PECVD Graphite Wafer Support

Short Description:

Designed for precision and performance, VET Energy’s Graphite Wafer Support is the ideal material for use in advanced wafer processing, where high thermal stability and consistent performance are critical. Whether you are working with semiconductor wafers or other delicate substrates, this high-quality graphite support will enhance your process reliability and product quality, making it an indispensable component for modern manufacturing.

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VET Energy PECVD process graphite wafer support is a core consumable designed for PECVD (plasma enhanced chemical vapor deposition) process. This product is made of high-purity, high-density graphite material, with excellent high temperature resistance, corrosion resistance, dimensional stability and other characteristics, can provide a stable support platform for PECVD process, to ensure the uniformity and flatness of film deposition.

The "graphite support" design of VET Energy graphite wafer support can not only effectively support the wafer, but also provide thermal stability in the high temperature and high pressure PECVD environment to ensure the stability of the process.

VET Energy PECVD process graphite wafer support has the following characteristics:

▪ High purity: extremely low impurity content, avoid contamination of the film, to ensure the quality of the film.

▪ High density: high density, high mechanical strength, can withstand high temperature and high pressure PECVD environment.

▪ Good dimensional stability: small dimensional changes at high temperature to ensure the stability of the process.

▪ Excellent thermal conductivity: effectively transfer heat to prevent wafer overheating.

▪ Strong corrosion resistance: Able to resist erosion by various corrosive gases and plasma.

▪ Customized service: Graphite support tables of different sizes and shapes can be customized according to customer needs.

Graphite material from SGL:

Typical parameter: R6510
Index	Test standard	Value	Unit
Average grain size	ISO 13320	10	μm
Bulk density	DIN IEC 60413/204	1.83	g/cm³
Open porosity	DIN66133	10	%
Medium pore size	DIN66133	1.8	μm
Permeability	DIN 51935	0.06	cm²/s
Rockwell hardness HR5/100	DIN IEC60413/303	90	HR
Specific electrical resistivity	DIN IEC 60413/402	13	μΩm
Flexural strength	DIN IEC 60413/501	60	MPa
Compressive strength	DIN 51910	130	MPa
Young's modulus	DIN 51915	11.5×10³	MPa
Thermal expansion(20-200℃)	DIN 51909	4.2X10^-6	K^-1
Thermal conductivity (20℃)	DIN 51908	105	Wm^-1K^-1

It is specifically designed for high-efficiency solar cell manufacturing, supporting G12 large-size wafer processing. Optimized carrier design significantly increases throughput, enabling higher yield rates and lower production costs.

Item	Type	Number wafer carrier
PEVCD Grephite boat - The 156 series	156-13 grephite boat	144
	156-19 grephite boat	216
	156-21 grephite boat	240
	156-23 graphite boat	308
PEVCD Grephite boat - The 125 series	125-15 grephite boat	196
	125-19 grephite boat	252
	125-21 grphite boat	280