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Chemical Vapor Deposition (CVD) is an important thin film deposition technology, often used to prepare various functional films and thin-layer materials, and is widely used in semiconductor manufac...
In high temperature applications, the choice of materials is critical. Among them, the reaction-sintered silicon carbide material has become a popular choice due to its excellent performance. React...
Triangular defect
Triangular defects are the most fatal morphological defects in SiC epitaxial layers. A large number of literature reports have shown that the formation of triangular defects is...
Introduction
In the metallurgical industry, the use of high-quality materials is paramount to ensure the efficient and reliable production of metals and alloys. Among the various materials employ...
1. SiC crystal growth technology route
PVT (sublimation method),
HTCVD (high temperature CVD),
LPE (liquid phase method)
are three common SiC crystal growth methods;
The most recognized meth...