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Basis communiter usus est ad tempus vapor epitaxy
by admin on 24-07-30
In processu vapori epitaxy (VPE) periodo, munus basis est subiectum sustentare et calefacere uniformem in processu incrementi. Variae bases genera sunt aptae diversis conditionibus incrementis et systematibus materialibus. Aliquam non est.
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Quomodo vita tantalum carbide lita products prorogare potest?
by admin on 24-07-26
Tantalum carbide productorum obductis sunt communiter materia summus temperatus, propria temperatura resistentia, resistentia corrosio, resistentia gerunt, etc. Ergo late in industriis utuntur ut aerospace, chemica, industria. Ut ut ex...
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Quid interest inter PECVD et LPCVD in instrumento semiconductoris CVD?
by admin on 24-07-24
Depositio vapor chemicus (CVD) refertur ad processum deponendi veli solidi in superficie lagani siliconis per reactionem chemica mixtionis gasi. Secundum varias condiciones reactionis (pressurae, praecursoris), in varios apparatus dividi potest...
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Characteres pii carbide graphite expressi
by on 24-07-18
Silicon Carbide Graphite Molde Silicon carbide graphite forma composita est cum carbide pii (SiC) ut basis et graphita ut materia supplementi. Haec forma egregiam habet scelerisque conductivity, caliditas resistentia, corrosio resistentia.
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Processus semiconductor plenus processus photolithographiae
by on 24-07-16
Vestibulum cujusvis productum semiconductoris centum processuum eget. Totam vestibulum processum in octo gradus dividimus: laganum processus oxidationis, photographicum photographicum, tenuium cinematographicorum depositionis, incrementi epitaxialis, implantationis diffusionis. Ut rutrum...
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4 sescenti! SK Hynix denuntiat semiconductor provectae packaging investment in Purdue Research Park
by admin on 24-07-09
West Lafayette, Indiana - SK hynix Inc. nuntiavit consilia ad obsidendam fere $4 miliarda fabricandi fabricandi sarcinas provectas et R&D facultatem ad artificiosas intelligentias artificiales apud Purdue Research Park. Condere nexum clavis in US copia semiconductoris catenam in West Lafayett...
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Laser technicae artis transformatio technologiae technologiae siliconis carbide subiectae ducit
by admin on 24-07-08
1. Maecenas carbidi pii substrati processus technologiae Hodierna carbide substrata processus vestigia includunt: stridor circuli exterioris, scindendi, crepitandi, stridor, poliendi, emundandi, etc. Slictio momenti est gradus in semiconductore subiecto pr...
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Scelerisque amet agro materiae: C / C materiae compositae
by admin on 24-07-01
Composita carbon-carbona sunt species fibrarum carbonii compositarum, cum fibra carbonis ut materia supplementi et carbonis ut materia matrix deposita. Matrix C/C composita carbo est. Cum fere totum ex carbone elementi compositum sit, optimum caliditas resistan habet.
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Tres artes maioris crystallini ad Sic incrementum
by admin on 24-07-01
Ut in Fig. 3, tres sunt artes dominantes tendentes ad praebendum SiC unicum crystallum cum qualitate et efficacia: liquida periodus epitaxy (LPE), vapor corporis (PVT), et summus calor chemicus depositio vaporum (HTCVD). PVT processus confirmatus est ad peccatum.
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