Noʻonoʻo mau a hoʻomaʻamaʻa mākou e like me ka loli o ke kūlana, a ulu aʻe. Manaʻo mākou i ka loaʻa ʻana o ka noʻonoʻo a me ke kino me ka mea ola no 2019 Good Quality China Plasma Enhanced CVD (PECVD) Graphene Machine With13.56 MHz RF, Hoʻokipa mau mākou i nā mea kūʻai hou a ʻelemakule e hāʻawi iā mākou i ka ʻike waiwai a me nā noi no ka hui pū ʻana. , e hoʻomohala a hoʻokumu pū kekahi i kekahi, a e alakaʻi pū i ko mākou kaiāulu a me nā limahana!
Noʻonoʻo mau a hoʻomaʻamaʻa mākou e like me ka loli o ke kūlana, a ulu aʻe. Manaʻo mākou i ka loaʻa ʻana o ka noʻonoʻo a me ke kino ʻoi aku ka maikaʻi me ke ola noHoʻonui ʻia ʻo Kina Plasma i ka hoʻopaʻa ʻana i ka mahu, Pecvd, Pela makou e hana mau ai. mākou, e kālele ana i ke kūlana kiʻekiʻe, a ʻike i ke koʻikoʻi o ka mālama ʻana i ke kaiapuni, ʻo ka hapa nui o nā mea kūʻai he pollution-free, ʻoluʻolu kaiapuni, hoʻohana hou i ka hopena. Ua hōʻano hou mākou i kā mākou papa inoa, e hōʻike ana i kā mākou hui. n kiko'ī a uhi i nā huahana mua a mākou e hāʻawi nei i kēia manawa, hiki iā ʻoe ke kipa i kā mākou pūnaewele pūnaewele, e pili ana i kā mākou laina huahana hou loa. Manaʻo mākou e hoʻāla hou i kā mākou hui hui.
ʻO ka uhi SiC o ka substrate Graphite no nā noi Semiconductor e hana i kahi ʻāpana me ka maʻemaʻe maikaʻi a me ke kū'ē i ka lewa oxidizing.
Hoʻohana ʻia ʻo CVD SiC a i ʻole CVI SiC i ka Graphite o nā ʻāpana hoʻolālā maʻalahi a paʻakikī paha. Hiki ke hoʻopili ʻia ka uhi ʻana i nā mānoanoa like ʻole a i nā ʻāpana nui loa.
Nā hiʻohiʻona:
· ʻOi loa ka Thermal Shock Resistance
· Kūleʻa haʻalulu kino maikaʻi
· Kūʻē Kemika maikaʻi loa
· Maʻemaʻe Kiʻekiʻe
· Loaʻa ma ke ʻano paʻakikī
· Hoʻohana ma lalo o ka Oxidizing Atmosphere
Nā ʻano maʻamau o ka Material Graphite Base:
ʻIke ʻia ka mānoanoa: | 1.85 g/cm3 |
Ke kū'ē uila: | 11 μΩm |
ʻO ke koʻikoʻi ʻoluʻolu: | 49 MPa (500kgf/cm2) |
Paʻa Paʻa: | 58 |
lehu: | <5ppm |
ʻO ka wela wela: | 116 W/mK (100 kcal/mhr- ℃) |
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