SiC enamathela graphite MOCVD Wafer abathwali, Graphite Susceptors forI-SiC Epitaxy,
Ikhabhoni ihlinzeka ngama-susceptors, I-graphite epitaxy susceptors, Ama-substrates asekela i-graphite, I-MOCVD Susceptor, I-SiC Epitaxy, I-Wafer Susceptors,
Izinzuzo ezikhethekile ze-SiC-coated graphite susceptors zihlanganisa ukuhlanzeka okuphezulu kakhulu, ukunamathela okufana nempilo yesevisi enhle kakhulu. Futhi banokuphikiswa okuphezulu kwamakhemikhali kanye nezakhiwo zokuzinza kokushisa.
Ukufakwa kwe-SiC ye-Graphite substrate yezinhlelo zokusebenza ze-Semiconductor kukhiqiza ingxenye enobumsulwa obuphakeme kanye nokumelana nomoya we-oxidizing.
I-CVD SiC noma i-CVI SiC isetshenziswa kuGraphite yezingxenye zokuklama ezilula noma eziyinkimbinkimbi. Ukumboza kungasetshenziswa ngobukhulu obuhlukahlukene kanye nezingxenye ezinkulu kakhulu.
Izici:
· I-Thermal Shock Resistance enhle kakhulu
· Ukumelana Nokushaqeka Okuhle Kakhulu Komzimba
· Excellent Chemical Resistance
· Super High Purity
· Ukutholakala kokuthi I-Complex Shape
· Isebenziseka ngaphansi kwe-Oxidizing Atmosphere
Isicelo:
Izici Ezijwayelekile Ze-Base Graphite Material:
Ukuminyana Okubonakalayo: | 1.85 g/cm3 |
Ukungazweli Kagesi: | 11 μΩm |
I-Flexural Strenth: | 49 MPa (500kgf/cm2) |
Ukuqina Kwasogwini: | 58 |
Umlotha: | <5ppm |
I-Thermal Conductivity: | 116 W/mK (100 kcal/mhr-℃) |
Ikhabhoni ihlinzeka ngama-susceptorskanye nezingxenye ze-graphite zawo wonke ama-epitaxy reactor amanje. Iphothifoliyo yethu ihlanganisa izinto zokususa imigqomo zamayunithi afakiwe kanye ne-LPE, okokufaka amapancake e-LPE, i-CSD, kanye namayunithi e-Gemini, kanye nama-wafer-wafer eyodwa amayunithi asetshenziswayo kanye ne-ASM. inikeza idizayini efanele yohlelo lwakho lokusebenza.