As shown above, is a typical
The first half:
Heating Element (heating coil) : located around the furnace tube, usually made of resistance wires, used to heat the inside of the furnace tube.
Quartz Tube: The core of a hot oxidation furnace, made of high-purity quartz that can withstand high temperatures and remain chemically inert.
Gas Feed: Located at the upper or side of the furnace tube, it is used to transport oxygen or other gases to the inside of the furnace tube.
SS Flange: components that connect quartz tubes and gas lines, ensuring the tightness and stability of the connection.
Gas Feed Lines: Pipes that connect the MFC to the gas supply port for gas transmission.
MFC (Mass Flow Controller) : A device that controls the flow of gas inside a quartz tube to precisely regulate the amount of gas required.
Vent: Used to vent the exhaust gas from inside the furnace tube to the outside of the equipment.
Lower part
Silicon Wafers in Holder: Silicon wafers are housed in a special Holder to ensure uniform heat during oxidation.
Wafer Holder: Used to hold the silicon wafer and ensure that the silicon wafer remains stable during the process.
Pedestal: A structure that holds a silicon wafer Holder, usually made of a high temperature resistant material.
Elevator: Used to lift Wafer holders into and out of quartz tubes for automatic loading and unloading of silicon wafers.
Wafer Transfer Robot: located on the side of the furnace tube device, it is used to automatically remove the silicon wafer from the box and place it in the furnace tube, or remove it after processing.
Cassette Storage Carousel: Cassette storage carousel is used to store a box containing silicon wafers and can be rotated for robot access.
Wafer Cassette: wafer cassette is used to store and transfer the silicon wafers to be processed.
Post time: Apr-22-2024