Silicon Carbide (SiC) Epitaxial Wafer

Sharaxaad Gaaban:

Silicon Carbide (SiC) Epitaxial Wafer ka VET Energy waa substrate wax qabad sare leh oo loogu talagalay in lagu buuxiyo shuruudaha baahida jiilka soo socda iyo aaladaha RF. Tamarta VET waxay hubisaa in wafer kasta oo epitaxial ah si taxadar leh loo soo saaro si loo bixiyo kulaylka sareeyo, korantada burbursan, iyo dhaqdhaqaaqa side, taasoo ka dhigaysa mid ku habboon codsiyada sida gawaarida korontada, isgaarsiinta 5G, iyo elektiroonigga waxtarka sare leh.


Faahfaahinta Alaabta

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VET Energy Silicon carbide (SiC) wafer epitaxial waa wax qabad heersare ah oo wax qabad balaadhan leh semiconductor bandgap ballaaran leh iska caabin heerkul sare oo heersare ah, soo noqnoqosho sare iyo astaamo awood sare leh. Waa substrate ku habboon jiilka cusub ee aaladaha elektiroonigga ah. Tamarta VET waxay isticmaashaa tignoolajiyada sare ee MOCVD epitaxial si ay ugu koraan lakabyada SiC epitaxial tayo sare leh ee substrates SiC, hubinta waxqabadka wanaagsan iyo joogtaynta waferka.

Silicon Carbide (SiC) Waferka Epitaxial wuxuu bixiyaa iswaafajin heersare ah oo leh agabka kala duwan ee semiconductor oo ay ku jiraan Si Wafer, Substrate SiC, SOI Wafer, iyo SiN Substrate. Iyada oo lakabkeeda epitaxial adag, waxay taageertaa hababka horumarsan sida kobaca Epi Wafer iyo is dhexgalka qalabka sida Gallium Oxide Ga2O3 iyo AlN Wafer, hubinta isticmaalka la taaban karo ee tiknoolajiyada kala duwan. Loogu talagalay inay la jaanqaadaan hababka maaraynta cajaladaha heerka warshadaha, waxay xaqiijisaa hawl-qabad hufan oo la hagaajiyay ee deegaan-soo-saarka semiconductor.

Khadka wax soo saarka VET Energy kuma koobna waferrada SiC epitaxial. Waxaan sidoo kale bixinnaa agabyo kala duwan oo ah substrate-ka, oo ay ku jiraan Si Wafer, Substrate SiC, SOI Wafer, SiN Substrate, Epi Wafer, iwm. Wafer, si loo daboolo baahida warshadaha elektiroonigga mustaqbalka ee aaladaha waxqabadka sare.

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QEEXIDDA WAFERING

*n-Pm=n-nooca Pm-Grade,n-Ps=n-nooca Ps-Grade,Sl=Semi-lnsulating

Shayga

8-inch

6-inch

4-inji

nP

n-Pm

n-Ps

SI

SI

TTV(GBIR)

≤6um

≤6um

Qaanso(GF3YFCD) -Qiimaha saxda ah

≤15μm

≤15μm

≤25μm

≤15μm

Warp(GF3YFER)

≤25μm

≤25μm

≤40μm

≤25μm

LTV(SBIR)-10mmx10mm

<2μm

Wafer Edge

Beveling

DHULKA DHAMMAAN

*n-Pm=n-nooca Pm-Grade,n-Ps=n-nooca Ps-Grade,Sl=Semi-lnsulating

Shayga

8-inch

6-inch

4-inji

nP

n-Pm

n-Ps

SI

SI

Dhamaystir dusha sare

Polish indhaha laba-geesoodka ah,Si- Waji CMP

Dusha sareynta

(10um x 10um) Si-FaceRa≤0.2nm
C-Waji Ra≤ 0.5nm

(5umx5um) Si-Face Ra≤0.2nm
C-Face Ra≤0.5nm

Chips Edge

Midna Lama ogola (dhererka iyo ballaca≥0.5mm)

Indents

Midna lama ogola

xoqid (Si-Waji)

Qty.≤5, Wadar ah
Dhererka≤0.5× dhexroorka wafer

Qty.≤5, Wadar ah
Dhererka≤0.5× dhexroorka wafer

Qty.≤5, Wadar ah
Dhererka≤0.5× dhexroorka wafer

dildilaaca

Midna lama ogola

Ka saarida gees

3mm

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