Pono ka hana ʻana o kēlā me kēia huahana semiconductor i nā haneli haneli. Māhele mākou i ke kaʻina hana holoʻokoʻa i ʻewalu mau ʻanuʻu:waferka hana-oxidation-photolithography-etching-thin film deposition-epitaxial growth-diffusion-ion implantation.
No ke kōkua ʻana iā ʻoe e hoʻomaopopo a ʻike i nā semiconductor a me nā kaʻina hana e pili ana, e paipai mākou i nā ʻatikala WeChat i kēlā me kēia pukana e hoʻolauna i kēlā me kēia pae i luna.
Ma ka ʻatikala mua, ua ʻōlelo ʻia i mea e pale ai i kawafermai nā mea haumia like ʻole, ua hana ʻia kahi kiʻiʻoniʻoni oxide--oxidation kaʻina. I kēia lā, e kūkākūkā mākou i ka "photolithography process" o ke kiʻi ʻana i ke kaʻapuni hoʻolālā semiconductor ma ka wafer me ke kiʻi oxide i hana ʻia.
Kaʻina hana kiʻi kiʻi
1. He aha ke kaʻina hana photolithography
ʻO Photolithography ka hana ʻana i nā kaapuni a me nā wahi hana e pono ai no ka hana chip.
Hoʻohana ʻia ke kukui i hoʻokuʻu ʻia e ka mīkini photolithography e hōʻike i ke kiʻi ʻoniʻoni lahilahi i uhi ʻia me ka photoresist ma o ka mask me kahi kumu. E hoʻololi ka photoresist i kona mau waiwai ma hope o ka ʻike ʻana i ke kukui, i kope ʻia ke kumu ma luna o ka mask i ke kiʻi ʻoniʻoni ʻoniʻoni, i loaʻa i ke kiʻi lahilahi ka hana o kahi kiʻi kaapuni uila. ʻO kēia ke kuleana o ka photolithography, e like me ke kiʻi ʻana me ke kāmela. Paʻi ʻia nā kiʻi i paʻi ʻia e ka pahupaʻikiʻi ma ke kiʻiʻoniʻoni, ʻoiai ʻaʻole i kahakaha ka photolithography i nā kiʻi, akā nā kiʻi kaapuni a me nā mea uila ʻē aʻe.
ʻO Photolithography kahi ʻenehana micro-machining pololei
ʻO ka photolithography maʻamau kahi hana e hoʻohana ai i ke kukui ultraviolet me ka lōʻihi o ka nalu o 2000 a 4500 angstroms ma ke ʻano he mea lawe ʻike kiʻi, a hoʻohana i ka photoresist e like me ke kikowaena waena (hoʻopaʻa kiʻi) e hoʻokō i ka hoʻololi, hoʻololi a me ka hoʻoili ʻana i nā kiʻi, a hope loa e hoʻouna i ke kiʻi. ʻike i ka chip (ma ka nui o ka chip silicon) a i ʻole ka papa dielectric.
Hiki ke ʻōlelo ʻia ʻo ka photolithography ke kumu o ka semiconductor hou, microelectronics, a me nā ʻenehana ʻike, a ʻo ka photolithography e hoʻoholo pololei i ka pae hoʻomohala o kēia mau ʻenehana.
I loko o nā makahiki he 60 a ʻoi aku ka maikaʻi o ka hoʻomohala ʻana o nā kaapuni i hoʻohui ʻia i ka makahiki 1959, ua hoʻemi ʻia ka laulā laina o kāna mau kiʻi ma kahi o ʻehā mau kauoha o ka nui, a ua hoʻomaikaʻi ʻia ka hoʻohui kaapuni ma mua o ʻeono mau kauoha o ka nui. ʻO ka holomua wikiwiki o kēia mau ʻenehana ke kumu nui i ka hoʻomohala ʻana i ka photolithography.
(Nā koi no ka ʻenehana photolithography i nā pae like ʻole o ka hoʻomohala ʻana o ka hana kaapuni hoʻohuihui)
2. Nā loina kumu o ka photolithography
ʻO nā mea paʻi kiʻi kiʻi e pili ana i nā photoresists, i ʻike ʻia he photoresists, ʻo ia nā mea hana koʻikoʻi loa i ka photolithography. Loaʻa i kēia ʻano mea nā hiʻohiʻona o ka māmā (me ke kukui ʻike ʻia, ke kukui ultraviolet, ka uila electron, a me nā mea ʻē aʻe). Ma hope o ka hopena photochemical, loli nui kona solubility.
