Epitaxy

Brevis descriptio:


  • Originis loco:China
  • Crystal Structure:FCCβ phase
  • Densitas:3.21 g/cm;
  • Duritia:MMD Vickers;
  • Magnitudo frumenti:2~10μm;
  • Puritas chemica:99.99995%;
  • Capacitas Caloris:640J·kg-1·K-1;
  • Sublimatio Temperature:2700℃;
  • Fortitudo Felix:415 Mpa (RT 4-Point);
  • Modulus:430 Gpa (4pt bend, 1300℃);
  • Scelerisque Expansion (CTE)4.5 10-6K-1;
  • Scelerisque Conductivity:300(W/MK);
  • Product Detail

    Product Tags

    Product Description

    Societas nostra SiC efficiens operas processus per methodum CVD in superficie graphitarum, ceramicorum et aliarum materiarum praebet, ut gasi speciales in caliditate carbonis et siliconis reant, ad altam puritatem SiC molecularum, molecularum in superficie materiarum iactatarum depositarum; formatam SIC tutela iacuit.

    Praecipua lineamenta:

    1. caliditas oxidationis resistentia;

    oxidatio resistentia adhuc optima est, cum siccus tam altus est quam 1600 C.

    2. Puritas alta : factae depositionis vaporis chemicae sub conditione chlorinationis caliditatis.

    3. Exesa resistentia: durities alta, superficies compacta, particulae tenuis.

    4. Corrosio resistentiae: acidum, alcali, salis et reagentia organica.

    Specificationes principales de CVD-SIC Coating

    Sic-CVD Properties

    Crystal Structure FCC β phase
    Density g/cm 3.21
    duritia Vickers duritia 2500
    Frumenti Size μm 2~10
    Puritas chemica % 99.99995
    Calor Capacitas J·kg-1 ·K-1 640
    Sublimatio Temperature 2700
    Fortitudo Felix MPa (RT 4-punctum) 415
    Modulus Gpa (4pt bend, 1300℃) 430
    Scelerisque Expansion (CTE) 10-6K-1 4.5
    Scelerisque conductivity (W/mK) 300

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