UmkhiqizoDukubhaliswa
I-Silicon carbide Wafer Boat isetshenziswa kabanzi njengesibambi se-wafer kwinqubo yokusabalalisa izinga lokushisa eliphezulu.
Izinzuzo:
Ukumelana nezinga lokushisa eliphezulu:ukusetshenziswa okuvamile ku-1800 ℃
High conductivity ezishisayo:elilingana ne-graphite material
Ukuqina okuphezulu:ubulukhuni okwesibili ngemuva kwedayimane, i-boron nitride
Ukumelana nokugqwala:i-asidi eqinile ne-alkali ayinayo ukugqwala kuyo, ukumelana nokugqwala kungcono kune-tungsten carbide ne-alumina.
Isisindo esincane:ukuminyana okuphansi, eduze ne-aluminium
Akukho deformation: i-coefficient ephansi yokwandisa okushisayo
Ukumelana nokushaqeka okushisayo:ingamelana nokushintsha kwezinga lokushisa okubukhali, imelane nokushaqeka kokushisa, futhi ibe nokusebenza okuzinzile
Izakhiwo Zomzimba ze-SiC
Impahla | Inani | Indlela |
Ukuminyana | 3.21 g/cc | Sink-float kanye nobukhulu |
Ukushisa okuqondile | 0.66 J/g °K | I-Pulsed laser flash |
Amandla e-Flexural | 450 MPa560 MPa | 4 iphuzu ukugoba, RT4 iphuzu ukugoba, 1300° |
Ukuqina kokuphuka | 2.94 MPa m1/2 | I-Microindentation |
Ukuqina | 2800 | Vicker, 500g umthwalo |
I-Elastic ModulusYoung's Modulus | 450 GPA430 GPA | 4 pt ukugoba, RT4 pt ukugoba, 1300 °C |
Usayizi wokusanhlamvu | 2 - 10 µm | I-SEM |
Izakhiwo ezishisayo ze-SiC
I-Thermal Conductivity | 250 W/m °K | Indlela ye-Laser flash, RT |
I-Thermal Expansion (CTE) | 4.5 x 10-6 °K | Izinga lokushisa legumbi liye ku-950 °C, i-silica dilatometer |