Ma waena o lākou, hoʻonui ka solubility o ka photoresist maikaʻi i ka mea hoʻomohala, a ʻo ke kumu i loaʻa e like me ka mask; ʻO ka photoresist maikaʻi ʻole ka mea ʻē aʻe, ʻo ia hoʻi, e emi ana ka solubility a i ʻole e lilo i insoluble ma hope o ka ʻike ʻia ʻana i ka mea hoʻomohala, a ʻo ke kumu i loaʻa ke kūʻē i ka mask. ʻOkoʻa nā kahua noi o nā ʻano photoresists ʻelua. Hoʻohana pinepine ʻia nā photoresists maikaʻi, ʻoi aku ma mua o 80% o ka huina.
ʻO ka mea i luna nei he kiʻi schematic o ke kaʻina photolithography
(1) Hoʻopili:
ʻO ia hoʻi, ka hana ʻana i kahi kiʻi photoresist me ka mānoanoa like ʻole, ka hoʻopili ikaika a ʻaʻohe hemahema ma ka wafer silicon. I mea e hoʻonui ai i ka hoʻopili ʻana ma waena o ke kiʻi photoresist a me ka wafer silicon, pono pinepine e hoʻololi mua i ka ʻili o ka wafer silicon me nā mea e like me hexamethyldisilazane (HMDS) a me trimethylsilyldiethylamine (TMSDEA). A laila, hoʻomākaukau ʻia ke kiʻi photoresist e ka wili wili.
(2) Kaʻai mua ʻana:
Ma hope o ka wili ʻana, loaʻa i ka kiʻi photoresist kekahi nui o ka solvent. Ma hope o ka kuke ʻana i kahi mahana kiʻekiʻe, hiki ke hoʻoneʻe ʻia ka mea hoʻoheheʻe me ka liʻiliʻi. Ma hope o ka kuke ʻana, hoʻemi ʻia ka ʻike o ka photoresist ma kahi o 5%.
(3) Hōʻike:
ʻO ia hoʻi, ʻike ʻia ka photoresist i ka mālamalama. I kēia manawa, hiki mai kahi photoreaction, a ʻo ka ʻokoʻa solubility ma waena o ka ʻāpana i hoʻomālamalama ʻia a me ka ʻāpana i hoʻomālamalama ʻole ʻia.
(4) Hoʻomohala a paʻakikī:
Hoʻokomo ʻia ka huahana i ka mea hoʻomohala. I kēia manawa, e hoʻoheheʻe ʻia ka wahi i hōʻike ʻia o ka photoresist maikaʻi a me ka wahi i ʻike ʻole ʻia o ka photoresist maikaʻi ʻole i ka hoʻomohala ʻana. Hōʻike kēia i kahi hiʻohiʻona ʻekolu. Ma hope o ka hoʻomohala ʻana, pono ka chip i kahi kaʻina hana lapaʻau kiʻekiʻe e lilo i kiʻi ʻoniʻoni paʻakikī, ka mea nui e hoʻomaikaʻi hou i ka pili ʻana o ka photoresist i ka substrate.
(5) Ke kalai ana:
Hoʻopili ʻia ka mea ma lalo o ka photoresist. Loaʻa iā ia ka etching wai wai a me ka etching maloʻo kinoea. No ka laʻana, no ka etching pulu o ke silika, hoʻohana ʻia kahi waiʻawaʻawa aqueous solution o hydrofluoric acid; no ka etching pulu o ke keleawe, hoʻohana ʻia kahi hopena waika ikaika e like me ka waikawa nitric a me ka waikawa sulfuric, ʻoiai e hoʻohana pinepine ka etching maloʻo i ka plasma a i ʻole nā kukui iona kiʻekiʻe e hoʻopōʻino i ka ʻili o ka mea a etch.
(6) Hoʻoheheʻe ʻia:
ʻO ka hope, pono e wehe ʻia ka photoresist mai ka ʻili o ka lens. Kapa ʻia kēia hana degumming.
ʻO ka palekana ka mea nui loa i nā hana semiconductor āpau. ʻO nā kinoea photolithography pōʻino nui i loko o ke kaʻina hana lithography chip penei:
1. Hydrogen peroxide
ʻO ka hydrogen peroxide (H2O2) he mea hoʻomake ikaika. Hiki ke hoʻopili pololei i ka ʻili a me ka maka a me ke kuni.
