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Application of silicon carbide ceramics in the semiconductor field
by admin on 24-10-10
The preferred material for precision parts of photolithography machines In the semiconductor field, silicon carbide ceramic materials are mainly used in key equipment for integrated circuit manufacturing, such as silicon carbide worktable, guide rails, reflectors, ceramic suction chuck, arms, g...
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0What are the six systems of a single crystal furnace
by admin on 24-09-23
A single crystal furnace is a device that uses a graphite heater to melt polycrystalline silicon materials in an inert gas (argon) environment and uses the Czochralski method to grow non-dislocated single crystals. It is mainly composed of the following systems: Mechanical...
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Why do we need graphite in the thermal field of single crystal furnace
by admin on 24-09-23
The thermal system of the vertical single crystal furnace is also called the thermal field. The function of the graphite thermal field system refers to the entire system for melting silicon materials and keeping the single crystal growth at a certain temperature. Simply put, it is a complete grap...
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Several types of processes for power semiconductor wafer cutting
by admin on 24-09-20
Wafer cutting is one of the important links in power semiconductor production. This step is designed to accurately separate individual integrated circuits or chips from semiconductor wafers. The key to wafer cutting is to be able to separate individual chips while ensuring that the delicate struc...
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BCD process
by admin on 24-09-18
What is BCD process? BCD process is a single-chip integrated process technology first introduced by ST in 1986. This technology can make bipolar, CMOS and DMOS devices on the same chip. Its appearance greatly reduces the area of the chip. It can be said that the BCD process fully utilizes the...
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BJT, CMOS, DMOS and other semiconductor process technologies
by admin on 24-09-10
Welcome to our website for product information and consultation. Our website: https://www.vet-china.com/ As semiconductor manufacturing processes continue to make breakthroughs, a famous statement called "Moore's Law" has been circulating in the industry. It was p...
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Semiconductor patterning process flow-etching
by admin on 24-09-10
Early wet etching promoted the development of cleaning or ashing processes. Today, dry etching using plasma has become the mainstream etching process. Plasma consists of electrons, cations and radicals. The energy applied to the plasma causes the outermost electrons of t...
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Research on 8-inch SiC epitaxial furnace and homoepitaxial process-Ⅱ
by admin on 24-09-04
2 Experimental results and discussion 2.1 Epitaxial layer thickness and uniformity Epitaxial layer thickness, doping concentration and uniformity are one of the core indicators for judging the quality of epitaxial wafers. Accurately controllable thickness, doping co...
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Research on 8-inch SiC epitaxial furnace and homoepitaxial process-Ⅰ
by admin on 24-09-04
Currently, the SiC industry is transforming from 150 mm (6 inches) to 200 mm (8 inches). In order to meet the urgent demand for large-size, high-quality SiC homoepitaxial wafers in the industry, 150mm and 200mm 4H-SiC homoepitaxial wafers were successfully prepared on do...
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