Graphite Substrate Wafer Holder for PECVD

Short Description:

VET Energy’s Graphite Substrate Holder is engineered to maintain wafer alignment and stability throughout the PECVD process, preventing contamination and minimizing the risk of damage. The Graphite Wafer Holder provides a secure, even platform, ensuring that wafers are evenly exposed to the plasma for consistent and high-quality deposition. With its high thermal conductivity and exceptional strength, this holder helps improve overall process efficiency and product performance.

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VET Energy Graphite Substrate Wafer Holder is a precision carrier designed for PECVD (Plasma Enhanced Chemical Vapor Deposition) process. This high-quality Graphite Substrate Holder is made of high-purity, high-density graphite material, with excellent high temperature resistance, corrosion resistance, dimensional stability and other characteristics. It can provide a stable support platform for PECVD process and ensure the uniformity and flatness of film deposition.

VET Energy PECVD process graphite wafer support table has the following characteristics:

▪ High purity: extremely low impurity content, avoid contamination of film, ensure film quality.

▪ High density: high density, high mechanical strength, can withstand high temperature and high pressure PECVD environment.

▪ Good dimensional stability: small dimensional change at high temperature, ensuring process stability.

▪ Excellent thermal conductivity: effectively transfer heat to prevent wafer overheating.

▪ Strong corrosion resistance: can resist erosion by various corrosive gases and plasma.

▪ Customized service: graphite support tables of different sizes and shapes can be customized according to customer needs.

Product Advantages

▪ Improve film quality: Ensure uniform film deposition and improve film quality.

▪ Extend equipment life: Excellent corrosion resistance, extend the service life of PECVD equipment.

▪ Reduce production costs: High-quality graphite trays can reduce scrap rate and reduce production costs.

Graphite material from SGL:

Typical parameter: R6510
Index	Test standard	Value	Unit
Average grain size	ISO 13320	10	μm
Bulk density	DIN IEC 60413/204	1.83	g/cm³
Open porosity	DIN66133	10	%
Medium pore size	DIN66133	1.8	μm
Permeability	DIN 51935	0.06	cm²/s
Rockwell hardness HR5/100	DIN IEC60413/303	90	HR
Specific electrical resistivity	DIN IEC 60413/402	13	μΩm
Flexural strength	DIN IEC 60413/501	60	MPa
Compressive strength	DIN 51910	130	MPa
Young's modulus	DIN 51915	11.5×10³	MPa
Thermal expansion(20-200℃)	DIN 51909	4.2X10^-6	K^-1
Thermal conductivity (20℃)	DIN 51908	105	Wm^-1K^-1

It is specifically designed for high-efficiency solar cell manufacturing, supporting G12 large-size wafer processing. Optimized carrier design significantly increases throughput, enabling higher yield rates and lower production costs.

Item	Type	Number wafer carrier
PEVCD Grephite boat - The 156 series	156-13 grephite boat	144
	156-19 grephite boat	216
	156-21 grephite boat	240
	156-23 graphite boat	308
PEVCD Grephite boat - The 125 series	125-15 grephite boat	196
	125-19 grephite boat	252
	125-21 grphite boat	280