2. Xylene
ʻO Xylene kahi mea hoʻoheheʻe a hoʻomohala i hoʻohana ʻia i ka lithography maikaʻi ʻole. Hiki ke wela a he haʻahaʻa haʻahaʻa he 27.3 ℃ wale nō (kokoke i ka lumi wela). He pahū ia i ka wā o ka hoʻopaʻa ʻana i ka lewa he 1% -7%. Hiki i ka hoʻopili pinepine ʻana me ka xylene ke hoʻomake i ka ʻili. He mea ʻono ka xylene vapor, e like me ke ʻala o ka pahu mokulele; ʻO ka hoʻolaha ʻana i ka xylene hiki ke hōʻeha i ka maka, ka ihu a me ka ʻāʻī. ʻO ka inhalation o ke kinoea hiki ke hōʻeha i ke poʻo, ka noʻonoʻo, pau ka ʻai a me ka luhi.
3. Hexamethyldisilazane (HMDS)
ʻO ka Hexamethyldisilazane (HMDS) ka mea maʻamau i hoʻohana ʻia ma ke ʻano he papa mua e hoʻonui ai i ka pili ʻana o ka photoresist ma ka ʻili o ka huahana. Hiki ke wela a he 6.7°C ke kiko uila. He mea pahū ia i ka wā e 0.8% -16% ka hoʻopaʻa ʻana i ka lewa. Hoʻoikaika ikaika ka HMDS me ka wai, ka waiʻona a me nā ʻakika mineral e hoʻokuʻu i ka amonia.
4. Tetramethylammonium hydroxide
Hoʻohana nui ʻia ka Tetramethylammonium hydroxide (TMAH) ma ke ʻano he mea hoʻomohala no ka lithography maikaʻi. He mea ʻawaʻawa a ʻino. Hiki ke make ke ale ʻia a i ʻole pili pono i ka ʻili. Hiki ke hoʻopā ka maka, ka ʻili, ka ihu a me ka ʻāʻī i ka pili ʻana me ka lepo TMAH a i ʻole ka noe. ʻO ka inhalation o ka nui o ka TMAH e alakaʻi i ka make.
5. Klorine a me ka fluorine
Hoʻohana ʻia ʻo Chlorine (Cl2) a me fluorine (F2) i nā laser excimer e like me nā kumu kukui ultraviolet hohonu a me nā kumu kukui ultraviolet (EUV). He mea ʻawaʻawa nā kinoea ʻelua, ʻikea ʻōmaʻomaʻo ʻōmaʻomaʻo, a he ʻala hoʻonāukiuki ikaika. ʻO ka inhalation o ka nui o kēia kinoea e alakaʻi i ka make. Hiki ke hana ke kinoea Fluorine me ka wai e hana i ke kinoea hydrogen fluoride. He ʻakika ikaika ka hydrogen fluoride e hoʻonāukiuki i ka ʻili, nā maka a me ka ʻōpū hanu a hiki ke hōʻeha i nā hōʻailona e like me ke kuni a me ka pilikia o ka hanu. Hiki i ke kiʻekiʻe o ka fluoride ke hoʻomake i ke kino o ke kanaka, e hōʻike ana i nā hōʻailona e like me ke poʻo, ka luaʻi ʻana, ka ʻōpū, a me ka coma.
6. ʻArekona
ʻO Argon (Ar) kahi kinoea inert ʻaʻole i hoʻopilikia pololei i ke kino o ke kanaka. Ma lalo o nā kūlana maʻamau, ʻo ka ea e hanu ai ka poʻe e loaʻa ana ma kahi o 0.93% argon, a ʻaʻohe hopena o kēia ʻike i ke kino o ke kanaka. Eia nō naʻe, i kekahi mau hihia, hiki i ka argon ke hōʻeha i ke kino o ke kanaka.
Eia kekahi mau mea hiki: I loko o kahi wahi paʻa, hiki ke hoʻonui ʻia ka neʻe ʻana o ka argon, ma laila e hoʻemi ai i ka neʻe ʻana o ka oxygen i ka lewa a me ka hypoxia. Hiki paha kēia i nā hōʻailona e like me ka noʻonoʻo, ka luhi, a me ka pōkole o ka hanu. Eia kekahi, he kinoea inert ka argon, akā hiki ke pahū ma lalo o ka wela kiʻekiʻe a i ʻole ke kaomi kiʻekiʻe.
