Epitaxial Epi Graphite Barrel Susceptor

Epitaxial Epi Graphite Barrel Susceptor

Epitaxial Epi Graphite Barrel Susceptorgoyan baya da aka ƙera na musamman da na'urar dumama da ake amfani da ita don riƙewa da ɗora matattarar sinadarai yayin ayyukan masana'antu kamar Deposition ko hanyoyin Epitoxy.

Tsarinsa ya haɗa da yawanci silinda ko ɗan ƙaramin ganga mai siffa, saman yana fasalta aljihu da yawa ko dandamali don sanya wafers, na iya zama ƙaƙƙarfan ƙira ko ƙira, ya danganta da hanyar dumama.

Babban ayyuka na mai ciwon ganga na epitaxial:

-Tallafin substrate: amintacce yana riƙe da wafers masu yawa na semiconductor;
- Tushen zafi: yana ba da yanayin zafi mai girma da ake buƙata don girma ta hanyar dumama;
-Tsarin zafin jiki: yana tabbatar da dumama dumama;
-Juyawa: yawanci yana jujjuyawa yayin girma don haɓaka daidaituwar yanayin zafi da rarraba iskar gas.

Ƙa'idar aiki na Epi graphite barrel susceptor:
- A cikin reactor na epitaxial, mai ciwon ganga yana mai zafi zuwa zafin da ake buƙata (yawanci 1000 ℃-1200 ℃ don silicon epitaxy);
-Tsarin ganga yana jujjuya don tabbatar da rarraba yanayin zafi iri ɗaya da kwararar iskar gas;
-Aikin iskar gas yana bazuwa a yanayin zafi mai zafi, yana samar da yadudduka na epitaxial akan saman ƙasa.

Aikace-aikace:
-Ana amfani da shi don haɓakar ci gaban silicon epitaxial
- Hakanan ana amfani da shi don epitaxy na sauran kayan semiconductor kamar GaAs, InP, da sauransu.

VET Energy yana amfani da ginshiƙi mai tsabta tare da CVD-SiC shafi don haɓaka kwanciyar hankali na sinadarai:

Fa'idodin VET Energy Epitaxial Epi Graphite Barrel Susceptor:

-Babban kwanciyar hankali;
- Kyakkyawan thermal uniformity;
-Za a iya aiwatar da maɓalli da yawa a lokaci guda, haɓaka haɓakar samarwa;
-Inert sinadarai, kula da yanayin girma mai tsafta.