis, Honesty and Innovation". Hiki iā mākou ke hoʻomohala mau i nā huahana hou i kahi kiʻekiʻe e hoʻokō i nā pono like ʻole o nā mea kūʻai.
Hōʻike huahana
Hāʻawi kā mākou hui i nā lawelawe kaʻina hana hoʻoheheʻe SiC ma ke ʻano CVD ma ka ʻili o ka graphite, ceramics a me nā mea ʻē aʻe, i hiki ai i nā kinoea kūikawā i loaʻa ke kalapona a me ke silika i ke kiʻekiʻe kiʻekiʻe e loaʻa ai nā molekala SiC maʻemaʻe kiʻekiʻe. e hana ana i ka papa pale SIC.
Nā hiʻohiʻona nui:
1. Kiʻekiʻe wela oxidation kū'ē:
ʻoi aku ka maikaʻi o ka pale ʻana i ka oxidation ke kiʻekiʻe ka mahana e like me 1600 C.
2. Maʻemaʻe kiʻekiʻe: hana ʻia e ka hoʻoheheʻe ʻana i ka mahu ma lalo o ke kūlana chlorination kiʻekiʻe.
3. Erosion kū'ē: kiʻekiʻe paakiki, paʻaʻiliʻili, maikaʻi particles.
4. Ke kū'ē i ka corrosion: acid, alkali, paʻakai a me nā mea hoʻoulu.
Nā kiko'ī nui o ka CVD-SIC Coating
Nā Waiwai SiC-CVD | ||
Hoʻokumu Crystal | Māhele FCC β | |
ʻO ka mānoanoa | g/cm ³ | 3.21 |
ʻoʻoleʻa | ʻO ka paʻakikī o Vickers | 2500 |
Ka nui o ka palaoa | μm | 2~10 |
Maemae Kemika | % | 99.99995 |
Kaha Wela | J·kg-1 ·K-1 | 640 |
Mahana Sublimation | ℃ | 2700 |
Ikaika Felexural | MPa (RT 4-point) | 415 |
ʻO Young's Modulus | Gpa (4pt piko, 1300 ℃) | 430 |
Hoʻonui wela (CTE) | 10-6K-1 | 4.5 |
ʻO ke kau wela wela | (W/mK) | 300 |