7. Neon
ʻO Neon (Ne) he kinoea paʻa, kala ʻole a ʻala ʻole i komo ʻAʻole komo ke kinoea neon i ke kaʻina hanu kanaka, no laila, ʻo ka hanu ʻana i kahi kiʻekiʻe o ke kinoea neon e hoʻoulu ai i ka hypoxia. Inā lōʻihi kou noho ʻana i ka hypoxia, hiki iā ʻoe ke ʻike i nā hōʻailona e like me ke poʻo, nausea, a me ka luaʻi. Eia hou, hiki ke hana ke kinoea neon me nā mea ʻē aʻe ma lalo o ka wela kiʻekiʻe a i ʻole ke kaomi kiʻekiʻe e kumu ai ke ahi a pahū paha.
8. Xenon kinoea
ʻO ke kinoea Xenon (Xe) he kinoea paʻa, kala ʻole a ʻala ʻole i komo ʻole i ke kaʻina hana hanu kanaka, no laila, ʻo ka hanu ʻana i kahi kiʻekiʻe o ke kinoea xenon e hopena i ka hypoxia. Inā lōʻihi kou noho ʻana i ka hypoxia, hiki iā ʻoe ke ʻike i nā hōʻailona e like me ke poʻo, nausea, a me ka luaʻi. Eia hou, hiki ke hana ke kinoea neon me nā mea ʻē aʻe ma lalo o ka wela kiʻekiʻe a i ʻole ke kaomi kiʻekiʻe e kumu ai ke ahi a pahū paha.
9. Krypton kinoea
ʻO ke kinoea Krypton (Kr) he kinoea paʻa, kala ʻole a ʻala ʻole i komo ʻole i ke kaʻina hana hanu kanaka, no laila ʻo ka hanu ʻana i kahi kiʻekiʻe o ke kinoea krypton e hoʻoulu ai i ka hypoxia. Inā lōʻihi kou noho ʻana i ka hypoxia, hiki iā ʻoe ke ʻike i nā hōʻailona e like me ke poʻo, nausea, a me ka luaʻi. Eia hou, hiki i ke kinoea xenon ke hana me nā mea ʻē aʻe ma lalo o ka wela kiʻekiʻe a i ʻole ke kaomi kiʻekiʻe e hoʻoulu ai i ke ahi a pahū paha. ʻO ka hanu ʻana i kahi kaiapuni me ka nele o ka oxygen hiki ke hoʻoulu i ka hypoxia. Inā lōʻihi kou noho ʻana i ka hypoxia, hiki iā ʻoe ke ʻike i nā hōʻailona e like me ke poʻo, nausea, a me ka luaʻi. Eia kekahi, hiki ke hana ke kinoea krypton me nā mea ʻē aʻe ma lalo o ka wela kiʻekiʻe a i ʻole ke kaomi kiʻekiʻe e kumu ai ke ahi a pahū paha.
Hazardous gas detection solutions for the semiconductor industry
ʻO ka ʻoihana semiconductor e pili ana i ka hana ʻana, hana ʻana, a me ke kaʻina hana o nā kinoea lapalapa, pahū, ʻona, a me nā kinoea ʻino. Ma ke ʻano he mea hoʻohana i nā kinoea i nā mea kanu semiconductor, pono kēlā me kēia limahana e hoʻomaopopo i ka ʻikepili palekana o nā kinoea pōʻino like ʻole ma mua o ka hoʻohana ʻana, a pono e ʻike pehea e hana ai i nā kaʻina hana ulia pōpilikia i ka wā e kahe ai kēia mau kinoea.
I ka hana ʻana, hana ʻana, a me ka mālama ʻana i ka ʻoihana semiconductor, i mea e pale aku ai i ka nalowale o ke ola a me ka waiwai i hoʻokumu ʻia e ka leakage o kēia mau kinoea weliweli, pono ia e hoʻokomo i nā mea ʻike kinoea e ʻike ai i ke kinoea.
Ua lilo nā mea ʻike kinoea i mau mea nānā kaiapuni koʻikoʻi i ka ʻoihana semiconductor o kēia lā, a ʻo ia hoʻi nā mea hana nānā pono loa.
Ua nānā mau ʻo Riken Keiki i ka hoʻomohala palekana o ka ʻoihana hana semiconductor, me ka misionari o ka hoʻokumu ʻana i kahi wahi hana palekana no ka poʻe, a ua hoʻolaʻa iā ia iho i ka hoʻomohala ʻana i nā mea ʻike kinoea kūpono no ka ʻoihana semiconductor, e hāʻawi ana i nā hopena kūpono no nā pilikia like ʻole i loaʻa iā ia. nā mea hoʻohana, a me ka hoʻomaikaʻi mau ʻana i nā hana huahana a me ka hoʻonui ʻana i nā ʻōnaehana.
Ka manawa hoʻouna: Iulai-16-2024